KR20240036598A - 펠리클막, 펠리클, 펠리클 부착 노광 원판, 노광 방법, 반도체의 제조 방법 및 액정 표시판의 제조 방법 - Google Patents

펠리클막, 펠리클, 펠리클 부착 노광 원판, 노광 방법, 반도체의 제조 방법 및 액정 표시판의 제조 방법 Download PDF

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Publication number
KR20240036598A
KR20240036598A KR1020247004606A KR20247004606A KR20240036598A KR 20240036598 A KR20240036598 A KR 20240036598A KR 1020247004606 A KR1020247004606 A KR 1020247004606A KR 20247004606 A KR20247004606 A KR 20247004606A KR 20240036598 A KR20240036598 A KR 20240036598A
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KR
South Korea
Prior art keywords
pellicle
film
exposure
bnnt
euv
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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KR1020247004606A
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English (en)
Korean (ko)
Inventor
아키노리 니시무라
도루 시라사키
Original Assignee
신에쓰 가가꾸 고교 가부시끼가이샤
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Application filed by 신에쓰 가가꾸 고교 가부시끼가이샤 filed Critical 신에쓰 가가꾸 고교 가부시끼가이샤
Publication of KR20240036598A publication Critical patent/KR20240036598A/ko
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
    • C01B21/0648—After-treatment, e.g. grinding, purification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
    • C01P2004/13—Nanotubes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Inorganic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020247004606A 2021-07-30 2022-07-28 펠리클막, 펠리클, 펠리클 부착 노광 원판, 노광 방법, 반도체의 제조 방법 및 액정 표시판의 제조 방법 Pending KR20240036598A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2021-124967 2021-07-30
JP2021124967 2021-07-30
PCT/JP2022/029162 WO2023008532A1 (ja) 2021-07-30 2022-07-28 ペリクル膜、ペリクル、ペリクル付き露光原版、露光方法、半導体の製造方法及び液晶表示板の製造方法

Publications (1)

Publication Number Publication Date
KR20240036598A true KR20240036598A (ko) 2024-03-20

Family

ID=85086857

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247004606A Pending KR20240036598A (ko) 2021-07-30 2022-07-28 펠리클막, 펠리클, 펠리클 부착 노광 원판, 노광 방법, 반도체의 제조 방법 및 액정 표시판의 제조 방법

Country Status (5)

Country Link
EP (1) EP4379464A4 (https=)
JP (1) JP7652260B2 (https=)
KR (1) KR20240036598A (https=)
CN (1) CN117751325A (https=)
WO (1) WO2023008532A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102701152B1 (ko) * 2024-04-03 2024-09-02 주식회사 에프에스티 Euv 펠리클용 질화붕소 나노튜브 멤브레인의 제조장치 및 질화붕소 나노튜브 멤브레인을 포함하는 euv 펠리클

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230205073A1 (en) * 2021-12-29 2023-06-29 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle for euv lithography masks and methods of manufacturing thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010256434A (ja) 2009-04-22 2010-11-11 Shin-Etsu Chemical Co Ltd リソグラフィ用ペリクルおよびその製造方法
JP2018194838A (ja) 2017-05-15 2018-12-06 アイメック・ヴェーゼットウェーＩｍｅｃ Ｖｚｗ ペリクルを形成する方法
WO2019176410A1 (ja) 2018-03-14 2019-09-19 株式会社カネカ 炭素質膜を含むペリクル及び炭素質膜を含むペリクルの製造方法

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JP5099117B2 (ja) * 2007-03-05 2012-12-12 帝人株式会社 窒化ホウ素系繊維紙の製造方法
NL2017606A (en) * 2015-10-22 2017-05-10 Asml Netherlands Bv A method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle
JP6478283B2 (ja) * 2015-12-24 2019-03-06 信越化学工業株式会社 Ｅｕｖ露光用ペリクル
KR102809564B1 (ko) * 2016-07-05 2025-05-20 미쯔이가가꾸가부시끼가이샤 펠리클막, 펠리클 프레임체, 펠리클, 그 제조 방법, 노광 원판, 노광 장치, 반도체 장치의 제조 방법
KR102310124B1 (ko) * 2017-03-28 2021-10-08 삼성전자주식회사 극자외선 노광용 펠리클, 포토마스크 조립체 및 펠리클의 제조 방법
NL2021084B1 (en) * 2017-06-15 2019-03-27 Asml Netherlands Bv Pellicle and Pellicle Assembly
US11472931B2 (en) 2017-07-05 2022-10-18 National Research Council Of Canada Methods for preparing superhydrophobic nano-microscale patterned films
US20200272047A1 (en) * 2019-02-22 2020-08-27 Applied Materials, Inc. Method of forming cnt-bnnt nanocomposite pellicle
JP2020160345A (ja) * 2019-03-27 2020-10-01 三井化学株式会社 ペリクル自立膜の製造方法、ペリクルの製造方法、および半導体装置の製造方法
KR102695013B1 (ko) * 2019-04-24 2024-08-13 삼성전자주식회사 펠리클 조립체의 제조 방법 및 포토마스크 조립체의 제조 방법
KR102463517B1 (ko) * 2019-10-22 2022-11-09 주식회사 에스앤에스텍 질화붕소 나노튜브를 사용하는 극자외선 리소그래피용 펠리클 및 이의 제조방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010256434A (ja) 2009-04-22 2010-11-11 Shin-Etsu Chemical Co Ltd リソグラフィ用ペリクルおよびその製造方法
JP2018194838A (ja) 2017-05-15 2018-12-06 アイメック・ヴェーゼットウェーＩｍｅｃ Ｖｚｗ ペリクルを形成する方法
WO2019176410A1 (ja) 2018-03-14 2019-09-19 株式会社カネカ 炭素質膜を含むペリクル及び炭素質膜を含むペリクルの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102701152B1 (ko) * 2024-04-03 2024-09-02 주식회사 에프에스티 Euv 펠리클용 질화붕소 나노튜브 멤브레인의 제조장치 및 질화붕소 나노튜브 멤브레인을 포함하는 euv 펠리클

Also Published As

Publication number Publication date
TW202307556A (zh) 2023-02-16
EP4379464A4 (en) 2025-10-29
EP4379464A1 (en) 2024-06-05
JPWO2023008532A1 (https=) 2023-02-02
CN117751325A (zh) 2024-03-22
WO2023008532A1 (ja) 2023-02-02
JP7652260B2 (ja) 2025-03-27

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