WO2022196258A1 - オニウム塩、光酸発生剤、組成物及びそれを用いたデバイスの製造方法 - Google Patents

オニウム塩、光酸発生剤、組成物及びそれを用いたデバイスの製造方法 Download PDF

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WO2022196258A1
WO2022196258A1 PCT/JP2022/006978 JP2022006978W WO2022196258A1 WO 2022196258 A1 WO2022196258 A1 WO 2022196258A1 JP 2022006978 W JP2022006978 W JP 2022006978W WO 2022196258 A1 WO2022196258 A1 WO 2022196258A1
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智至 榎本
俊 長谷
康平 町田
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Toyo Gosei Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/76—Dibenzothiophenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Definitions

  • One aspect of the present invention relates to onium salts. Another aspect of the present invention relates to a photoacid generator containing the onium salt, a composition, and a method for manufacturing a device using the composition.
  • resist compositions are required to have improved lithography properties such as sensitivity to the exposure light source and resolution capable of reproducing fine-dimensional patterns.
  • a chemically amplified resist is known as a resist composition that satisfies such requirements (Patent Document 1).
  • conventional chemically amplified resists such as chemically amplified resist compositions for EUV or electron beams, have low absorption of EUV or electron beams, and the generation efficiency of secondary electrons is low. is degraded, and it is difficult to simultaneously meet the characteristics of sensitivity, resolution and pattern performance.
  • an acid and a sensitizer are generated by lithography using a first active energy beam such as EUV or an electron beam, and then visible light or ultraviolet light or the like is used.
  • a photosensitized chemically amplified resist composition for use in the method of irradiating with a second actinic energy ray.
  • the sensitizer electron donor
  • the photoacid generator (electron acceptor)
  • acid may be generated by the electron transfer reaction of several nm in some cases. This may cause unintended diffusion of the generated acid without reacting with the acid diffusion control agent even when the acid diffusion control agent is contained in the resist composition. As a result, pattern deterioration such as deterioration of LWR may occur.
  • the amount of photosensitizer produced in the process of producing the photosensitizer by the action of the acid produced by the first active energy ray is small. Since the amount is small, the sensitization reaction is difficult to occur, and there is a problem that even if a large amount of energy, for example, 1 J/cm 2 , is irradiated, the effect of accelerating the resist reaction is small.
  • a further object of the present invention is to provide an onium salt that is most suitable as a photoacid generator for exposure to a second active energy ray such as ultraviolet rays or visible light after irradiation with a first active energy ray such as an electron beam or extreme ultraviolet rays. do.
  • a photoacid generator containing the onium salt and a composition containing the photoacid generator is another object of the present invention.
  • Another object of the present invention is to provide a method for manufacturing a device using the composition.
  • an onium salt having a specific structure does not have significant absorption in the second active energy ray such as ultraviolet light or visible light, and can be structured by an acid.
  • the inventors have found that the ketone derivative can be converted into a ketone derivative having absorption in the second active energy ray by changing, and have completed several aspects of the present invention. More specifically, the present inventors have found that an onium salt having a dibenzothiophenium skeleton with a condensed ring structure and an acetal site or thioacetal site has the following properties. (1) To have high decomposition efficiency with respect to the first active energy rays such as electron beams or extreme ultraviolet rays.
  • the structure of the onium salt is changed by the acid generated by the decomposition due to the irradiation of the first active energy ray, and the onium salt itself does not need to have a substituent with a large structure, resulting in high absorption of the second active energy ray.
  • the substituent having a large structure includes, for example, a group having a skeleton with a long conjugation length such as naphthalene and condensed polycyclic heterocycle.
  • the ketone derivative whose structure has been changed by an acid should be excellent in acid generation efficiency after irradiation with the second activation energy.
  • a specific onium salt having a dibenzothiophenium skeleton and an acetal site or a thioacetal site has a higher decomposition efficiency than conventional onium salts with respect to the first activation energy
  • the present inventors have found that the onium salt derivative structurally changed from the above-mentioned specific onium salt by irradiation with the first active energy ray has a high decomposition efficiency with respect to the second active energy. was completed.
  • the present inventors have found that the use of a photoacid generator containing the above onium salt in a resist composition results in excellent sensitivity.
  • One aspect of the present invention for solving the above problems is an onium salt represented by any one selected from the following general formula (1) and the following general formula (2).
  • R 1 is a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms which may have a substituent;
  • the R 1 and any one of the benzene ring to which the R 2 is bonded and the benzene ring to which the R 3 is bonded are directly formed by a single bond, or consist of an oxygen atom, a sulfur atom, a nitrogen atom-containing group and a methylene group.
  • a ring structure may be formed together with the sulfur atom to which these are bonded via any one selected from the group.
  • At least one methylene group in R 1 may be substituted with a divalent heteroatom-containing group.
  • R 2 , R 3 and R 4 above each independently represent an alkyl group, a hydroxy group, a mercapto group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, a heteroarylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, heteroaryloxycarbonyl group, arylsulfanylcarbonyl group, heteroarylsulfanylcarbonyl group, arylsulfanyl group, heteroarylsulfanyl group, alkylsulfanyl group, aryl group, heteroaryl group, aryloxy group, heteroaryloxy group, alkylsulfinyl group, arylsulfinyl group, heteroarylsulfinyl group, alkylsulfonyl group, arylsulfonyl group
  • R 5 and R 6 above are independently each an optionally substituted linear, branched or cyclic alkyl group having 1 to 12 carbon atoms; an optionally substituted linear chain , a branched or cyclic alkenyl group having 2 to 12 carbon atoms; an aryl group having 6 to 14 carbon atoms which may have a substituent; and an optionally substituted 3 to 12 carbon atoms a heteroaryl group; any one selected from the group consisting of
  • R 5 and R 6 may be bonded to each other directly with a single bond or through any one selected from the group consisting of an oxygen atom, a sulfur atom and an alkylene group to form a ring structure. At least one methylene group in R 5 and R 6 may be substituted with a divalent heteroatom-containing group.
  • L 1 is any one selected from the group consisting of a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms; an alkenylene group having 2 to 12 carbon atoms; a sulfinyl group, a sulfonyl group and a carbonyl group; .
  • Y is an oxygen atom or a sulfur atom.
  • a is an integer of 0-4, b is an integer of 0-3, c is an integer of 1-5, d is an integer of 0-2, and e is an integer of 1-4.
  • a is 0 in the above formula (1) ⁇ 3 or b is 0 to 2, and a is 0 to 3 or d is 0 to 1 in the above formula (2).
  • At least one of the benzene rings in formulas (1) and (2) may be a six-membered heteroaromatic ring having a heteroatom in the ring.
  • e may be 0 when the benzene ring bonded to R 4 in the above formulas (1) and (2) is the above heteroaromatic ring.
  • two of the R 4 may be linked together to form a ring structure.
  • X - is a monovalent anionic group
  • f is an integer of 1 to 3
  • X - may be the same or different
  • R is an f-valent organic group.
  • photoacid generator (hereinafter referred to as "photoacid generator (A)”).
  • the photoacid generator (A) generates an acid upon exposure.
  • One aspect of the present invention for solving the above problems is a composition containing the photoacid generator (A) and an acid-reactive compound.
  • another aspect of the present invention includes the steps of applying the composition on a substrate to form a resist film, irradiating the resist film with a first active energy ray, and after irradiating the first active energy ray. and a step of developing the resist film after being irradiated with the second active energy ray to obtain a pattern.
  • a resist composition for a lithographic process using a first active energy ray such as particle beams or electromagnetic waves and a second active energy ray such as ultraviolet light or visible light can provide an onium salt with excellent sensitivity.
  • a resist composition containing the onium salt as an acid generator and having high sensitivity to the first activation energy such as particle beams or electromagnetic waves, especially electron beams or extreme ultraviolet rays, and a method for manufacturing a device using the same. can provide
  • FIG. 1 shows UV absorption spectra of ketone derivatives of sulfonium salts used in Examples and Comparative Examples.
  • Onium salt and photoacid generator (A) The onium salt according to one aspect of the present invention is represented by any one selected from the above general formula (1) and the above general formula (2). Moreover, the photoacid generator (A) contains at least one of the onium salts.
  • the onium salt according to one aspect of the present invention has a specific structure of an acetal site or thioacetal site or the like and a dibenzothiophenium skeleton, so that the decomposition efficiency for the first active energy ray such as particle beam or electromagnetic wave is high. It is high and has high absorption with respect to the second active energy ray irradiation after the first active energy irradiation. Moreover, the onium salt according to one aspect of the present invention does not have significant absorption of the second active energy ray such as ultraviolet light or visible light.
  • the acetal site or thioacetal site of the onium salt is deprotected and converted into a ketone derivative by the acid generated by the first actinic energy ray without impairing the function of the onium salt as a photoacid generator.
  • the ketone derivative contains a dibenzothiophenium structure having a condensed ring structure, the conjugation length becomes long, so that the absorption wavelength is easily lengthened and absorbs the second active energy ray. Since the ketone derivative is generated in the exposed portion irradiated with the first activation energy ray in the resist film, the amount of acid generated in the exposed portion by the first activation energy ray is increased by further irradiation with the second activation energy. can be increased.
