JPWO2022196258A5 - - Google Patents
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- JPWO2022196258A5 JPWO2022196258A5 JP2023506900A JP2023506900A JPWO2022196258A5 JP WO2022196258 A5 JPWO2022196258 A5 JP WO2022196258A5 JP 2023506900 A JP2023506900 A JP 2023506900A JP 2023506900 A JP2023506900 A JP 2023506900A JP WO2022196258 A5 JPWO2022196258 A5 JP WO2022196258A5
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- JP
- Japan
- Prior art keywords
- group
- formula
- carbon atoms
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- 125000004432 carbon atom Chemical group C* 0.000 claims 14
- 125000001424 substituent group Chemical group 0.000 claims 12
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims 8
- 229910052717 sulfur Inorganic materials 0.000 claims 8
- 125000004434 sulfur atom Chemical group 0.000 claims 8
- 125000004122 cyclic group Chemical group 0.000 claims 6
- 125000004430 oxygen atom Chemical group O* 0.000 claims 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 6
- 125000002947 alkylene group Chemical group 0.000 claims 5
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 5
- 125000001072 heteroaryl group Chemical group 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- 239000011347 resin Substances 0.000 claims 5
- 229920005989 resin Polymers 0.000 claims 5
- 125000004450 alkenylene group Chemical group 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 4
- 125000005842 heteroatom Chemical group 0.000 claims 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 4
- 229910052757 nitrogen Inorganic materials 0.000 claims 4
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 4
- 150000003839 salts Chemical class 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 3
- 125000003545 alkoxy group Chemical group 0.000 claims 3
- 125000000732 arylene group Chemical group 0.000 claims 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 3
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims 2
- 125000004644 alkyl sulfinyl group Chemical group 0.000 claims 2
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims 2
- 125000004414 alkyl thio group Chemical group 0.000 claims 2
- 125000003277 amino group Chemical group 0.000 claims 2
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 125000005143 heteroarylsulfonyl group Chemical group 0.000 claims 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000003282 alkyl amino group Chemical group 0.000 claims 1
- 125000005529 alkyleneoxy group Chemical group 0.000 claims 1
- 150000001450 anions Chemical group 0.000 claims 1
- 125000005129 aryl carbonyl group Chemical group 0.000 claims 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 claims 1
- 125000005163 aryl sulfanyl group Chemical group 0.000 claims 1
- 125000005135 aryl sulfinyl group Chemical group 0.000 claims 1
- 125000004104 aryloxy group Chemical group 0.000 claims 1
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 claims 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 1
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 125000005223 heteroarylcarbonyl group Chemical group 0.000 claims 1
- 125000005553 heteroaryloxy group Chemical group 0.000 claims 1
- 125000005226 heteroaryloxycarbonyl group Chemical group 0.000 claims 1
- 125000005150 heteroarylsulfinyl group Chemical group 0.000 claims 1
- 125000000468 ketone group Chemical class 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 claims 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims 1
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021041748 | 2021-03-15 | ||
| PCT/JP2022/006978 WO2022196258A1 (ja) | 2021-03-15 | 2022-02-21 | オニウム塩、光酸発生剤、組成物及びそれを用いたデバイスの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2022196258A1 JPWO2022196258A1 (https=) | 2022-09-22 |
| JPWO2022196258A5 true JPWO2022196258A5 (https=) | 2023-12-08 |
Family
ID=83321246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023506900A Pending JPWO2022196258A1 (https=) | 2021-03-15 | 2022-02-21 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPWO2022196258A1 (https=) |
| WO (1) | WO2022196258A1 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022164586A (ja) * | 2021-04-15 | 2022-10-27 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP2022173111A (ja) * | 2021-05-06 | 2022-11-17 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| US12566375B2 (en) * | 2021-05-06 | 2026-03-03 | Sumitomo Chemical Company, Limited | Salt, acid generator, resist composition and method for producing resist pattern |
| JP2022191200A (ja) * | 2021-06-15 | 2022-12-27 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP2022191199A (ja) * | 2021-06-15 | 2022-12-27 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| WO2024070091A1 (ja) * | 2022-09-29 | 2024-04-04 | 東洋合成工業株式会社 | オニウム塩、光酸発生剤、ポリマー、レジスト組成物及び、該レジスト組成物を用いたデバイスの製造方法 |
| WO2026048564A1 (ja) * | 2024-08-28 | 2026-03-05 | 富士フイルム株式会社 | 感光性組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111562720B (zh) * | 2014-02-21 | 2023-09-29 | 东京毅力科创株式会社 | 光增感化学放大型抗蚀剂材料、图案形成方法、半导体器件、光刻用掩模、纳米压印用模板 |
| US11142495B2 (en) * | 2016-10-17 | 2021-10-12 | Toyo Gosei Co., Ltd. | Composition and method for manufacturing device using same |
| JP7079647B2 (ja) * | 2018-04-17 | 2022-06-02 | 東洋合成工業株式会社 | 組成物及びそれを用いたデバイスの製造方法 |
| JP7249198B2 (ja) * | 2019-04-19 | 2023-03-30 | 東洋合成工業株式会社 | オニウム塩、組成物及びそれを用いたデバイスの製造方法 |
| TWI898021B (zh) * | 2020-08-20 | 2025-09-21 | 日商東洋合成工業股份有限公司 | 聚合物、含有該聚合物的抗蝕劑組成物、利用該抗蝕劑組成物的部件的製造方法、圖案形成方法以及反轉圖案的形成方法 |
-
2022
- 2022-02-21 JP JP2023506900A patent/JPWO2022196258A1/ja active Pending
- 2022-02-21 WO PCT/JP2022/006978 patent/WO2022196258A1/ja not_active Ceased
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