IL281975B2 - Thin-film forming raw material for use in atomic layer deposition method, thin-film forming raw material, method for producing thin-film, and compound - Google Patents

Thin-film forming raw material for use in atomic layer deposition method, thin-film forming raw material, method for producing thin-film, and compound

Info

Publication number
IL281975B2
IL281975B2 IL281975A IL28197521A IL281975B2 IL 281975 B2 IL281975 B2 IL 281975B2 IL 281975 A IL281975 A IL 281975A IL 28197521 A IL28197521 A IL 28197521A IL 281975 B2 IL281975 B2 IL 281975B2
Authority
IL
Israel
Prior art keywords
thin
raw material
film
compound
film forming
Prior art date
Application number
IL281975A
Other languages
English (en)
Hebrew (he)
Other versions
IL281975B1 (en
IL281975A (en
Original Assignee
Adeka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adeka Corp filed Critical Adeka Corp
Publication of IL281975A publication Critical patent/IL281975A/en
Publication of IL281975B1 publication Critical patent/IL281975B1/en
Publication of IL281975B2 publication Critical patent/IL281975B2/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45553—Atomic layer deposition [ALD] characterized by the use of precursors specially adapted for ALD

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
IL281975A 2018-10-04 2019-09-24 Thin-film forming raw material for use in atomic layer deposition method, thin-film forming raw material, method for producing thin-film, and compound IL281975B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018189092 2018-10-04
PCT/JP2019/037274 WO2020071175A1 (ja) 2018-10-04 2019-09-24 原子層堆積法用薄膜形成用原料、薄膜形成用原料、薄膜の製造方法および化合物

Publications (3)

Publication Number Publication Date
IL281975A IL281975A (en) 2021-05-31
IL281975B1 IL281975B1 (en) 2025-02-01
IL281975B2 true IL281975B2 (en) 2025-06-01

Family

ID=70055026

Family Applications (1)

Application Number Title Priority Date Filing Date
IL281975A IL281975B2 (en) 2018-10-04 2019-09-24 Thin-film forming raw material for use in atomic layer deposition method, thin-film forming raw material, method for producing thin-film, and compound

Country Status (8)

Country Link
US (1) US11555044B2 (https=)
EP (1) EP3862462A4 (https=)
JP (1) JP7368372B2 (https=)
KR (1) KR102775932B1 (https=)
CN (1) CN112789367A (https=)
IL (1) IL281975B2 (https=)
TW (1) TWI848976B (https=)
WO (1) WO2020071175A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240167154A1 (en) * 2021-03-08 2024-05-23 Adeka Corporation Thin-film forming raw material, which is used in atomic layer deposition method, thin-film, method of producing thin-film, and zinc compound
EP4123061A1 (en) * 2021-07-22 2023-01-25 Siltronic AG Method for producing a gallium oxide layer on a substrate
JPWO2023182313A1 (https=) * 2022-03-25 2023-09-28
JPWO2023182311A1 (https=) * 2022-03-25 2023-09-28
WO2023182312A1 (ja) * 2022-03-25 2023-09-28 国立大学法人東海国立大学機構 β型酸化ガリウム膜付き基板及びその製造方法
CN120476123A (zh) * 2022-11-18 2025-08-12 默克专利有限公司 用于气相薄膜沉积技术的具有改善的热稳定性的分子内稳定的13族金属络合物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5149853A (en) * 1986-09-16 1992-09-22 Merck Patent Gesellschaft Mit Beschraenkter Haftung Organometallic compounds
US5209952A (en) * 1989-03-09 1993-05-11 Merck Patent Gesellschaft Mit Beschraenkter Haftung Use of organometallic compounds to deposit thin films from the gas phase
KR20160082350A (ko) * 2014-12-31 2016-07-08 주식회사 유진테크 머티리얼즈 유기 13족 전구체 및 이를 이용한 박막 증착 방법

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62276832A (ja) * 1986-05-26 1987-12-01 Hitachi Ltd 被膜形成方法およびそれを用いた半導体装置の製造方法
DE3631469A1 (de) * 1986-09-16 1988-03-17 Merck Patent Gmbh Metallorganische verbindungen
US7956168B2 (en) * 2006-07-06 2011-06-07 Praxair Technology, Inc. Organometallic compounds having sterically hindered amides
US8101237B2 (en) * 2008-05-29 2012-01-24 L'Air Liquide SociétéAnonyme pour I'Etude et I'Exploitation des Procédés Georges Claude Tellurium precursors for film deposition
EP2492273A1 (en) * 2011-02-23 2012-08-29 L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude Deposition of gallium containing thin films using gallium alkylamide precursor
JP6199292B2 (ja) 2011-09-23 2017-09-20 ノベラス・システムズ・インコーポレーテッドＮｏｖｅｌｌｕｓ Ｓｙｓｔｅｍｓ Ｉｎｃｏｒｐｏｒａｔｅｄ プラズマ活性化されるコンフォーマル誘電体膜
WO2015103358A1 (en) 2014-01-05 2015-07-09 Applied Materials, Inc. Film deposition using spatial atomic layer deposition or pulsed chemical vapor deposition
JP6249875B2 (ja) * 2014-05-14 2017-12-20 株式会社Adeka コバルト化合物、薄膜形成用原料及び薄膜の製造方法
EP4092154A1 (en) 2015-06-16 2022-11-23 Versum Materials US, LLC Processes for depositing silicon-containing films using same
CA2920646A1 (en) * 2016-02-12 2017-08-12 Seastar Chemicals Inc. Organometallic compound and method
JP6703269B2 (ja) 2016-07-12 2020-06-03 富士通株式会社 化合物半導体装置及びその製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5149853A (en) * 1986-09-16 1992-09-22 Merck Patent Gesellschaft Mit Beschraenkter Haftung Organometallic compounds
US5209952A (en) * 1989-03-09 1993-05-11 Merck Patent Gesellschaft Mit Beschraenkter Haftung Use of organometallic compounds to deposit thin films from the gas phase
KR20160082350A (ko) * 2014-12-31 2016-07-08 주식회사 유진테크 머티리얼즈 유기 13족 전구체 및 이를 이용한 박막 증착 방법

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SCHUMANN, HERBERT, UWE HARTMANN, AND WILFRIED WASSERMANN., NOVEL INTRAMOLECULARLY STABILIZED ORGANOGALLIUM AND ORGANOINDIUM COMPOUNDS AND THEIR USE IN MOVPE., 31 December 1990 (1990-12-31) *

Also Published As

Publication number Publication date
CN112789367A (zh) 2021-05-11
US20210340162A1 (en) 2021-11-04
KR102775932B1 (ko) 2025-03-04
JP7368372B2 (ja) 2023-10-24
EP3862462A4 (en) 2022-06-15
US11555044B2 (en) 2023-01-17
IL281975B1 (en) 2025-02-01
EP3862462A1 (en) 2021-08-11
WO2020071175A1 (ja) 2020-04-09
IL281975A (en) 2021-05-31
TWI848976B (zh) 2024-07-21
JPWO2020071175A1 (ja) 2021-09-02
KR20210070318A (ko) 2021-06-14
TW202026452A (zh) 2020-07-16

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