JP2018194840A5 - - Google Patents
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- Publication number
- JP2018194840A5 JP2018194840A5 JP2018093909A JP2018093909A JP2018194840A5 JP 2018194840 A5 JP2018194840 A5 JP 2018194840A5 JP 2018093909 A JP2018093909 A JP 2018093909A JP 2018093909 A JP2018093909 A JP 2018093909A JP 2018194840 A5 JP2018194840 A5 JP 2018194840A5
- Authority
- JP
- Japan
- Prior art keywords
- carbon nanotube
- pellicle
- film
- forming
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000000034 method Methods 0.000 claims 21
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 14
- 239000002041 carbon nanotube Substances 0.000 claims 11
- 229910021393 carbon nanotube Inorganic materials 0.000 claims 11
- 239000002238 carbon nanotube film Substances 0.000 claims 10
- 238000000576 coating method Methods 0.000 claims 6
- 239000011248 coating agent Substances 0.000 claims 5
- 239000000463 material Substances 0.000 claims 5
- 229910021389 graphene Inorganic materials 0.000 claims 3
- 239000012528 membrane Substances 0.000 claims 3
- 238000001900 extreme ultraviolet lithography Methods 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- 239000011247 coating layer Substances 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP17171172.4A EP3404487B1 (en) | 2017-05-15 | 2017-05-15 | Method for forming a carbon nanotube pellicle membrane |
| EP17171172.4 | 2017-05-15 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018194840A JP2018194840A (ja) | 2018-12-06 |
| JP2018194840A5 true JP2018194840A5 (https=) | 2021-04-30 |
| JP6975678B2 JP6975678B2 (ja) | 2021-12-01 |
Family
ID=58709413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018093909A Active JP6975678B2 (ja) | 2017-05-15 | 2018-05-15 | カーボンナノチューブペリクル膜の形成方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10712659B2 (https=) |
| EP (1) | EP3404487B1 (https=) |
| JP (1) | JP6975678B2 (https=) |
| CN (1) | CN108873596B (https=) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6781864B2 (ja) * | 2016-07-05 | 2020-11-11 | 三井化学株式会社 | ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法 |
| EP3404486B1 (en) * | 2017-05-15 | 2021-07-14 | IMEC vzw | A method for forming a pellicle |
| KR102532602B1 (ko) * | 2017-07-27 | 2023-05-15 | 삼성전자주식회사 | 포토마스크용 펠리클 조성물, 이로부터 형성된 포토마스크용 펠리클, 그 제조방법, 펠리클을 함유한 레티클 및 레티클을 포함하는 리소그래피용 노광장치 |
| WO2020099072A1 (en) * | 2018-11-16 | 2020-05-22 | Asml Netherlands B.V. | A pellicle for euv lithography |
| JP7224712B2 (ja) * | 2018-12-03 | 2023-02-20 | 信越化学工業株式会社 | ペリクルの製造方法、ペリクル、ペリクル付フォトマスク、露光方法、半導体デバイスの製造方法、液晶ディスプレイの製造方法及び有機ｅｌディスプレイの製造方法。 |
| EP3671342B1 (en) * | 2018-12-20 | 2021-03-17 | IMEC vzw | Induced stress for euv pellicle tensioning |
| EP3674797B1 (en) * | 2018-12-28 | 2021-05-05 | IMEC vzw | An euvl scanner |
| KR20260042317A (ko) * | 2019-05-31 | 2026-03-30 | 린텍 오브 아메리카, 인크. | 다중벽, 소수벽 및 단일벽 탄소 나노튜브 혼합물의 필름 |
| EP4606937A3 (en) * | 2019-08-26 | 2026-03-04 | ASML Netherlands B.V. | Pellicle membrane for a lithographic apparatus |
| DE102020115130B4 (de) * | 2019-10-30 | 2025-05-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Robuste membran mit hoher durchlässigkeit für lithografische extremes-ultraviolett-anlagen |
| JP7434810B2 (ja) * | 2019-11-05 | 2024-02-21 | Ｔｏｐｐａｎホールディングス株式会社 | ペリクル膜及びペリクル |
| FI3842861T3 (fi) * | 2019-12-23 | 2025-06-23 | Imec Vzw | Menetelmä euvl-pintakalvon muodostamiseksi |
| JP7286870B2 (ja) | 2020-02-26 | 2023-06-05 | 三井化学株式会社 | ペリクル膜、ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法 |
| JP7596637B2 (ja) | 2020-02-27 | 2024-12-10 | Ｔｏｐｐａｎホールディングス株式会社 | ペリクル膜及びペリクル |
| KR102768196B1 (ko) | 2020-04-17 | 2025-02-18 | 미쯔이가가꾸가부시끼가이샤 | 노광용 펠리클막, 펠리클, 노광 원판, 노광 장치 및 노광용 펠리클막의 제조 방법 |
| CN119620531A (zh) * | 2020-09-16 | 2025-03-14 | 琳得科美国股份有限公司 | 用于euv光刻的超薄超低密度膜 |
| TW202216589A (zh) * | 2020-09-17 | 2022-05-01 | 美商美國琳得科股份有限公司 | 奈米纖維薄膜張力控制 |
| KR102585401B1 (ko) * | 2020-11-17 | 2023-10-10 | 주식회사 에스앤에스텍 | 독립된 박막 형태의 캡핑층을 갖는 극자외선 리소그래피용 펠리클 및 그 제조방법 |
| US12153339B2 (en) * | 2021-01-29 | 2024-11-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Network type pellicle membrane and method for forming the same |
| US12346020B2 (en) * | 2021-02-12 | 2025-07-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Optical assembly with coating and methods of use |
| US20220365420A1 (en) * | 2021-05-12 | 2022-11-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multi-layer pellicle membrane |