  • ultraviolet light or visible light having a wavelength of 365 nm or more is preferable as the second active energy ray.
  • the second active energy ray is more preferably 420 nm or less.
  • R 1 is a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms which may have a substituent;
  • linear, branched or cyclic alkyl groups having 1 to 12 carbon atoms for R 1 include methyl, ethyl, n-propyl, n-butyl, isopropyl, t-butyl, cyclopropyl groups, Alkyl groups such as cyclobutyl group, cyclopentyl group, cyclohexyl group, adamantan-1-yl group, adamantan-2-yl group, norbornan-1-yl group and norbornan-2-yl group are included.
  • At least one methylene group may be substituted with a divalent heteroatom-containing group.
  • the divalent heteroatom-containing group includes -O-, -CO-, -COO-, -OCO-, -O-CO-O-, -NHCO-, -CONH-, -NH-CO-O- , —O—CO—NH—, —NH—, —N(R 16 )—, —N(Ar)—, —S—, —SO— and —SO 2 —.
  • the sulfur atom (S + ) of the sulfonium group is not directly bonded to the heteroatom-containing group but bonded to the divalent hydrocarbon group.
  • R 16 and Ar are described later.
  • Examples of the alkenyl group for R 1 include those in which at least one carbon-carbon single bond of the above alkyl group is replaced with a carbon-carbon double bond.
  • the optionally substituted aryl group having 6 to 14 carbon atoms in R 1 specifically includes a monocyclic aromatic hydrocarbon group, and at least two rings of the monocyclic aromatic hydrocarbon are condensed.
  • a condensed polycyclic aromatic hydrocarbon group and the like can be mentioned. These aryl groups may have a substituent.
  • Examples of the monocyclic aromatic hydrocarbon group include groups having a skeleton such as benzene.
  • Examples of the condensed polycyclic aromatic hydrocarbon group include groups having skeletons such as indene, naphthalene, azulene, anthracene, and phenanthrene.
  • At least one selected from an oxygen atom, a nitrogen atom and a sulfur atom is substituted for at least one carbon atom of the above aryl group.
  • Examples include those containing any of them in the skeleton.
  • the heteroaryl group includes a monocyclic aromatic heterocyclic group, and a condensed polycyclic aromatic heterocyclic group in which at least one of the monocyclic aromatic heterocycles is condensed with the above aromatic hydrocarbon group or aliphatic heterocyclic group.
  • a cyclic group and the like can be mentioned.
  • These aromatic heterocyclic groups may have a substituent.
  • Examples of the monocyclic aromatic heterocyclic group include groups having skeletons such as furan, pyrrole, imidazole, pyran, pyridine, pyrimidine and pyrazine.
  • Condensed polycyclic aromatic heterocyclic groups include groups having skeletons such as indole, purine, quinoline, isoquinoline, chromene, phenoxazine, xanthene, acridine, phenazine and carbazole.
  • Substituents for R 1 include a hydroxy group, a cyano group, a mercapto group, a carboxy group, an alkyl group (-R 16 ), an alkoxy group (-OR 16 ), and an acyl group.
  • R 16 in the first substituent is preferably an alkyl group having 1 or more carbon atoms. Moreover, it is more preferable that the number of carbon atoms is 20 or less. Specific examples of alkyl groups having 1 or more carbon atoms include methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-octyl and n-decyl.
  • linear alkyl groups such as groups; branched alkyl groups such as isopropyl group, isobutyl group, tert-butyl group, isopentyl group, tert-pentyl group, 2-ethylhexyl group; cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl alicyclic alkyl groups such as groups, adamantan-1-yl groups, adamantan-2-yl groups, norbornan-1-yl groups and norbornan-2-yl groups; A silyl group-substituted alkyl group substituted with a trialkylsilyl group such as a dimethylethylsilyl group; an alkyl group in which at least one of these hydrogen atoms is substituted with a cyano group, a fluoro group, or the like; and the like.
  • a carbon-carbon single bond in the above alkyl group may be replaced
  • Ar in the first substituent is preferably an aryl group or a heteroaryl group.
  • a heteroaryl group is an aryl group that contains one or more heteroatoms in the ring structure.
  • Specific examples of Ar include a phenyl group, biphenyl group, terphenyl group, quaterphenyl group, naphthyl group, anthryl group, phenanthrenyl group, pentalenyl group, indenyl group, indacenyl group, acenaphthyl group, fluorenyl group, heptalenyl group, naphthacenyl group, pyrenyl group, chrysenyl group, tetracenyl group, furanyl group, thienyl group, pyranyl group, sulfanylpyranyl group, pyrrolyl group, imidazoyl group, oxazolyl group, thiazolyl group, pyrazolyl group, pyr
  • the number of carbon atoms of R 1 is 1 to 1, including the number of carbon atoms of the first substituent. 20 is preferred.
  • R 1 and any one of the benzene ring to which R 2 is bonded and the benzene ring to which R 3 is bonded are directly formed by a single bond, or consist of an oxygen atom, a sulfur atom, a nitrogen atom-containing group and a methylene group.
  • a ring structure may be formed together with the sulfur atom to which these are bonded via any one selected from the group.
  • nitrogen atom-containing group include divalent groups containing a nitrogen atom, such as an aminodiyl group (--NH--), an alkylaminodiyl group (--NR 16 --) and an arylaminodiyl group (--NAr--). mentioned.
  • R 16 and Ar are the same as R 16 and Ar of the first substituent.
  • the onium salt in one aspect of the invention may be a polymer component attached to a portion of the polymer as one unit of the resin, ie, as a unit containing the onium salt structure. It may also be a polymer component contained as a repeating unit of a polymer.
  • the first substituent group includes the main chain of the polymer.
  • the number of carbon atoms of R 1 excludes the number of carbon atoms of the main chain of the polymer.
  • the onium salt in one embodiment of the present invention is the polymer component, it is preferable to adjust the weight average molecular weight of the entire polymer component to 2000 to 200000.
  • a low-molecular compound has a weight-average molecular weight of less than 2,000, and a polymer component has a weight-average molecular weight of 2,000 or more.
  • R 1 is preferably an aryl group from the viewpoint of improving stability.
  • R 2 , R 3 and R 4 are each independently an alkyl group, a hydroxy group, a mercapto group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, a heteroarylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a hetero aryloxycarbonyl group, arylsulfanylcarbonyl group, heteroarylsulfanylcarbonyl group, arylsulfanyl group, heteroarylsulfanyl group, alkylsulfanyl group, aryl group, heteroaryl group, aryloxy group, heteroaryloxy group, alkylsulfinyl group, aryl sulfinyl group, heteroarylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, heteroarylsulfonyl group, arylsulfonyl group, hetero
  • the alkyl groups for R 2 , R 3 and R 4 may be linear, branched or cyclic, and specific examples include the same alkyl groups as those for R 1 as the first substituent.
  • the alkyl group moieties such as alkoxy group, alkylcarbonyl group and alkoxycarbonyl group for R 2 , R 3 and R 4 are the same as the alkyl group for R 1 .
  • the aryl group and heteroaryl group for R 2 , R 3 and R 4 include the same aryl group and heteroaryl group for R 1 .
  • Examples of the aryl group moiety such as the above arylcarbonyl group and aryloxycarbonyl group for R 2 , R 3 and R 4 are the same as the aryl group for R 1 .
  • the heteroaryl group moieties such as the above heteroarylcarbonyl group and heteroaryloxycarbonyl group for R 2 , R 3 and R 4 are the same as the heteroaryl group for R 1 .
  • R 2 and R 3 are preferably substituents having no heteroaryl group moiety, such as the above heteroarylcarbonyl group and heteroaryloxycarbonyl group.
  • Examples of the hydroxy(poly)alkyleneoxy group for R 2 , R 3 and R 4 include a polyethyleneoxy group and a polypropyleneoxy group.
  • Halogen atoms for R 2 , R 3 and R 4 include fluorine, chlorine and iodine atoms.
  • At least one methylene group may contain the same group as the heteroatom-containing group for R 1 above in the skeleton. However, it is preferable not to have a continuous connection of heteroatoms such as -O-O-, -S-S- and -OS-.
  • Examples of R 2 , R 3 and R 4 when the above heteroatom-containing group is included instead of at least one methylene group in R 2 , R 3 and R 4 include groups having a glycol chain or a thioglycol chain. be done.
  • R 2 , R 3 and R 4 When R 2 , R 3 and R 4 have carbon, the number of carbon atoms is preferably 1-12. Also, R 2 , R 3 and R 4 may have a substituent (hereinafter also referred to as “second substituent”). Also, carbon-carbon single bonds in the alkyl groups of R 2 , R 3 and R 4 may be replaced with carbon-carbon double bonds. Examples of the second substituent that R 2 , R 3 and R 4 may have include those similar to the above first substituent. When R 2 , R 3 and R 4 have the second substituent and the onium salt is a low-molecular-weight compound, the number of carbon atoms in R 2 , R 3 and R 4 is the number of carbon atoms in the second substituent. It preferably has 1 to 12 carbon atoms, including When the second substituents of R 2 , R 3 and R 4 are polymer backbones, the number of carbon atoms of R 2 , R 3 and R 4 excludes the polymer backbone.
