JPWO2023008532A1 - - Google Patents
Info
- Publication number
- JPWO2023008532A1 JPWO2023008532A1 JP2023538624A JP2023538624A JPWO2023008532A1 JP WO2023008532 A1 JPWO2023008532 A1 JP WO2023008532A1 JP 2023538624 A JP2023538624 A JP 2023538624A JP 2023538624 A JP2023538624 A JP 2023538624A JP WO2023008532 A1 JPWO2023008532 A1 JP WO2023008532A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
- C01B21/0648—After-treatment, e.g. grinding, purification
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
- C01P2004/13—Nanotubes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Inorganic Chemistry (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021124967 | 2021-07-30 | ||
| JP2021124967 | 2021-07-30 | ||
| PCT/JP2022/029162 WO2023008532A1 (ja) | 2021-07-30 | 2022-07-28 | ペリクル膜、ペリクル、ペリクル付き露光原版、露光方法、半導体の製造方法及び液晶表示板の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023008532A1 true JPWO2023008532A1 (https=) | 2023-02-02 |
| JPWO2023008532A5 JPWO2023008532A5 (https=) | 2024-04-09 |
| JP7652260B2 JP7652260B2 (ja) | 2025-03-27 |
Family
ID=85086857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023538624A Active JP7652260B2 (ja) | 2021-07-30 | 2022-07-28 | ペリクル膜、ペリクル、ペリクル付き露光原版、露光方法、半導体の製造方法及び液晶表示板の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP4379464A4 (https=) |
| JP (1) | JP7652260B2 (https=) |
| KR (1) | KR20240036598A (https=) |
| CN (1) | CN117751325A (https=) |
| WO (1) | WO2023008532A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20230205073A1 (en) * | 2021-12-29 | 2023-06-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for euv lithography masks and methods of manufacturing thereof |
| KR102701152B1 (ko) * | 2024-04-03 | 2024-09-02 | 주식회사 에프에스티 | Euv 펠리클용 질화붕소 나노튜브 멤브레인의 제조장치 및 질화붕소 나노튜브 멤브레인을 포함하는 euv 펠리클 |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017116697A (ja) * | 2015-12-24 | 2017-06-29 | 信越化学工業株式会社 | Ｅｕｖ露光用ペリクル |
| WO2018008594A1 (ja) * | 2016-07-05 | 2018-01-11 | 三井化学株式会社 | ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法 |
| US20180284599A1 (en) * | 2017-03-28 | 2018-10-04 | Samsung Electronics Co., Ltd. | Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicle |
| JP2020523622A (ja) * | 2017-06-15 | 2020-08-06 | エーエスエムエル ネザーランズ ビー．ブイ． | ペリクル及びペリクルアセンブリ |
| WO2020172236A1 (en) * | 2019-02-22 | 2020-08-27 | Applied Materials, Inc. | Method of forming cnt-bnnt nanocomposite pellicle |
| JP2020160345A (ja) * | 2019-03-27 | 2020-10-01 | 三井化学株式会社 | ペリクル自立膜の製造方法、ペリクルの製造方法、および半導体装置の製造方法 |
| US20200341364A1 (en) * | 2019-04-24 | 2020-10-29 | Samsung Electronics Co., Ltd. | Methods of manufacturing pellicle assembly and photomask assembly |
| WO2021080294A1 (ko) * | 2019-10-22 | 2021-04-29 | 주식회사 에스앤에스텍 | 질화붕소 나노튜브를 사용하는 극자외선 리소그래피용 펠리클 및 이의 제조방법 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5099117B2 (ja) * | 2007-03-05 | 2012-12-12 | 帝人株式会社 | 窒化ホウ素系繊維紙の製造方法 |
| JP5394808B2 (ja) | 2009-04-22 | 2014-01-22 | 信越化学工業株式会社 | リソグラフィ用ペリクルおよびその製造方法 |
| NL2017606A (en) * | 2015-10-22 | 2017-05-10 | Asml Netherlands Bv | A method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle |
| EP3404486B1 (en) | 2017-05-15 | 2021-07-14 | IMEC vzw | A method for forming a pellicle |
| US11472931B2 (en) | 2017-07-05 | 2022-10-18 | National Research Council Of Canada | Methods for preparing superhydrophobic nano-microscale patterned films |
| JP2021076620A (ja) | 2018-03-14 | 2021-05-20 | 株式会社カネカ | 炭素質膜を含むペリクル及び炭素質膜を含むペリクルの製造方法 |
-
2022
- 2022-07-28 EP EP22849593.3A patent/EP4379464A4/en active Pending
- 2022-07-28 WO PCT/JP2022/029162 patent/WO2023008532A1/ja not_active Ceased
- 2022-07-28 KR KR1020247004606A patent/KR20240036598A/ko active Pending
- 2022-07-28 JP JP2023538624A patent/JP7652260B2/ja active Active
- 2022-07-28 CN CN202280050110.1A patent/CN117751325A/zh active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017116697A (ja) * | 2015-12-24 | 2017-06-29 | 信越化学工業株式会社 | Ｅｕｖ露光用ペリクル |
| WO2018008594A1 (ja) * | 2016-07-05 | 2018-01-11 | 三井化学株式会社 | ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法 |
| US20180284599A1 (en) * | 2017-03-28 | 2018-10-04 | Samsung Electronics Co., Ltd. | Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicle |
| JP2020523622A (ja) * | 2017-06-15 | 2020-08-06 | エーエスエムエル ネザーランズ ビー．ブイ． | ペリクル及びペリクルアセンブリ |
| WO2020172236A1 (en) * | 2019-02-22 | 2020-08-27 | Applied Materials, Inc. | Method of forming cnt-bnnt nanocomposite pellicle |
| JP2020160345A (ja) * | 2019-03-27 | 2020-10-01 | 三井化学株式会社 | ペリクル自立膜の製造方法、ペリクルの製造方法、および半導体装置の製造方法 |
| US20200341364A1 (en) * | 2019-04-24 | 2020-10-29 | Samsung Electronics Co., Ltd. | Methods of manufacturing pellicle assembly and photomask assembly |
| WO2021080294A1 (ko) * | 2019-10-22 | 2021-04-29 | 주식회사 에스앤에스텍 | 질화붕소 나노튜브를 사용하는 극자외선 리소그래피용 펠리클 및 이의 제조방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202307556A (zh) | 2023-02-16 |
| EP4379464A4 (en) | 2025-10-29 |
| EP4379464A1 (en) | 2024-06-05 |
| KR20240036598A (ko) | 2024-03-20 |
| CN117751325A (zh) | 2024-03-22 |
| WO2023008532A1 (ja) | 2023-02-02 |
| JP7652260B2 (ja) | 2025-03-27 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240110 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240326 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20240730 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20240927 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20241128 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20250212 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20250225 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7652260 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |