JPWO2022231753A5 - - Google Patents
Download PDFInfo
- Publication number
- JPWO2022231753A5 JPWO2022231753A5 JP2023546542A JP2023546542A JPWO2022231753A5 JP WO2022231753 A5 JPWO2022231753 A5 JP WO2022231753A5 JP 2023546542 A JP2023546542 A JP 2023546542A JP 2023546542 A JP2023546542 A JP 2023546542A JP WO2022231753 A5 JPWO2022231753 A5 JP WO2022231753A5
- Authority
- JP
- Japan
- Prior art keywords
- photocurable composition
- monomer
- photocurable
- polymerizable material
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 claims 31
- 239000000178 monomer Substances 0.000 claims 21
- 239000000463 material Substances 0.000 claims 10
- 239000000758 substrate Substances 0.000 claims 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 8
- 150000001875 compounds Chemical class 0.000 claims 7
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims 7
- 238000000034 method Methods 0.000 claims 6
- ZVEMLYIXBCTVOF-UHFFFAOYSA-N 1-(2-isocyanatopropan-2-yl)-3-prop-1-en-2-ylbenzene Chemical compound CC(=C)C1=CC=CC(C(C)(C)N=C=O)=C1 ZVEMLYIXBCTVOF-UHFFFAOYSA-N 0.000 claims 3
- DPNXHTDWGGVXID-UHFFFAOYSA-N 2-isocyanatoethyl prop-2-enoate Chemical compound C=CC(=O)OCCN=C=O DPNXHTDWGGVXID-UHFFFAOYSA-N 0.000 claims 3
- 125000002877 alkyl aryl group Chemical group 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 3
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims 3
- HXBPYFMVGFDZFT-UHFFFAOYSA-N allyl isocyanate Chemical compound C=CCN=C=O HXBPYFMVGFDZFT-UHFFFAOYSA-N 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 claims 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims 1
- 125000005037 alkyl phenyl group Chemical group 0.000 claims 1
- 150000002118 epoxides Chemical class 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/244,508 US11753497B2 (en) | 2021-04-29 | 2021-04-29 | Photocurable composition |
| US17/244,508 | 2021-04-29 | ||
| PCT/US2022/022536 WO2022231753A1 (en) | 2021-04-29 | 2022-03-30 | Photocurable composition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2024516479A JP2024516479A (ja) | 2024-04-16 |
| JP2024516479A5 JP2024516479A5 (https=) | 2025-04-04 |
| JPWO2022231753A5 true JPWO2022231753A5 (https=) | 2025-04-04 |
Family
ID=83847288
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023546542A Pending JP2024516479A (ja) | 2021-04-29 | 2022-03-30 | 光硬化性組成物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11753497B2 (https=) |
| JP (1) | JP2024516479A (https=) |
| KR (1) | KR102899614B1 (https=) |
| TW (1) | TWI833173B (https=) |
| WO (1) | WO2022231753A1 (https=) |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1275668B1 (en) * | 2000-03-30 | 2011-05-11 | Mitsubishi Chemical Corporation | Photocurable composition, cured object, and process for producing the same |
| US7745505B2 (en) * | 2004-12-29 | 2010-06-29 | Henkel Ag & Co. Kgaa | Photoinitiators and UV-crosslinkable acrylic polymers for pressure sensitive adhesives |
| US7759407B2 (en) | 2005-07-22 | 2010-07-20 | Molecular Imprints, Inc. | Composition for adhering materials together |
| JP2008138160A (ja) * | 2006-11-08 | 2008-06-19 | Sumitomo Osaka Cement Co Ltd | ハードコート膜形成用塗料とハードコート膜及びハードコート膜付きプラスチック基材並びにポリビニル樹脂組成物の製造方法 |
| US8106134B2 (en) | 2008-08-28 | 2012-01-31 | Bridgestone Sports Co., Ltd. | Golf ball and method of improving golf ball performance |
