JPWO2023008532A5 - - Google Patents
Download PDFInfo
- Publication number
- JPWO2023008532A5 JPWO2023008532A5 JP2023538624A JP2023538624A JPWO2023008532A5 JP WO2023008532 A5 JPWO2023008532 A5 JP WO2023008532A5 JP 2023538624 A JP2023538624 A JP 2023538624A JP 2023538624 A JP2023538624 A JP 2023538624A JP WO2023008532 A5 JPWO2023008532 A5 JP WO2023008532A5
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- exposure
- exposure master
- film
- membrane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021124967 | 2021-07-30 | ||
| JP2021124967 | 2021-07-30 | ||
| PCT/JP2022/029162 WO2023008532A1 (ja) | 2021-07-30 | 2022-07-28 | ペリクル膜、ペリクル、ペリクル付き露光原版、露光方法、半導体の製造方法及び液晶表示板の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023008532A1 JPWO2023008532A1 (https=) | 2023-02-02 |
| JPWO2023008532A5 true JPWO2023008532A5 (https=) | 2024-04-09 |
| JP7652260B2 JP7652260B2 (ja) | 2025-03-27 |
Family
ID=85086857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023538624A Active JP7652260B2 (ja) | 2021-07-30 | 2022-07-28 | ペリクル膜、ペリクル、ペリクル付き露光原版、露光方法、半導体の製造方法及び液晶表示板の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP4379464A4 (https=) |
| JP (1) | JP7652260B2 (https=) |
| KR (1) | KR20240036598A (https=) |
| CN (1) | CN117751325A (https=) |
| WO (1) | WO2023008532A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20230205073A1 (en) * | 2021-12-29 | 2023-06-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for euv lithography masks and methods of manufacturing thereof |
| KR102701152B1 (ko) * | 2024-04-03 | 2024-09-02 | 주식회사 에프에스티 | Euv 펠리클용 질화붕소 나노튜브 멤브레인의 제조장치 및 질화붕소 나노튜브 멤브레인을 포함하는 euv 펠리클 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5099117B2 (ja) * | 2007-03-05 | 2012-12-12 | 帝人株式会社 | 窒化ホウ素系繊維紙の製造方法 |
| JP5394808B2 (ja) | 2009-04-22 | 2014-01-22 | 信越化学工業株式会社 | リソグラフィ用ペリクルおよびその製造方法 |
| NL2017606A (en) * | 2015-10-22 | 2017-05-10 | Asml Netherlands Bv | A method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle |
| JP6478283B2 (ja) * | 2015-12-24 | 2019-03-06 | 信越化学工業株式会社 | Ｅｕｖ露光用ペリクル |
| KR102809564B1 (ko) * | 2016-07-05 | 2025-05-20 | 미쯔이가가꾸가부시끼가이샤 | 펠리클막, 펠리클 프레임체, 펠리클, 그 제조 방법, 노광 원판, 노광 장치, 반도체 장치의 제조 방법 |
| KR102310124B1 (ko) * | 2017-03-28 | 2021-10-08 | 삼성전자주식회사 | 극자외선 노광용 펠리클, 포토마스크 조립체 및 펠리클의 제조 방법 |
| EP3404486B1 (en) | 2017-05-15 | 2021-07-14 | IMEC vzw | A method for forming a pellicle |
| NL2021084B1 (en) * | 2017-06-15 | 2019-03-27 | Asml Netherlands Bv | Pellicle and Pellicle Assembly |
| US11472931B2 (en) | 2017-07-05 | 2022-10-18 | National Research Council Of Canada | Methods for preparing superhydrophobic nano-microscale patterned films |
| JP2021076620A (ja) | 2018-03-14 | 2021-05-20 | 株式会社カネカ | 炭素質膜を含むペリクル及び炭素質膜を含むペリクルの製造方法 |
| US20200272047A1 (en) * | 2019-02-22 | 2020-08-27 | Applied Materials, Inc. | Method of forming cnt-bnnt nanocomposite pellicle |
| JP2020160345A (ja) * | 2019-03-27 | 2020-10-01 | 三井化学株式会社 | ペリクル自立膜の製造方法、ペリクルの製造方法、および半導体装置の製造方法 |
| KR102695013B1 (ko) * | 2019-04-24 | 2024-08-13 | 삼성전자주식회사 | 펠리클 조립체의 제조 방법 및 포토마스크 조립체의 제조 방법 |
| KR102463517B1 (ko) * | 2019-10-22 | 2022-11-09 | 주식회사 에스앤에스텍 | 질화붕소 나노튜브를 사용하는 극자외선 리소그래피용 펠리클 및 이의 제조방법 |
-
2022
- 2022-07-28 EP EP22849593.3A patent/EP4379464A4/en active Pending
- 2022-07-28 WO PCT/JP2022/029162 patent/WO2023008532A1/ja not_active Ceased
- 2022-07-28 KR KR1020247004606A patent/KR20240036598A/ko active Pending
- 2022-07-28 JP JP2023538624A patent/JP7652260B2/ja active Active
- 2022-07-28 CN CN202280050110.1A patent/CN117751325A/zh active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5478463B2 (ja) | リソグラフィー用ペリクル | |
| JPWO2023008532A5 (https=) | ||
| JP5411200B2 (ja) | リソグラフィ用ペリクル | |
| KR101478123B1 (ko) | 리소그래피용 펠리클 | |
| JP2018194840A5 (https=) | ||
| JP4931717B2 (ja) | リソグラフィー用ペリクルの製造方法 | |
| CN102033419A (zh) | 防尘薄膜组件 | |
| CN101349875A (zh) | 防护薄膜框架 | |
| CN101349874A (zh) | 防护薄膜框架 | |
| JP2008256925A (ja) | ペリクル | |
| JP2018077412A (ja) | グラフェン膜の製造方法及びこれを用いたペリクルの製造方法 | |
| TW202303266A (zh) | 防護膜組件、曝光原版、曝光裝置、防護膜組件的製造方法、及半導體裝置的製造方法 | |
| JP2002182373A (ja) | ペリクル及びその製造方法及びフォトマスク | |
| CN109343307A (zh) | 基于纳米压印光刻的金属图案转移方法以及系统 | |
| US8426083B2 (en) | Pellicle for lithography | |
| JP4979088B2 (ja) | 半導体リソグラフィー用ペリクル | |
| TW202238260A (zh) | 防護膜組件、曝光原版、曝光裝置、防護膜組件的製造方法及半導體裝置的製造方法 | |
| CN101986205A (zh) | 防尘薄膜组件 | |
| JP2007041603A5 (ja) | 超紫外線リソグラフィ用の反射デバイス、それを適用した超紫外線リソグラフィ用マスク、プロジェクション光学系及びリソグラフィ装置 | |
| JP2022148581A (ja) | ペリクル膜、ペリクル、露光原版、露光装置及び半導体装置の製造方法 | |
| KR102868688B1 (ko) | 극자외선 노광공정의 포토마스크 보호용 펠리클 및 그 제조방법 | |
| KR101592619B1 (ko) | 리소그래피용 펠리클 | |
| JP2016114883A (ja) | リソグラフィー用ペリクルの作製方法 | |
| KR20230054032A (ko) | Euv 리소그래피용 펠리클 구조 및 제조방법 | |
| JP2001066760A (ja) | リソグラフィー用ペリクル |