  • the onium salt which is one embodiment of the present invention, preferably has at least one R4 .
  • at least one R4 is preferably a hydroxy group or an alkoxy group.
  • R4 is preferably ortho or para to the binding position of the acetal or thioacetal moiety. Having a hydroxy group or an alkoxy group as R4 of the onium salt at the ortho or para position tends to increase the absorption of the second active energy ray when it becomes a ketone derivative.
  • a hydroxy group is more preferable because the solubility of the onium salt in development is improved because the affinity for the alkali developing solution is improved.
  • the onium salt cation structure is enlarged by adding a substituent to the cation of the onium salt, the hydrophobicity of the onium salt is improved, which may result in a dissolution inhibition effect during development. Therefore, the absorption wavelength of the ketone derivative after deprotection of the acetal site or thioacetal site without having a hydrophobic substituent, which tends to have low affinity for an alkaline developer, is lengthened and the absorption of the second active energy ray is increased. is preferably large.
  • Substituents exhibiting basicity are not preferred because they deactivate the generated acid and inhibit the decomposition of the acid-labile group.
  • the cation of the onium salt which is one embodiment of the present invention, does not have substituents containing aromatic rings, alicyclic structures, etc. in R 2 to R 4 , and has amino groups, etc. that react with generated acids. and the molecular weight of the cationic portion of the onium salt is preferably 500 or less.
  • the cation of the onium salt, which is one embodiment of the present invention more preferably does not have a basic group such as an amino group in R 2 and R 3 including R 4 .
  • At least one of R4 's is preferably a hydroxy group or an alkoxy group, and is preferably ortho- or para-position relative to the bonding position of the acetal or thioacetal moiety.
  • the other R4 's may not be a hydroxy group or an alkoxy group.
  • it is more preferably a substituent that donates electrons to the aromatic ring to which two or more R 4 are bonded. More preferably, it has a hydroxy group or an alkoxy group as R4 at two or more positions ortho or para to the bonding position of the acetal site or thioacetal site.
  • R 5 and R 6 are an optionally substituted linear, branched or cyclic alkyl group having 1 to 12 carbon atoms; an optionally substituted linear, branched or cyclic carbon an alkenyl group having 2 to 12 atoms; an aryl group having 6 to 14 carbon atoms which may have a substituent; and a heteroaryl group having 3 to 12 carbon atoms which may have a substituent; are preferably selected from the same options as each of R 1 above.
  • the alkyl group may be substituted with the above divalent heteroatom-containing group instead of at least one methylene group.
  • the divalent heteroatom-containing groups of R 5 and R 6 are preferably -O-, -CO-, -COO-, -OCO-, -O-CO-O-, -S-, -SO- and -SO 2 - and the like are more preferred.
  • Substituents for R 5 and R 6 include the same substituents as the first substituents.
  • R 5 and R 6 may be directly bonded to each other via a single bond or through any one selected from the group consisting of an oxygen atom, a sulfur atom and an alkylene group to form a ring structure. From a synthetic point of view, R 5 and R 6 above are preferably the same.
  • the third substituent is preferably a hydroxy group
  • R 5 and R 6 to which the hydroxy group is bonded are linear, branched or cyclic alkyls having 2 to 12 carbon atoms which may have the substituents described above. groups are preferred. More preferably, R 5 and R 6 having the hydroxy group as the third substituent have a tertiary alcohol structure. The reason is that the tertiary alcohols of R 5 and R 6 are E1 elimination reaction with the acid generated by irradiation with the first activation energy ray as a catalyst rather than primary alcohols and secondary alcohols. This is because it is easy to generate water.
  • the acetal site or thioacetal site of the onium salt represented by the general formula (1) or general formula (2) is easily hydrolyzed, and the acetal site or thioacetal site is deprotected. It changes into a ketone derivative that absorbs the second active energy ray. By irradiating the ketone derivative with the second active energy ray, the amount of acid generated can be amplified, so that the sensitivity is further improved.
  • L 1 is a direct bond; a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms; a linear, branched or cyclic alkenylene group having 2 to 12 carbon atoms; a sulfinyl group, a sulfonyl group and a carbonyl group; Any one selected from the group consisting of In general formulas (1) and (2) above, Y is an oxygen atom or a sulfur atom.
  • a is an integer of 0 to 4
  • b is an integer of 0 to 3
  • c is an integer of 1 to 5
  • d is an integer of 0 to 2
  • e is an integer of 1 to 4.
  • the onium salt in some embodiments of the present invention can be exemplified by the sulfonium cations shown below. However, some aspects of the invention are not so limited.
  • At least one of the benzene rings in the sulfonium salt cation examples above may be a heteroaromatic ring having a heteroatom in the ring.
  • e when the benzene ring bonded to R4 is the heteroaromatic ring, e may be 0, that is, R4 may be a hydrogen atom.
  • Heteroaromatic rings include 6-membered heteroaromatic rings such as pyridine ring, pyrimidine ring, pyridazine ring, pyrazine ring and triazine ring.
  • X - is a monovalent anionic group.
  • X 1 - is bonded to R.
  • the monovalent anion group is not particularly limited, and includes anion groups containing monovalent anions such as sulfonate anion (SO 3 ⁇ ), carboxylate anion (COO ⁇ ), imide anion, methide anion, borate anion, and the like. be done.
  • the anionic group is attached to R.
  • f is an integer of 1 to 3, and when f is 2 or more, X ⁇ may be the same or different.
  • R is an f-valent organic group.
  • the monovalent organic group when f is 1 includes an alkyl group, an aryl group, a heteroaryl group, and the like.
  • the alkyl group, aryl group, and heteroaryl group in the monovalent organic group may have a substituent, and examples of the substituent include those similar to the first substituent.
  • the alkyl group for R is preferably an alkyl group in which 80 mol % or more of the hydrogen atoms are substituted with fluorine atoms, and the alkyl group is preferably an alkyl group having 1 to 8 carbon atoms.
  • Alkyl groups to be R by fluorine substitution include straight-chain alkyl groups (methyl, ethyl, propyl, butyl, pentyl, octyl, etc.), branched-chain alkyl groups (isopropyl, isobutyl, sec-butyl, tert-butyl, etc.) and cycloalkyl groups (cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, etc.) and the like.
  • the ratio of hydrogen atoms of these alkyl groups in R substituted with fluorine atoms is preferably 80 mol% or more, more preferably 90 mol%, based on the number of moles of hydrogen atoms possessed by the original alkyl groups. % or more, particularly preferably 100%.
  • Particularly preferred monovalent alkyl groups for R include CF 3 —, CF 3 CF 2 —, (CF 3 ) 2 CF—, CF 3 CF 2 CF 2 —, CF 3 CF 2 CF 2 —, (CF 3 ) 2CFCF 2 -, CF 3 CF 2 (CF 3 )CF- and (CF 3 ) 3 C- .
  • Examples of the divalent organic group when f is 2 include an alkylene group, an arylene group, and a heteroarylene group.
  • Examples of the trivalent organic group when f is 3 include those in which the above monovalent organic group is trivalent.
  • f-valent organic anions include the following.
  • the onium salt according to one aspect of the present invention may be, as one aspect of the photoacid generator (A), an acid generator unit-containing resin in which an anion moiety is bonded to a part of a polymer.
  • onium salts include resins in which X 1 - in the above formulas (1) and (2) has a unit represented by the following general formula (5).
  • the unit represented by the general formula (5) may be contained in a resin (B) as an acid-reactive compound described later, or may be contained in a resin different from the resin (B). .
  • R7 is any one selected from the group consisting of a hydrogen atom, an alkyl group and a halogenated alkyl group.
  • L 2 is a direct bond, a carbonyloxy group, a carbonylamino group, an optionally substituted linear, branched or cyclic alkylenecarbonyloxy group, and an optionally substituted linear, branched or It is any one selected from the group consisting of a cyclic alkylenecarbonylamino group.
  • substituent for L 2 include the same substituents as the first substituent.
  • Z 1 is a straight or branched alkyl group having 1 to 12 carbon atoms, a straight or branched alkenyl group having 2 to 12 carbon atoms, or a straight or branched aryl group having 6 to 14 carbon atoms. Also, some or all of the hydrogen atoms of these alkyl groups, alkenyl groups and aryl groups may be substituted with fluorine atoms. At least one methylene group in these groups may be substituted with the above divalent heteroatom-containing group.
  • Onium salts according to some aspects of the present invention preferably have a molar extinction coefficient at 365 nm of less than 1.0 ⁇ 10 5 cm 2 /mol, preferably less than 1.0 ⁇ 10 4 cm 2 /mol. is more preferred.
  • the ketone derivative obtained by deprotecting the acetal moiety or thioacetal moiety of the onium salt according to some aspects of the present invention preferably has a molar extinction coefficient at 365 nm of 1.0 ⁇ 10 5 cm 2 /mol or more. , 1.0 ⁇ 10 6 cm 2 /mol or more.
