JPWO2022196258A1 - - Google Patents

Info

Publication number
JPWO2022196258A1
JPWO2022196258A1 JP2023506900A JP2023506900A JPWO2022196258A1 JP WO2022196258 A1 JPWO2022196258 A1 JP WO2022196258A1 JP 2023506900 A JP2023506900 A JP 2023506900A JP 2023506900 A JP2023506900 A JP 2023506900A JP WO2022196258 A1 JPWO2022196258 A1 JP WO2022196258A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023506900A
Other versions
JPWO2022196258A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022196258A1 publication Critical patent/JPWO2022196258A1/ja
Publication of JPWO2022196258A5 publication Critical patent/JPWO2022196258A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/76—Dibenzothiophenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
JP2023506900A 2021-03-15 2022-02-21 Pending JPWO2022196258A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021041748 2021-03-15
PCT/JP2022/006978 WO2022196258A1 (ja) 2021-03-15 2022-02-21 オニウム塩、光酸発生剤、組成物及びそれを用いたデバイスの製造方法

Publications (2)

Publication Number Publication Date
JPWO2022196258A1 true JPWO2022196258A1 (ja) 2022-09-22
JPWO2022196258A5 JPWO2022196258A5 (ja) 2023-12-08

Family

ID=83321246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023506900A Pending JPWO2022196258A1 (ja) 2021-03-15 2022-02-21

Country Status (2)

Country Link
JP (1) JPWO2022196258A1 (ja)
WO (1) WO2022196258A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230004084A1 (en) * 2021-05-06 2023-01-05 Sumitomo Chemical Company, Limited Salt, acid generator, resist composition and method for producing resist pattern
WO2024070091A1 (ja) * 2022-09-29 2024-04-04 東洋合成工業株式会社 オニウム塩、光酸発生剤、ポリマー、レジスト組成物及び、該レジスト組成物を用いたデバイスの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015125788A1 (ja) * 2014-02-21 2015-08-27 東京エレクトロン株式会社 光増感化学増幅型レジスト材料及びこれを用いたパターン形成方法、半導体デバイス、リソグラフィ用マスク、並びにナノインプリント用テンプレート
KR102278416B1 (ko) * 2016-10-17 2021-07-15 도요 고세이 고교 가부시키가이샤 조성물 및 이를 이용한 디바이스의 제조 방법
JP7079647B2 (ja) * 2018-04-17 2022-06-02 東洋合成工業株式会社 組成物及びそれを用いたデバイスの製造方法
JP7249198B2 (ja) * 2019-04-19 2023-03-30 東洋合成工業株式会社 オニウム塩、組成物及びそれを用いたデバイスの製造方法
JPWO2022039212A1 (ja) * 2020-08-20 2022-02-24

Also Published As

Publication number Publication date
WO2022196258A1 (ja) 2022-09-22

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Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230905