| US12174526B2 (en) * | 2021-08-06 | 2024-12-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for an EUV lithography mask and a method of manufacturing thereof |
| US11860534B2 (en) | 2021-08-06 | 2024-01-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for an EUV lithography mask and a method of manufacturing thereof |
| KR20230050162A (ko) * | 2021-10-07 | 2023-04-14 | 에스케이하이닉스 주식회사 | 펠리클을 포함한 포토마스크 |
| EP4194948A4 (en) | 2021-10-20 | 2024-05-01 | NGK Insulators, Ltd. | EUV TRANSMITTANT FILM |
| EP4437381A1 (en) * | 2021-11-25 | 2024-10-02 | ASML Netherlands B.V. | Pellicles and membranes for use in a lithographic apparatus |
| US12554193B2 (en) | 2021-12-02 | 2026-02-17 | Entegris, Inc. | Pellicle comprising silicon carbide nanostructure and related devices and methods |
| EP4202546B1 (en) * | 2021-12-22 | 2024-08-28 | Imec VZW | An euv pellicle |
| US20230205073A1 (en) * | 2021-12-29 | 2023-06-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for euv lithography masks and methods of manufacturing thereof |
| WO2023175990A1 (ja) | 2022-03-18 | 2023-09-21 | 日本碍子株式会社 | Ｅｕｖ透過膜の製造方法及びペリクル |
| WO2024057499A1 (ja) | 2022-09-15 | 2024-03-21 | 日本碍子株式会社 | Ｅｕｖ透過膜 |
| TW202503402A (zh) * | 2023-01-20 | 2025-01-16 | 美商應用材料股份有限公司 | 極紫外光表模及製造方法 |
| CN120883131A (zh) * | 2023-03-28 | 2025-10-31 | 琳得科株式会社 | 防护膜组件、防护膜支撑体及防护膜组件的制造方法 |
| CN120883130A (zh) * | 2023-04-04 | 2025-10-31 | Asml荷兰有限公司 | Euv透射屏障 |
| US20250085623A1 (en) * | 2023-09-07 | 2025-03-13 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multilayer protection coating with layers of different functions on carbon nanotube |
| WO2025075910A1 (en) * | 2023-10-02 | 2025-04-10 | Lintec Of America, Inc. | Improved extreme ultraviolet pellicle with enhanced extreme ultraviolet transmission and method of producing thereof |
| JP7528393B1 (ja) * | 2024-03-29 | 2024-08-05 | 住友化学株式会社 | カーボンナノチューブ集合体、カーボンナノチューブ分散液、導電材料、電極、二次電池、平面状集合体、フィルター、電磁波シールド及び極端紫外線用ペリクル |
| FI131459B1 (en) * | 2024-04-26 | 2025-05-05 | Canatu Finland Oy | A coated free-standing film of carbon nanostructures |
| JP2025184609A (ja) * | 2024-06-07 | 2025-12-18 | 住友化学株式会社 | カーボンナノチューブ集合体、カーボンナノチューブ分散液、導電助剤、電極、二次電池、平面状集合体、フィルター、電磁波シールド、極端紫外線用ペリクル及び組成物 |
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| KR100455297B1 (ko) * | 2002-06-19 | 2004-11-06 | 삼성전자주식회사 | 무기물 나노튜브 제조방법 |
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| US9458017B2 (en) * | 2012-11-14 | 2016-10-04 | Pontificia Universidad Catolica Madre Y Maestra | Carbon nanotubes conformally coated with diamond nanocrystals or silicon carbide, methods of making the same and methods of their use |
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| JP6097783B2 (ja) * | 2014-04-14 | 2017-03-15 | ツィンファ ユニバーシティ | カーボンナノチューブアレイの転移方法及びカーボンナノチューブ構造体の製造方法 |
| US9958770B2 (en) * | 2014-04-17 | 2018-05-01 | Industry-University Cooperation Foundation Hanyang University | Pellicle for EUV lithography |
| US9256123B2 (en) * | 2014-04-23 | 2016-02-09 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of making an extreme ultraviolet pellicle |
| EP3118683A4 (en) * | 2014-05-02 | 2017-11-01 | Mitsui Chemicals, Inc. | Pellicle frame, pellicle and manufacturing method thereof, exposure original plate and manufacturing method thereof, exposure device, and semiconductor device manufacturing method |
| JP6520041B2 (ja) * | 2014-10-21 | 2019-05-29 | 凸版印刷株式会社 | ペリクル |
| US9547232B2 (en) | 2014-12-04 | 2017-01-17 | Globalfoundries Inc. | Pellicle with aerogel support frame |
| KR102366806B1 (ko) * | 2015-05-13 | 2022-02-23 | 삼성전자주식회사 | 열 축적을 방지하는 펠리클 및 이를 포함하는 극자외선 리소그래피 장치 |
| KR102345543B1 (ko) * | 2015-08-03 | 2021-12-30 | 삼성전자주식회사 | 펠리클 및 이를 포함하는 포토마스크 조립체 |
| US9835940B2 (en) | 2015-09-18 | 2017-12-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method to fabricate mask-pellicle system |
| JP6781864B2 (ja) * | 2016-07-05 | 2020-11-11 | 三井化学株式会社 | ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法 |
| EP3404486B1 (en) * | 2017-05-15 | 2021-07-14 | IMEC vzw | A method for forming a pellicle |
-
2017
- 2017-05-15 EP EP17171172.4A patent/EP3404487B1/en active Active
-
2018
- 2018-05-15 JP JP2018093909A patent/JP6975678B2/ja active Active
- 2018-05-15 US US15/979,800 patent/US10712659B2/en active Active
- 2018-05-15 CN CN201810461607.8A patent/CN108873596B/zh active Active
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