  • the molar absorption coefficient at 365 nm of the ketone derivative is preferably 5 times or more, more preferably 10 times or more, more preferably 20 times the molar absorption coefficient at 365 nm of the onium salt according to some embodiments of the present invention. It is more preferable to be above. In order to obtain the above characteristics, the onium salt represented by the above formula (1) or (2) may be used.
  • the corresponding dibenzothiophene derivative can be synthesized according to a general synthetic method, or can be prepared by obtaining a commercially available product. Then, after adding an alkylating agent ( R 12 SO 4 ) such as dimethyl sulfate to form a sulfonium salt, salt exchange is performed using a salt having a corresponding anion to obtain a dialkyl-arylsulfonium salt (formula (10d) below). get Thereafter, the carbonyl group is acetalized using an acid catalyst and an alcohol (R 5 OH) to obtain the desired sulfonium salt (formula (10e) below).
  • R 12 SO 4 alkylating agent
  • R 5 OH an alcohol
  • the methods shown below are exemplified.
  • the benzophenone derivative (formula (10c) below) is oxidized with an oxidizing agent such as hydrogen peroxide to obtain (10f).
  • the carbonyl group is acetalized using an acid catalyst and an alcohol (R 5 OH) to obtain an acetal form (the following formula (10g)).
  • a Grignard reagent having an R 1 group is used to react with the above acetal (formula (10g) below) to form a sulfonium salt, and then the desired sulfonium salt is subjected to salt exchange using a salt having a corresponding anion. (Formula (10h) below) is obtained.
  • the anion part of the onium salt is a polymer component bound to a part of the polymer
  • the synthesis method shown below can be used. First, an onium salt having a polymerizable functional group in the anion portion (polymerizable onium salt) (10i). Then, the polymerizable onium salt thus obtained and the acid dissociable compound or the like are copolymerized using a radical initiator to obtain the target polymer component (formula (10j) below).
  • compositions containing the photoacid generator (A) and an acid-reactive compound.
  • the composition further comprises an acid diffusion inhibitor.
  • the content of the photoacid generator in the composition of one embodiment of the present invention is preferably 0.1 to 50 parts by mass with respect to 100 parts by mass of the resist composition components excluding the photoacid generator. It is more preferably 1 to 30 parts by mass, even more preferably 3 to 15 parts by mass.
  • the organic solvent is not included in 100 parts by mass of the resist composition components.
  • the photoacid generator is contained in the resin as one unit, that is, when the photoacid generator is a polymer component, the weight is based on the weight excluding the main chain of the polymer. Further, the photoacid generator is a polymer component, and units represented by general formulas (4a) to (4b) described later (hereinafter also referred to as "unit C") and general formulas (3a) to When it is included as a unit of the same polymer together with at least one unit selected from the group consisting of units represented by (3d) (hereinafter also referred to as “unit B"), the unit acting as the photoacid generator (hereinafter referred to as , also referred to as “unit A”) is preferably 0.1 to 40 mol%, more preferably 1 to 30 mol%, and further preferably 3 to 20 mol% of the total polymer units. preferable. In the resist composition, the photoacid generator may be used alone or in combination of two or more, regardless of whether it is a polymer component or a low-molecular
  • Photoacid generators other than the photoacid generator containing the onium salt include general-purpose ionic photoacid generators and nonionic photoacid generators.
  • Examples of the ionic photoacid generator include onium salt compounds such as iodonium salts and sulfonium salts other than the above.
  • Nonionic photoacid generators include N-sulfonyloxyimide compounds, oxime sulfonate compounds, organic halogen compounds and sulfonyldiazomethane compounds.
  • the content is 0.1 to 50 parts by mass with respect to 100 parts by mass of the resist composition components excluding the total amount of the photoacid generator. is preferred.
  • the acid-reactive compound is at least one selected from the group consisting of a compound having a protective group that is deprotected by an acid, a compound having a polymerizable group that is polymerized by an acid, and a cross-linking agent having a cross-linking action by an acid.
  • a compound having a protective group that can be deprotected by an acid is a compound whose protective group is deprotected by an acid to generate a polar group and change its solubility in a developer.
  • the protective group is insoluble in the alkaline developer, but the protective group is deprotected from the compound in the exposed area by the acid generated from the photoacid generator upon exposure. , is a compound that becomes soluble in an alkaline developer.
  • the acid-reactive compound is a resin (B) whose solubility in a developer changes under the action of acid.
  • the resin (B) has at least one of the units B represented by the above (3a) to (3d) having a protective group that can be deprotected by acid.
  • the above unit B is a unit contained in the resin (B) having a protective group that is deprotected by an acid, and a unit in which the protective group is deprotected by an acid to generate a polar group and change the solubility in a developer. is.
  • the protective group is deprotected from the unit B in the exposed area by the acid generated from the photoacid generator upon exposure, although it is insoluble in the alkaline developer. It is a compound that becomes soluble in an alkaline developer.
  • the developer is not limited to an alkaline developer, and may be an aqueous neutral developer or an organic solvent developer. Therefore, when an organic solvent developer is used, a compound having a protective group that can be deprotected by an acid is deprotected from the compound in the exposed area by the acid generated from the photoacid generator upon exposure. It is a compound that produces a group and lowers the solubility in an organic solvent developer.
  • Examples of the polar group include a hydroxy group, a carboxy group, an amino group and a sulfo group. Among these, a polar group having —OH in the structure is preferred, and a hydroxy group or a carboxy group is preferred.
  • Specific examples of protective groups that can be deprotected with an acid include groups that form tertiary alkyl ester groups with carboxy groups; alkoxyacetal groups; tetrahydropyranyl groups; siloxy groups and benzyloxy groups.
  • the compound having the protective group a compound having a styrene skeleton, a methacrylate or an acrylate skeleton to which these protective groups are pendant, and the like are preferably used.
  • the resin (B) may be a protective group-containing low-molecular-weight compound instead of a polymer component having a unit B having a protective group that can be deprotected by acid.
  • the protecting group-containing low-molecular-weight compound has at least one of the units represented by the following (3a) to (3d), similarly to the resin (B).
  • R 7 is any one selected from the group consisting of a hydrogen atom, an alkyl group and a halogenated alkyl group.
  • alkyl group include methyl, ethyl, n-propyl, n-butyl, isopropyl, t-butyl, cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl groups, and some of these hydrogen atoms are halogen may be replaced with Among them, a hydrogen atom, a methyl group, and a trifluoromethyl group are particularly preferred.
  • the moiety represented by the following formula (a-1) or (a-2) is a protecting group that is deprotected by an acid (hereinafter also referred to as an "acid-labile group"). It is decomposed by the action of acid to form carboxylic acid or phenolic hydroxyl groups, which changes the solubility in the developer.
  • the dashed lines in the following formulas (a-1) and (a-2) indicate the bonding portions with L 2 or oxygen atoms in the above formulas (3a) to (3d).
  • R 8 to R 13 in formulas (a-1) and (a-2) below are preferably selected from the same options as R 8 to R 13 in general formulas (3a) to (3d) above.
  • R 8 and R 9 are each independently a linear, branched or cyclic alkyl group which may have a substituent, such as methyl, ethyl, n-propyl, n- -butyl, isopropyl, t-butyl, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, adamantan-1-yl group, adamantan-2-yl group, norbornan-1-yl group and norbornan-2-yl group, etc. and an alkyl group having 1 to 12 carbon atoms.
  • a substituent such as methyl, ethyl, n-propyl, n- -butyl, isopropyl, t-butyl, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, adamantan-1-yl group, adam
  • R 10 is a linear, branched or cyclic alkyl group which may have a substituent, and the alkyl group is selected from the same options as the alkyl groups for R 8 , and some of these hydrogen atoms are It may be substituted with a hydroxyl group, an alkoxy group, an oxo group, an amino group, an alkylamino group, or the like.
  • R 8 , R 9 and R 10 directly form a single bond or form a ring structure through any one selected from the group consisting of an oxygen atom, a sulfur atom, a nitrogen atom-containing group and a methylene group; good too.
  • Substituents that R 8 to R 10 may have include those similar to the first substituents described above.
  • R 11 and R 12 are each independently a hydrogen atom and a linear or cyclic alkyl group, and the alkyl group is the same as the alkyl group for R 8 . is selected from
  • R 13 is a linear, branched or cyclic alkyl group which may have a substituent (also referred to as a “fifth substituent”), and the alkyl group is selected from the same options as the alkyl groups for R 8 . , a part of these hydrogen atoms may be substituted with a fifth substituent such as a hydroxyl group, an alkoxy group, an oxo group, an amino group, an alkylamino group, or the like.
  • R 11 , R 12 and R 13 may form a ring structure directly with a single bond or through any one selected from the group consisting of an oxygen atom, a sulfur atom, a nitrogen atom-containing group and a methylene group. good.