| US20100109195A1 (en) | 2008-11-05 | 2010-05-06 | Molecular Imprints, Inc. | Release agent partition control in imprint lithography |
| US20120016050A1 (en) | 2008-12-26 | 2012-01-19 | Leon Joseph A | Monoisocyanate-Acrylate Monomers and Products Ulitilizing the Same |
| KR20110007687A (ko) * | 2009-07-17 | 2011-01-25 | 공주대학교 산학협력단 | 무용제 자외선 경화형 아크릴 점착제 조성물 및 그 제조방법 |
| EP2484706A1 (de) | 2011-02-03 | 2012-08-08 | Sika Technology AG | Haftvermittlerzusammensetzung |
| IN2014DN00290A (https=) | 2011-06-17 | 2015-06-05 | Materia Inc | |
| WO2013019821A1 (en) | 2011-08-01 | 2013-02-07 | Sun Chemical Corporation | High-stretch energy curable inks & method of use in heat transfer label applications |
| CN103946998B (zh) * | 2011-11-18 | 2017-03-29 | Lg化学株式会社 | 用于封装有机电子器件的光可固化压敏粘合剂膜，有机电子器件及其封装方法 |
| JP2016002683A (ja) * | 2014-06-16 | 2016-01-12 | コニカミノルタ株式会社 | ３ｄ造形物の製造方法、３ｄ造形用光硬化性組成物および３ｄ造形用インクセット |
| JP2016183304A (ja) * | 2015-03-26 | 2016-10-20 | デクセリアルズ株式会社 | アクリル系粘着テープの製造方法及びアクリル系粘着テープ |
| KR102047291B1 (ko) * | 2016-09-23 | 2019-11-21 | 주식회사 엘지화학 | 접착제 조성물 |
| KR101903906B1 (ko) * | 2017-09-22 | 2018-10-02 | 주식회사 엘지화학 | 편광판 보호층용 무용제형 광경화성 수지 조성물, 이의 경화물을 포함하는 편광판 및 화상표시장치 |
| CN108003802B (zh) * | 2017-12-07 | 2021-03-30 | 烟台德邦科技股份有限公司 | 一种基于逐步聚合机理热致自愈合紫外光固化胶黏剂 |
| US20200123408A1 (en) * | 2017-12-15 | 2020-04-23 | Rohm And Haas Electronic Materials Llc | Uv-curing acrylic resin compositions for thermoformable hard coat applications |
| JP7211713B2 (ja) * | 2018-04-12 | 2023-01-24 | 積水化学工業株式会社 | 接着剤樹脂組成物 |
| US20200339828A1 (en) | 2019-04-26 | 2020-10-29 | Canon Kabushiki Kaisha | Photocurable composition |
| US11549020B2 (en) * | 2019-09-23 | 2023-01-10 | Canon Kabushiki Kaisha | Curable composition for nano-fabrication |
-
2021
- 2021-04-29 US US17/244,508 patent/US11753497B2/en active Active
-
2022
- 2022-03-08 TW TW111108344A patent/TWI833173B/zh active
- 2022-03-30 WO PCT/US2022/022536 patent/WO2022231753A1/en not_active Ceased
- 2022-03-30 KR KR1020237039749A patent/KR102899614B1/ko active Active
- 2022-03-30 JP JP2023546542A patent/JP2024516479A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2018125559A5 (https=) | ||
| JP3197819B2 (ja) | アブラティブ光分解性組成物を用いたパターン形成方法 | |
| KR20230120130A (ko) | 높은 열적 안정성을 갖는 경화된 층을 형성하기 위한 광경화성 조성물 | |
| JP2025503368A (ja) | 向上した熱安定性を有する光硬化性組成物 | |
| TW202346382A (zh) | 光可固化組成物 | |
| TWI642738B (zh) | 光學用黏結劑組合物及光學用黏結膜 | |
| JPWO2019224699A5 (https=) | ||
| JP6763915B2 (ja) | アクリレート化合物、これを含む光硬化性組成物、光硬化性硬化膜および画像表示装置 | |
| JPWO2022231753A5 (https=) | ||
| JPWO2021171943A5 (https=) | ||
| TWI891412B (zh) | 可光固化之組成物 | |
| JPWO2023129311A5 (https=) | ||
| KR101929651B1 (ko) | 경화성 조성물 및 이를 이용한 임프린트 필름 | |
| JP2021516280A (ja) | 粘着剤組成物 | |
| JPWO2023032821A5 (https=) | ||
| JP2023001915A5 (https=) | ||
| CN110819141B (zh) | 硬化性组合物及化合物 | |
| CN108192413B (zh) | 一种快速uv光固化油墨及其应用方法 | |
| US20250075111A1 (en) | Adhesive composition and method of manufacturing a semiconductor device using the same | |
| JPWO2021187481A5 (https=) | ||
| JPWO2023204257A5 (https=) | ||
| TWI833173B (zh) | 光可固化組成物 | |
| KR102563872B1 (ko) | 디스플레이용 접착시트 및 이를 포함하는 디스플레이 | |
| JPWO2023224746A5 (https=) | ||
| US12600820B2 (en) | Photocurable composition with high silicon content |