JPWO2020071175A5 - - Google Patents
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- Publication number
- JPWO2020071175A5 JPWO2020071175A5 JP2020550313A JP2020550313A JPWO2020071175A5 JP WO2020071175 A5 JPWO2020071175 A5 JP WO2020071175A5 JP 2020550313 A JP2020550313 A JP 2020550313A JP 2020550313 A JP2020550313 A JP 2020550313A JP WO2020071175 A5 JPWO2020071175 A5 JP WO2020071175A5
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- gallium
- oxide
- gallium oxide
- ppm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018189092 | 2018-10-04 | ||
| JP2018189092 | 2018-10-04 | ||
| PCT/JP2019/037274 WO2020071175A1 (ja) | 2018-10-04 | 2019-09-24 | 原子層堆積法用薄膜形成用原料、薄膜形成用原料、薄膜の製造方法および化合物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020071175A1 JPWO2020071175A1 (ja) | 2021-09-02 |
| JPWO2020071175A5 true JPWO2020071175A5 (https=) | 2022-09-21 |
| JP7368372B2 JP7368372B2 (ja) | 2023-10-24 |
Family
ID=70055026
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020550313A Active JP7368372B2 (ja) | 2018-10-04 | 2019-09-24 | 薄膜の製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11555044B2 (https=) |
| EP (1) | EP3862462A4 (https=) |
| JP (1) | JP7368372B2 (https=) |
| KR (1) | KR102775932B1 (https=) |
| CN (1) | CN112789367A (https=) |
| IL (1) | IL281975B2 (https=) |
| TW (1) | TWI848976B (https=) |
| WO (1) | WO2020071175A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240167154A1 (en) * | 2021-03-08 | 2024-05-23 | Adeka Corporation | Thin-film forming raw material, which is used in atomic layer deposition method, thin-film, method of producing thin-film, and zinc compound |
| EP4123061A1 (en) * | 2021-07-22 | 2023-01-25 | Siltronic AG | Method for producing a gallium oxide layer on a substrate |
| JPWO2023182313A1 (https=) * | 2022-03-25 | 2023-09-28 | ||
| WO2023182312A1 (ja) * | 2022-03-25 | 2023-09-28 | 国立大学法人東海国立大学機構 | β型酸化ガリウム膜付き基板及びその製造方法 |
| JPWO2023182311A1 (https=) * | 2022-03-25 | 2023-09-28 | ||
| JP2025537314A (ja) * | 2022-11-18 | 2025-11-14 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 気相薄膜堆積技術のための熱安定性が改善された分子内安定化第１３族金属複合体 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62276832A (ja) * | 1986-05-26 | 1987-12-01 | Hitachi Ltd | 被膜形成方法およびそれを用いた半導体装置の製造方法 |
| DE3631469A1 (de) * | 1986-09-16 | 1988-03-17 | Merck Patent Gmbh | Metallorganische verbindungen |
| US5149853A (en) * | 1986-09-16 | 1992-09-22 | Merck Patent Gesellschaft Mit Beschraenkter Haftung | Organometallic compounds |
| DE3907579A1 (de) * | 1989-03-09 | 1990-09-13 | Merck Patent Gmbh | Verwendung von metallorganischen verbindungen zur abscheidung duenner filme aus der gasphase |
| US7956168B2 (en) * | 2006-07-06 | 2011-06-07 | Praxair Technology, Inc. | Organometallic compounds having sterically hindered amides |
| WO2010055423A2 (en) * | 2008-05-29 | 2010-05-20 | L'air Liquide - Societe Anonyme Pour I'etude Et I'exploitation Des Procedes Georges Claude | Tellurium precursors for film deposition |
| EP2492273A1 (en) * | 2011-02-23 | 2012-08-29 | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Deposition of gallium containing thin films using gallium alkylamide precursor |
| SG10201607194PA (en) | 2011-09-23 | 2016-10-28 | Novellus Systems Inc | Plasma activated conformal dielectric film deposition |
| KR101840759B1 (ko) | 2014-01-05 | 2018-05-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 공간적인 원자 층 증착 또는 펄스형 화학 기상 증착을 사용하는 필름 증착 |
| JP6249875B2 (ja) * | 2014-05-14 | 2017-12-20 | 株式会社Adeka | コバルト化合物、薄膜形成用原料及び薄膜の製造方法 |
| KR20160082321A (ko) * | 2014-12-31 | 2016-07-08 | 주식회사 유진테크 머티리얼즈 | 알루미늄 박막 증착용 전구체 및 이를 이용한 박막 증착 방법 |
| EP3310942B1 (en) | 2015-06-16 | 2022-07-13 | Versum Materials US, LLC | Processes for depositing silicon-containing films |
| CA2920646A1 (en) * | 2016-02-12 | 2017-08-12 | Seastar Chemicals Inc. | Organometallic compound and method |
| JP6703269B2 (ja) | 2016-07-12 | 2020-06-03 | 富士通株式会社 | 化合物半導体装置及びその製造方法 |
-
2019
- 2019-09-16 TW TW108133196A patent/TWI848976B/zh active
- 2019-09-24 EP EP19869747.6A patent/EP3862462A4/en active Pending
- 2019-09-24 KR KR1020217012355A patent/KR102775932B1/ko active Active
- 2019-09-24 US US17/281,105 patent/US11555044B2/en active Active
- 2019-09-24 IL IL281975A patent/IL281975B2/en unknown
- 2019-09-24 WO PCT/JP2019/037274 patent/WO2020071175A1/ja not_active Ceased
- 2019-09-24 CN CN201980065368.7A patent/CN112789367A/zh active Pending
- 2019-09-24 JP JP2020550313A patent/JP7368372B2/ja active Active
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