  • R 14 in the general formulas (3c) to (3d) is an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an alkylsulfanyl group, an alkylsulfinyl group, an alkylsulfonyl group, an alkylamino group, a dialkylamino group and a cyano group. , a nitro group and a halogen atom. These are selected from the same options as each of R 3 in formula (1) above.
  • L 2 in the above general formulas (3a) to (3d) is a direct bond, a carbonyloxy group, a carbonylamino group, an optionally substituted linear, branched or cyclic alkylenecarbonyloxy group, or a substituted may be a linear, branched or cyclic alkylenecarbonylamino group, and the carbonyloxy group or carbonylamino group is bonded to the above acid-labile group.
  • l is an integer of 1 to 2
  • m is an integer of 0 to 4 when l is 1, and an integer of 0 to 6 when l is 2
  • n is l is 1, it is an integer of 1 to 5; when l is 2, it is an integer of 1 to 7; when l is 1, m+n is 1 to 5;
  • the composition may contain a compound having a polymerizable group that polymerizes with an acid and/or a cross-linking agent that has a cross-linking action with an acid.
  • a compound having a polymerizable group that is polymerized by an acid is a compound that changes solubility in a developer by being polymerized by an acid.
  • it acts on a compound soluble in an aqueous developer to reduce the solubility of the compound in the aqueous developer after polymerization.
  • Specific examples include compounds having an epoxy group, a vinyloxy group, an oxetanyl group, and the like.
  • the compound having a polymerizable group that is polymerized by an acid may be a polymerizable low-molecular-weight compound or a unit-containing polymer component having a polymerizable group.
  • a cross-linking agent having a cross-linking action with an acid is a compound that changes the solubility in a developer by cross-linking with an acid. For example, in the case of aqueous development, it acts on a compound soluble in an aqueous developer to reduce the solubility of the compound in the aqueous developer after polymerization or crosslinking.
  • Specific examples include cross-linking agents having cross-linkable groups such as epoxy groups, vinyloxy groups, 1-alkoxyamino groups and oxetanyl groups.
  • examples of the compound to be cross-linked that is, the compound that reacts with the cross-linking agent to change the solubility in the developer include compounds having a phenolic hydroxyl group.
  • the compound having a cross-linking action with an acid may be a cross-linkable low-molecular-weight compound or a unit-containing polymer component having a cross-linkable group.
  • the resin (B) may contain other units commonly used in resist compositions in the polymer component. good. Other units include, for example, units having at least one skeleton selected from the group consisting of a lactone skeleton, a sultone skeleton, a sulfolane skeleton, a lactam skeleton, and the like; units having at least one structure selected from the group consisting of structures, etc.; hydroxyaryl group-containing units; and the like.
  • the resin (B) may contain the unit A described above.
  • the resin (B) is a homopolymer containing the unit B, or at least one unit C selected from the group consisting of the unit B, the unit A, and general formulas (4a) to (4b) described later. and may be included in the composition as a copolymer having
  • the unit B in the resin (B) is preferably 3 to 50 mol%, more preferably 5 to 35 mol%, of the total polymer units. More preferably ⁇ 30 mol%.
  • the composition contains a resin (C) containing one or more units C represented by the following formulas (4a) to (4b), or the resin (B) is the above At least one of the units C is preferably further included.
  • R 7 , R 14 and L 2 are each independently selected from the same options as each of R 7 , R 14 and L 2 in formulas (3a) to (3d) above.
  • R 15 is a cyclic group containing at least one selected from the group consisting of -C(O)-O-, -SO 2 - and -O-SO 2 -.
  • p is an integer of 0-4 and q is an integer of 1-5.
  • Examples of the cyclic group include groups containing a lactone skeleton, a sultone skeleton, and a sulfolane skeleton.
  • the unit C represented by the formulas (4a) to (4b) is included in the copolymer containing at least one of the units A and/or the units B represented by the formulas (3a) to (3d). may also be units of another polymer.
  • the unit represented by the above formula (4a) is a hydroxyaryl group-containing unit (hereinafter also referred to as "unit C1")
  • the unit represented by the above formula (4b) is a lactone skeleton; a sultone skeleton; a sulfolane skeleton-containing unit. (hereinafter also referred to as “unit C2”).
  • the polymer having the hydroxyaryl group-containing unit C1 When the polymer having the hydroxyaryl group-containing unit C1 is used, it can serve as a hydrogen source when the photoacid generator decomposes, and the acid generation efficiency can be further improved, resulting in high sensitivity, which is preferable.
  • the polymer having a hydroxyaryl group-containing unit C1 since the polymer having a hydroxyaryl group-containing unit C1 has a low ionization potential, when an electron beam or extreme ultraviolet (EUV) is used as the first active energy beam described later, secondary electrons are easily generated, and the photoacid generation It is preferable because it improves the acid generation efficiency of the agent and provides high sensitivity.
  • EUV extreme ultraviolet
  • the hydroxyaryl group-containing unit C1 is included as a unit of the same polymer together with at least one selected from the group consisting of the unit A and the unit B, the hydroxyaryl group-containing unit C1 is a positive type for aqueous development.
  • the content is preferably 3 to 90 mol %, more preferably 5 to 80 mol %, even more preferably 7 to 70 mol %, based on the total polymer units.
  • the content is preferably 60 to 99 mol %, more preferably 70 to 98 mol %, even more preferably 75 to 98 mol %, based on the total polymer units.
  • lactone skeleton, sultone skeleton, and sulfolane skeleton-containing unit C2 are exemplified below. However, the invention is not so limited.
  • an acid is generated by ionization by electron beam or extreme ultraviolet (EUV) irradiation as the first active energy ray.
  • EUV extreme ultraviolet
  • it is preferable because it contributes to polarity conversion due to the reaction with the resin (B) containing the above unit B, and the solubility of the resin in the developer is further changed, resulting in high sensitivity.
  • the unit C2 includes a lactone skeleton-containing unit, a sultone skeleton-containing unit, and a sulfolane skeleton-containing unit together with at least one selected from the group consisting of the unit A and the unit B as units of the same polymer
  • the unit C2 is It is preferably 3 to 70 mol %, more preferably 5 to 50 mol %, even more preferably 7 to 40 mol % of the total polymer units.
  • composition of one aspect of the present invention in addition to the above unit A, the above unit B, and the above unit C, other compounds are included in the resin (B) and/or the resin (C) as units of the same polymer. good too.
  • Other compounds are not particularly limited as long as they are compounds generally used as resin compositions for ArF lithography, KrF lithography, electron beam lithography, EUV lithography, and the like.
  • composition of one aspect of the invention may comprise a low molecular weight compound or polymer containing a sulfone or sulfonate ester.
  • the above sulfone or sulfonic acid ester is not particularly limited, but preferably has a linear, branched or cyclic alkyl or aryl group. More preferably, some or all of the hydrogen atoms in the alkyl or aryl group are substituted with fluorine atoms.
  • the compound When the compound is contained, it is ionized by irradiation with an electron beam or extreme ultraviolet rays to generate an acid, so that the sensitivity of the resist can be increased.
  • the content of the compound containing sulfone or sulfonic acid ester is preferably 0.1 to 50 parts by weight per 100 parts by weight of the resist composition components excluding the total amount of the photoacid generator.
  • compounds containing sulfones or sulfonate esters include dimethylsulfone, isopropylmethylsulfone, methylphenylsulfone, diphenylsulfone, phenyltrifluoromethylsulfone, bis(4-fluorophenyl)sulfone, bis(phenylsulfonyl)methane, methyl methanesulfonate, isopropyl methanesulfonate, ethyl trifluoromethanesulfonate, methyl benzenesulfonate, 1,3-propanesultone, 1-propene 1,3-sultone, 1,4-butanesultone, 1,2-bis(tosyloxy ) ethane, 1,8-naphthosultone, and the like, each of which may be used alone or in combination of two or more.
  • composition of one aspect of the present invention may contain a fluorine-containing water-repellent polymer.
  • the fluorine-containing water-repellent polymer is not particularly limited, but includes those commonly used in the immersion exposure process, and preferably has a fluorine atom content higher than that of the above polymer.
  • the fluorine-containing water-repellent polymer is unevenly distributed on the surface of the resist film due to the water repellency of the fluorine-containing water-repellent polymer.
  • the fluorine content of the fluorine water-repellent polymer it is preferable that 25 mol % or more of the hydrogen atoms in the hydrocarbon groups in the fluorine water-repellent polymer are fluorinated, and 50 mol % or more is fluorinated. is more preferred.
  • the content of the fluorine water-repellent polymer in the composition should be 0.5 to 10 parts by mass with respect to 100 parts by mass of the polymer (not the fluorine water-repellent polymer) of one embodiment of the present invention. is preferable from the viewpoint of improving the hydrophobicity of the resist film.
  • the fluorine water-repellent polymer may be used alone or in combination of two or more.
  • the composition of one aspect of the invention may comprise a photosensitizer and its precursors.
  • the photosensitizer and its precursor are collectively referred to as a "sensitizing compound".
  • the sensitizing compound is not particularly limited as long as it does not reduce the effect of the onium salt according to some embodiments of the present invention, and includes thioxanthone derivatives and their acetalized compounds, benzophenone derivatives and their acetalized compounds, naphthalene derivatives, Examples include anthracene derivatives, alkyl alcohols and aryl alcohols.
  • a photosensitizer precursor represented by the following general formula (7) may be included as a sensitizing compound.
  • a photosensitizer precursor represented by the following general formula (7) By containing the photosensitizer precursor, a photosensitizer is generated from the photosensitizer precursor by irradiating the first active energy ray, and then by irradiating the second active energy. Since the sensitization reaction that occurs between the photosensitizer and the onium salt according to some embodiments of the present invention can be utilized, the sensitivity of the resist can be increased, which is preferable.
  • Ar 11 and Ar 12 are each independently a phenylene group optionally having a substituent
  • R 21 is a hydrogen atom, optionally having a substituent is any one selected from the group consisting of an alkylsulfanyl group, an arylsulfanyl group and an alkylsulfanylphenyl group
  • W is any one selected from the group consisting of a sulfur atom, an oxygen atom and a direct bond
  • Y is each independently an oxygen atom or a sulfur atom
  • R 23 and R 24 are , each independently selected from the group consisting of linear, branched or cyclic alkyl groups, alkenyl groups, alkynyl groups and aralkyl groups which may have a substituent; 23 and R 24 may combine with each other to form a ring structure with two Y in the formula.
  • Ar 11 and Ar 12 in the above formula (6) are each a phenylene group, and substituents other than R 21 or -WR 22 (hereinafter, the substituents of Ar 11 and Ar 12 are referred to as "sixth substituents group").
  • Ar 11 and Ar 12 may form a ring structure directly or via a divalent linking group. Examples of the divalent linking group include alkylene, an oxygen atom, a sulfur atom, and the like. An electron donating group is mentioned as said 6th substituent.
  • the electron-donating group examples include alkyl groups, alkenyl groups, alkoxy groups, alkoxyphenyl groups, alkylsulfanyl groups, arylsulfanyl groups and alkylsulfanylphenyl groups.
  • the sixth substituent also includes a long chain alkoxy group having a polyethylene glycol chain (-(CO 2 H 4 ) n -). Also, when the sixth substituent is bonded to the para-position of Ar 11 or Ar 12 , it may have an OH group as the sixth substituent.
  • the substitution position such as the “para position” of Ar 11 or Ar 12 is the position relative to the group to which the quaternary carbons bonded to two Ys and Ar 11 and Ar 12 in the above formula (6) are bonded.
  • the standard of the substitution position such as "para-position” is the position relative to the group bonded to the quaternary carbon.
  • the alkyl group and alkenyl group as the sixth substituent are selected from the same options as the alkyl group and alkenyl group for R 11 in formula (1) above.
  • the alkoxy group as the sixth substituent is selected from the same options as those for the alkoxy group in the first substituent.
  • alkylsulfanyl group, arylsulfanyl group and alkylsulfanylphenyl group as the sixth substituent include those similar to the alkylsulfanyl group, arylsulfanyl group and alkylsulfanylphenyl group for R 21 described later.
  • it is preferable that the heteroatoms such as —O—O, —S—S— and —S—O— are not connected continuously.
  • the phenylene groups Ar 11 and Ar 12 are bonded to the ortho and/or para positions of the phenylene group. preferably. In that case, the number of substituents is preferably three or less.
  • R 21 in the above formula (6) is any one selected from the group consisting of optionally substituted alkylsulfanyl groups, arylsulfanyl groups and alkylsulfanylphenyl groups.
  • the alkylsulfanyl group for R 21 is preferably an alkylsulfanyl group having 1 to 20 carbon atoms such as methylsulfanyl group, ethylsulfanyl group, n-propylsulfanyl group, n-butylsulfanyl group, and 1 to 12 carbon atoms. is more preferred.
  • Specific examples of the arylsulfanyl group for R 21 include a phenylsulfanyl group and a naphthylsulfanyl group.
  • alkylsulfanylphenyl group for R 21 preferably include a phenyl group to which an alkylsulfanyl group having 1 to 20 carbon atoms such as a methylsulfanylphenyl group, an ethylsulfanylphenyl group, a propylsulfanylphenyl group, and a butylsulfanylphenyl group are bonded. and more preferably a phenyl group to which an alkylsulfanyl group having 1 to 12 carbon atoms is attached.
  • substitution position of the alkylsulfanyl group bonded to the phenylene group in R 21 is not particularly limited, but the para-position is preferred from the viewpoint of increasing the electron-donating property and the molar absorption coefficient at 365 nm.
  • the above R 21 is preferably bonded to the ortho- or para-position of the phenylene group Ar 11 .
  • R 22 in the above formula (6) is either an optionally substituted alkyl group or an aryl group, and is selected from the same options as for each of R 11 above.
  • R 21 and R 22 in the above formula (6) may have a substituent, and the substituent (hereinafter, the substituent of R 21 and R 22 will be referred to as a “seventh substituent”) is particularly Examples include, but are not limited to, an electron-withdrawing group in addition to the sixth substituent.
  • a nitro group, a sulfonyl group, etc. are mentioned as an electron withdrawing group.
  • a polymerizable group may be introduced into R 21 or R 22 , and the resulting polymer may be used as a polymer imparted with a sensitizing effect.
  • the polymerizable group include a (meth)acryloyloxy group, an epoxy group, and a vinyl group.
  • W in the above formula (6) is an oxygen atom or a sulfur atom, it is preferred that the above W is at the ortho- or para-position of Ar 12 .
  • said W is a direct bond, said W is preferably at the ortho or para position of Ar 12 .
  • the total carbon number of R 21 in the above formula (6) is not particularly limited, and when R 21 has a substituent, it preferably has a total carbon number of 1-20.
  • the total carbon number of R 22 in the above formula (6) is not particularly limited, and when R 22 has a substituent, it preferably has a total carbon number of 1-20.
  • the photosensitizer precursor is a polymer
  • the total carbon number of R 21 and R 22 excluding the portion containing the polymer main chain serving as the seventh substituent is preferably 1-20.
  • R 23 and R 24 each independently represent an optionally substituted linear, branched or cyclic alkyl group, an optionally substituted linear, branched or cyclic from the group consisting of an alkenyl group, an optionally substituted linear, branched or cyclic alkynyl group, and an optionally substituted linear, branched or cyclic aralkyl group Either selected.
  • the alkyl group and alkenyl group for R 23 and R 24 are selected from the same options as the alkyl group and alkenyl group for R 11 in formula (1) above.
  • the alkynyl group for R 23 and R 24 is selected from those in which part of the alkyl groups for R 23 and R 24 are triple bonds.
  • the aralkyl group for R 23 and R 4 is selected from those in which some of the hydrogen atoms in the alkyl groups for R 23 and R 24 are substituted with aryl groups such as phenyl and naphthyl groups.
  • R 23 and R 24 in the above formula (6) may have a substituent, and the substituent (hereinafter, the substituent of R 23 and R 24 is referred to as the "eighth substituent") is particularly In addition to the seventh substituent, aryl groups such as a phenyl group and a naphthyl group are also included, although not limited thereto.
  • the total carbon number of R 23 and R 24 in the formula (6) is not particularly limited, and the photosensitizer precursor may be a constituent component of a polymer, but R 23 or R 24 may be a substituent. When it has, it is preferable that each has a total carbon number of 1 to 20.
  • R 23 and R 24 may combine with each other to form a ring structure with two Y in the formula. That is, the photosensitizer precursor according to one aspect of the present invention is represented by the following formula (7).
  • -R 25 -R 26 - is preferably -(CH 2 ) n -, where n is an integer of 2 or more. Although n is not particularly limited as long as it is 2 or more, it is preferably 8 or less for ease of synthesis.
  • R 25 and R 26 correspond to R 23 and R 24 in the above formula (6) combined to form a ring.
  • R 25 and R 26 may have the same eighth substituent as R 23 and R 24 above.
  • a polymerizable group may be introduced into the above R 23 or R 24 , and a polymer obtained by polymerizing this may be used as a polymer imparted with a sensitizing action.
  • the total carbon number of R 23 and R 24 is preferably 1-20.
  • the photosensitizer precursor is a polymer
  • the total number of carbon atoms in R 23 and R 24 excluding the portion containing the polymer main chain serving as the eighth substituent is preferably 1-20.
  • the photosensitizer having a carbonyl group generated when the photosensitizer precursor is deprotected by acid has a molar absorption coefficient of 1 at 365 nm. It is preferably 0 ⁇ 10 5 cm 2 /mol or more. A higher molar extinction coefficient at 365 nm is preferable, but a realistic value is 1.0 ⁇ 10 10 cm 2 /mol or less.
  • the photosensitizer precursor contains, for example, one or more alkylsulfanyl groups, arylsulfanyl groups, alkylsulfanylphenyl groups, or two or more alkoxy groups or aryloxy groups.
  • the molar extinction coefficient is at 365 nm measured with a UV-VIS spectrophotometer using chloroform as a solvent.
  • the photosensitizer precursor according to one aspect of the present invention has -YR 23 and -YR 24 in the whole photosensitizer precursor in terms of ease of synthesis and light absorption characteristics or 4 or less groups selected from the group consisting of alkylsulfanyl groups, arylsulfanyl groups, alkoxyphenyl groups, alkylsulfanylphenyl groups, alkoxy groups and aryloxy groups other than -YR 25 -R 26 -Y- is preferably
  • photosensitizer precursor represented by formula (6) or formula (7) include the following photosensitizer precursors. In the following examples, those shown in parentheses represent polymer units. Photosensitizer precursors in some embodiments of the present invention are not limited to this.
  • the photosensitizer precursor according to one aspect of the present invention has a structure represented by the following formula (8), it can be synthesized, for example, by the following method.
  • composition according to one aspect of the present invention may optionally further contain an acid diffusion control agent, a surfactant, an organic carboxylic acid, an organic solvent, and a dissolution inhibitor, which are used in ordinary resist compositions. , stabilizers and dyes, polymers other than those described above, and the like.
  • the acid diffusion control agent has the effect of controlling the diffusion phenomenon of the acid generated from the photo-acid generator in the resist film and controlling undesirable chemical reactions in the non-exposed regions. Therefore, the storage stability of the obtained resist composition is further improved, and the resolution as a resist is further improved, and the line width change of the resist pattern due to the variation of the holding time from exposure to development can be suppressed. , a resist composition having excellent process stability can be obtained.
  • the acid diffusion control agent examples include compounds having one nitrogen atom, compounds having two nitrogen atoms, compounds having three nitrogen atoms in the same molecule, amide group-containing compounds, urea compounds, nitrogen-containing heterocyclic compounds, and the like. be done.
  • a photodegradable base that is sensitized by exposure to generate a weak acid can also be used.
  • Photodegradable bases include, for example, onium salt compounds and iodonium salt compounds which are decomposed by exposure to lose acid diffusion controllability.
  • the content of the acid diffusion control agent is preferably 0.01 to 10 parts by mass, more preferably 0.03 to 5 parts by mass, more preferably 0.05 to 0.05 parts by mass, based on 100 parts by mass of the resist composition components. More preferably, it is 3 parts by mass.
  • the surfactant is preferably used to improve coatability. Examples of surfactants include nonionic surfactants such as polyoxyethylene alkyl ethers, polyoxyethylene alkyl allyl ethers, polyoxyethylene polyoxypropylene block copolymers, sorbitan fatty acid esters, and polyoxyethylene sorbitan fatty acid esters. agents, fluorine-based surfactants, organosiloxane polymers, and the like.
  • the content of the surfactant is preferably 0.0001 to 2 parts by mass, more preferably 0.0005 to 1% by mass, per 100 parts by mass of the resist composition components.
  • organic carboxylic acids examples include aliphatic carboxylic acids, alicyclic carboxylic acids, unsaturated aliphatic carboxylic acids, oxycarboxylic acids, alkoxycarboxylic acids, ketocarboxylic acids, benzoic acid derivatives, phthalic acid, terephthalic acid, isophthalic acid, 2 -naphthoic acid, 1-hydroxy-2-naphthoic acid, 2-hydroxy-3-naphthoic acid and the like.
  • phthalic acid terephthalic acid
  • isophthalic acid 2 -naphthoic acid, 1-hydroxy-2-naphthoic acid, 2-hydroxy-3-naphthoic acid and the like.
  • 1-Hydroxy-2-naphthoic acid, 2-hydroxy-3-naphthoic acid are preferred.
  • the content of the organic carboxylic acid is preferably 0.01 to 10 parts by mass, more preferably 0.01 to 5 parts by mass, and still more preferably 0.01 to 3 parts by mass with respect to 100 parts by mass of the resist composition components. is.
  • organic solvents examples include ethylene glycol monoethyl ether acetate, cyclohexanone, 2-heptanone, propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether propionate, and propylene glycol monoethyl ether.
  • the components of the resist composition are preferably dissolved in the above organic solvent at a solid content concentration of 1 to 40% by mass. More preferably 1 to 30 mass %, still more preferably 3 to 20 mass %. By setting the solid content concentration in such a range, the above film thickness can be achieved.
  • the polymer When the resist composition of one aspect of the present invention contains a polymer, the polymer preferably has a weight average molecular weight of 2000 to 200000, more preferably 2000 to 50000, and further preferably 2000 to 15000. preferable.
  • the preferred dispersity (molecular weight distribution) (Mw/Mn) of the polymer is 1.0 to 1.7, more preferably 1.0 to 1.2, from the viewpoint of sensitivity.
  • the weight-average molecular weight and dispersity of the polymer are defined as polystyrene-equivalent values by GPC measurement.
  • a composition of one aspect of the present invention is obtained by mixing each component of the above composition, and the mixing method is not particularly limited.
  • One aspect of the present invention includes the steps of forming a resist film by applying the composition onto a substrate, and irradiating the resist film with a first active energy ray;
  • a method of manufacturing a device comprising the steps of: irradiating a resist film after being irradiated with the first active energy ray with a second active energy ray; and developing the resist film after being irradiated with the second active energy ray to obtain a pattern. is.
  • One embodiment of the present invention includes the steps of forming a resist film, irradiating with a first active energy ray, irradiating with a second active energy, and forming a pattern using the above composition, It may be a method for manufacturing a substrate having a pattern before obtaining singulated chips.
  • One form of the present invention is a step of forming a coating film on a substrate using the above composition, exposing the coating film using a first active energy ray and a second active energy ray, and forming an interlayer insulating film. It may be a device manufacturing method including the step of obtaining
  • the first active energy ray and the second active energy ray are not particularly limited as long as the onium salt according to some embodiments of the present invention does not have significant absorption in the second active energy ray.
  • the wavelength of the radiation is shorter than that of the second active energy radiation, or the energy of the photon or particle radiation is higher.
  • Each actinic energy ray is exemplified below, but is not limited thereto if the wavelength of the first actinic energy ray is shorter than that of the second actinic energy ray, or if the energy of the photon or particle beam is high.
  • the first active energy ray is not particularly limited as long as it can generate active species (first active species) such as acid in the resist film after irradiation of the resist film, but examples include KrF excimer laser light and ArF excimer laser light. Light, electron beams, extreme ultraviolet (EUV), and the like are preferred.
  • active species such as acid in the resist film after irradiation of the resist film
  • examples include KrF excimer laser light and ArF excimer laser light.
  • the acetal site or thioacetal site of the onium salt according to some embodiments of the present invention is deprotected by the acid generated in the resist film after the irradiation of the first active energy ray.
  • Any light may be used as long as it can activate the ketone derivative to generate an active species (second active species) such as an acid.
  • active species such as an acid.
  • it means KrF excimer laser light, UV, visible light, etc.
  • UV light it is particularly preferable to use light in the range of 365 nm (i-line) to 436 nm (g-line).
  • a device manufacturing method preferably includes a heating step between the step of applying the first activation energy and the step of applying the second activation energy ray.
  • a heating method includes, but is not limited to, heating with a heating wire, laser, or the like. Having the heating step improves the decomposition efficiency of the onium salt, which can lead to further improvement in sensitivity. Heating using a heating wire includes implementation using a hot plate or the like. In the device manufacturing method, the implementation of prebaking corresponds to this step.
  • the onium salts represented by the above formulas (1) and (2) include the above R 5 and the above R 6 as the third substituent.
  • tertiary alcohols are more likely than primary alcohols and secondary alcohols to produce water by the E1 elimination reaction using the acid produced by irradiation with the first active energy ray as a catalyst, and the above heating This is because the step further promotes the E1 elimination reaction.
  • the acetal site or thioacetal site of the onium salts represented by the above formulas (1) and (2) is hydrolyzed and deprotected, resulting in a ketone that absorbs the second active energy ray. Change to a derivative.
  • the amount of acid generated can be amplified, so that the sensitivity is further improved.
  • the heating step also includes, but is not limited to, heating by a heating wire, laser, or the like, similar to the heating between the step of irradiating the first activation energy and the step of irradiating the second activation energy ray.
  • the substrate is not particularly limited, and known substrates can be used. Examples include metal substrates such as silicon, silicon nitride, titanium, tantalum, palladium, copper, chromium, and aluminum; glass substrates; and the like.
  • the active energy beam used for exposure in the photolithography process used to obtain an interlayer insulating film for LSI fabrication includes UV, KrF excimer laser light, ArF excimer laser light, electron beam, or Extreme ultraviolet rays (EUV) are preferred.
  • the irradiation amount of the first active energy ray varies depending on the type and blending ratio of each component in the photocurable composition, the film thickness of the coating film, etc., but it should be 1 J/cm 2 or less or 1000 ⁇ C/cm 2 or less. is preferred.
  • the thickness of the resist film formed from the resist composition is preferably 10 to 200 nm.
  • the above resist composition is applied onto a substrate by a suitable coating method such as spin coating, roll coating, flow coating, dip coating, spray coating, doctor coating, etc., and is heated at 60 to 150° C. for 1 to 20 minutes, preferably 80 to 80 minutes.
  • a thin film is formed by pre-baking at 120° C. for 1 to 10 minutes.
  • the film thickness of this coating film is 5 to 200 nm, preferably 10 to 100 nm.
  • Synthesis Example 7 Synthesis of 3′,5′-difluorophenyl-2-[dimethoxy-(4-methoxyphenyl)methyl]dibenzothiophenium-nonafluorobutanesulfonate (sulfonium salt 4)
  • Synthesis Example 3 above 1 By performing the same operation as in Synthesis Example 3 above except that a 1.0 mol/L THF solution of 3,5-difluorophenylmagnesium bromide was used in place of the 0 mol/L THF solution of phenylmagnesium bromide, 3,5- 3.1 g of difluorophenyl-2-[dimethoxy-(4-methoxyphenyl)methyl]dibenzothiophenium-nonafluorobutanesulfonate are obtained.
  • Phenyl-2-[4-methoxyphenyl-[1,3]dioxepane was obtained in the same manner as in Synthetic Example 3 above, except that butanesulfonate was used and 1,4-butanediol was used in place of methanol. 2.0 g of 2-yl]methyldibenzothiophenium-nonafluorobutanesulfonate are obtained.
  • phenyl-2-[(4-methoxyphenyl)]methyl-4,6-dimethyldibenzothiophenium-nonafluorobutanesulfonate is obtained in the same manner as in Synthesis Example 4 except that phenyl-2-[(4-methoxyphenyl)]methyl-4,6-dimethyldibenzothiophenium-nonafluorobutanesulfonate is used.
  • Phenyl-2-[di(3-hydroxy-3) was obtained in the same manner as in Synthetic Example 3 above, except that butanesulfonate was used and 3-methyl-1,3-butanediol was used in place of methanol. 2.8 g of -methyl)butoxy-(4-methoxyphenyl)methyl]dibenzothiophenium-nonafluorobutanesulfonate are obtained.
  • the polymer is precipitated by dropping the solution into 260 g of pure water.
  • the solid obtained by separating this by filtration under reduced pressure is washed twice with 300 g of pure water, and then vacuum-dried to obtain 9.2 g of polymer A shown below as a white solid.
  • the monomer ratio of the unit of the polymer in the present invention is not limited to the following.
  • the polymer is precipitated by dropping this into a mixed solvent of 149 g of hexane and 12 g of THF.
  • the solid obtained by separating the precipitated polymer by filtration under reduced pressure is washed with 52 g of hexane and then vacuum-dried to obtain 10.3 g of polymer B represented by the following formula as a white solid.
  • a weight-average molecular weight of 9,200 is obtained by polystyrene conversion using gel permeation chromatography.
  • the monomer ratio of the unit of the polymer in the present invention is not limited to the following.
  • Samples were prepared as follows. A sample was prepared by adding 200 mg of the polymer A, 0.045 mol of a photoacid generator (PAG), and 0.0012 mmol of coumarin 6 as an indicator to 3000 mg of cyclohexanone. As the PAG, any one of the sulfonium salts 1 and 8 and the sulfonium salts 15 to 19 shown below was used. Details are shown in Table 1.
  • PAG photoacid generator
  • the acid generation efficiency per irradiation dose is obtained from the slope of the linear function of the irradiation dose and the absorbance, and the relative acid generation efficiency based on the sulfonium salt 20 is calculated.
  • Table 1 shows the results. Specifically, the acid generation efficiency of Samples 1 to 6 of Examples 1 to 2 and Comparative Examples 1 to 4, respectively, was 1.00 compared to the acid generation efficiency of Sample 7 (Comparative Example 5) to which sulfonium salt 20 was added. As a relative value, the evaluation results of Samples 1 to 6 (Examples 1 to 2 and Comparative Examples 1 to 4) were calculated. A higher acid generation efficiency indicates a better effect.
  • Samples 1-2 (Examples 1-2) containing the sulfonium salt of some embodiments of the present invention have higher acid generation efficiencies compared to Comparative Examples 1, 4 and 5.
  • Comparative Examples 2 and 3 containing sulfonium salts 17 and 18 instead of dibenzothiophenium, the efficiency of acid generation by EUV irradiation is lower than that of sulfonium salt 20.
  • a compound having an acetal moiety or a thioacetal moiety causes electron donation and tends to decrease reactivity with secondary electrons generated by EUV irradiation. Due to the structure, the reactivity with secondary electrons generated in the polymer by EUV irradiation is less likely to decrease.
  • the sulfonium salts 17 and 18 tend to have lower electron-accepting properties in the polymer under the influence of electron-donating properties when irradiated with the first activation energy such as EUV.
  • the same effect as in Example 1 can be obtained even when Polymer D is used in place of Sample 1 of Example 1.
  • the sulfonium salt of some embodiments of the present invention is used in the step of UV irradiation after EUV or electron beam irradiation, the high efficiency of acid generation in EUV or electron beam results in the effect of acid generation by subsequent UV irradiation. can be used effectively.
  • Samples were prepared as follows. To 3000 mg of cyclohexanone, 100 mg of the polymer C, 0.024 mmol each of the above sulfonium salts 1, 8, 13, 16 to 19 as a photoacid generator (PAG), and 0.02 mmol of triisoamylamine as an acid diffusion controller. Samples were prepared by adding 0.10 mmol.
  • PAG photoacid generator
  • a silicon wafer modified with hexamethylenedisilazane in advance is spin-coated with the resist composition sample 1 above.
  • a substrate with a coating film having a thickness of 100 nm is obtained.
  • a 50 nm line-and-space pattern is drawn on the coating film of the substrate using an electron beam drawing apparatus.
  • the substrate was exposed entirely to a UV-LED of 395 nm with an exposure amount of 1000 mJ/cm 2 and then heated on a hot plate at 110° C. for 1 minute.
  • the sensitivity of each sample is the sensitivity of the sample (Comparative Example 9) to which the sulfonium salt 19 was added, and the sensitivity of the sample (Examples 3 to 5 and Comparative Examples 6 to 8) is evaluated against it as 1.00. was calculated as a relative value. Relative sensitivity indicates that the smaller the value, the better the effect.
  • Examples 3 and 4 which are samples containing the onium salt according to some aspects of the present invention, exhibited higher sensitivity than Comparative Example 9 in both polymers.
  • the reason is presumed to be as follows.
  • the sulfonium salts 1 and 8 (Examples 3 and 4) in some embodiments of the present invention deprotected the acetal group by the acid generated in the resist film by the electron beam, which is the first activation energy beam, to form a ketone derivative.
  • ketone derivative has absorption in UV, which is the second active energy ray, it can directly generate an acid when excited by UV irradiation.
  • the sulfonium salt 19 (Comparative Example 9) does not change to absorb the second active energy ray, UV.
  • the sensitivity is equivalent depending on the electron beam irradiation, in Examples 3 and 4, the sensitivity is increased by further generating acid by being excited by UV irradiation. It can be seen that it is sensitive.
  • sulfonium salt 13 had higher sensitivity than sulfonium salt 8. Since the sulfonium salt 13 has a tertiary alcohol at the end of the acetal group, it produces water using an acid generated by irradiation with an electron beam, which is the first active energy ray, as a catalyst. Hydrolysis is promoted by using this water, and the amount of ketone derivative produced before UV irradiation, which is the second active energy ray, is greater when sulfonium salt 13 is used than when sulfonium salt 8 is used. Tend. Therefore, it can be seen that the sample 10 using the sulfonium salt 13 has an improved amount of acid generated by UV irradiation and has a high sensitivity.
  • the onium salts of some embodiments of the invention are more sensitive than sulfonium salt 18 (Comparative Example 8).
  • the sulfonium salts 1 and 8 (Examples 3 and 4) have a dibenzothiophene skeleton, the decrease in electron-accepting property is less likely to occur. Therefore, in Comparative Example 8, the amount of acid generated before UV irradiation is smaller than in Examples 3 and 4. As shown in FIG. 1, the ketone derivative of the sulfonium salt 18 of Comparative Example 8 has a UV absorption at 395 nm, which is the second active energy ray, 10 times that of the ketone derivatives of the sulfonium salts 1 and 8 used in Examples 3 and 4.
  • sulfonium salts 1 and 8 have a hydroxyl group at the ortho or para position as R 4 , their affinity for alkaline developing solutions is improved, and thus the solubility of the sulfonium salts tends to be improved during development.
  • an onium salt is structurally changed into a ketone derivative by an active species generated by irradiation with a first active energy ray such as an electron beam or extreme ultraviolet rays, and the ketone derivative is converted into an active species by irradiation with a second active energy ray.
  • a resin composition containing an onium salt capable of generating
  • the onium salt has a specific substituent or a specific structure, specifically a benzothiophene structure, the absorption of the irradiated UV wavelength is improved. Therefore, the resin composition containing the onium salt can be a highly sensitive resist composition that efficiently generates acid upon UV irradiation.

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JP2022191200A (ja) * 2021-06-15 2022-12-27 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
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WO2026048564A1 (ja) * 2024-08-28 2026-03-05 富士フイルム株式会社 感光性組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法

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