JPWO2018216319A1 - チタンめっき部材の製造方法 - Google Patents

チタンめっき部材の製造方法 Download PDF

Info

Publication number
JPWO2018216319A1
JPWO2018216319A1 JP2019519484A JP2019519484A JPWO2018216319A1 JP WO2018216319 A1 JPWO2018216319 A1 JP WO2018216319A1 JP 2019519484 A JP2019519484 A JP 2019519484A JP 2019519484 A JP2019519484 A JP 2019519484A JP WO2018216319 A1 JPWO2018216319 A1 JP WO2018216319A1
Authority
JP
Japan
Prior art keywords
titanium
molten salt
plating film
solution composition
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2019519484A
Other languages
English (en)
Japanese (ja)
Inventor
昂真 沼田
昂真 沼田
真嶋　正利
正利 真嶋
知之 粟津
知之 粟津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of JPWO2018216319A1 publication Critical patent/JPWO2018216319A1/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/28—Cleaning or pickling metallic material with solutions or molten salts with molten salts
    • C23G1/32—Heavy metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/66—Electroplating: Baths therefor from melts
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/08—Rinsing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
JP2019519484A 2017-05-22 2018-03-13 チタンめっき部材の製造方法 Pending JPWO2018216319A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017100758 2017-05-22
JP2017100758 2017-05-22
PCT/JP2018/009738 WO2018216319A1 (ja) 2017-05-22 2018-03-13 チタンめっき部材の製造方法

Publications (1)

Publication Number Publication Date
JPWO2018216319A1 true JPWO2018216319A1 (ja) 2020-03-19

Family

ID=64395401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019519484A Pending JPWO2018216319A1 (ja) 2017-05-22 2018-03-13 チタンめっき部材の製造方法

Country Status (6)

Country Link
US (1) US20200102664A1 (de)
EP (1) EP3633078A4 (de)
JP (1) JPWO2018216319A1 (de)
KR (1) KR20200010182A (de)
CN (1) CN110475910A (de)
WO (1) WO2018216319A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11380602B2 (en) * 2018-03-07 2022-07-05 Sumitomo Electric Industries, Ltd. Plating film and plated member
JP7086172B2 (ja) * 2018-03-08 2022-06-17 住友電気工業株式会社 チタンめっき部材の製造方法及びチタンめっき部材
CN111910152B (zh) * 2020-09-01 2022-10-25 台州星星光电科技有限公司 一种盖板表面疏水抗碱涂层的镀膜方法
KR102625422B1 (ko) * 2022-03-11 2024-01-23 주식회사 제로원파트너스 에너지 효율이 향상된 ptc 난방 필름 및 이의 제조 방법

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51138511A (en) * 1975-05-27 1976-11-30 Sony Corp Method for regulating the hardness of metallic tita nium
JPH059763A (ja) * 1991-07-05 1993-01-19 Mitsubishi Materials Corp 水に難溶性の塩が付着した金属材料の洗浄方法
JPH06173065A (ja) * 1992-12-09 1994-06-21 Japan Energy Corp Ｔｉの精製方法
JPH09215743A (ja) * 1996-02-09 1997-08-19 Japan Energy Corp 生体用複合インプラント材
JP2000256898A (ja) * 1999-03-03 2000-09-19 Permelec Electrode Ltd ウェーハの銅めっき方法
WO2006038476A1 (ja) * 2004-10-01 2006-04-13 Sumitomo Electric Industries, Ltd. 溶融塩浴、この溶融塩浴を用いて得られた析出物、金属製品の製造方法および金属製品
JP2008192758A (ja) * 2007-02-02 2008-08-21 Sumitomo Electric Ind Ltd 電気二重層キャパシタ用電極
JP2013147731A (ja) * 2011-12-22 2013-08-01 Sumitomo Electric Ind Ltd 溶融塩電解による金属の製造方法
JP2015193899A (ja) * 2013-11-19 2015-11-05 住友電気工業株式会社 電析用電解質および金属膜の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4411762A (en) * 1981-11-09 1983-10-25 Diamond Shamrock Corporation Titanium clad copper electrode and method for making
CN101065519B (zh) * 2004-11-24 2011-04-20 住友电气工业株式会社 熔融盐浴、析出物、以及金属析出物的制造方法
CN103882477B (zh) * 2012-12-21 2016-12-28 攀钢集团攀枝花钢铁研究院有限公司 一种用于制备金属钛的电解质和熔盐及金属钛的制备方法
JP6564697B2 (ja) 2015-11-30 2019-08-21 株式会社吉野工業所 計量容器
CN106868550A (zh) * 2017-02-27 2017-06-20 北京科技大学 一种熔融盐中电解废钛制备高纯钛的方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51138511A (en) * 1975-05-27 1976-11-30 Sony Corp Method for regulating the hardness of metallic tita nium
JPH059763A (ja) * 1991-07-05 1993-01-19 Mitsubishi Materials Corp 水に難溶性の塩が付着した金属材料の洗浄方法
JPH06173065A (ja) * 1992-12-09 1994-06-21 Japan Energy Corp Ｔｉの精製方法
JPH09215743A (ja) * 1996-02-09 1997-08-19 Japan Energy Corp 生体用複合インプラント材
JP2000256898A (ja) * 1999-03-03 2000-09-19 Permelec Electrode Ltd ウェーハの銅めっき方法
WO2006038476A1 (ja) * 2004-10-01 2006-04-13 Sumitomo Electric Industries, Ltd. 溶融塩浴、この溶融塩浴を用いて得られた析出物、金属製品の製造方法および金属製品
JP2008192758A (ja) * 2007-02-02 2008-08-21 Sumitomo Electric Ind Ltd 電気二重層キャパシタ用電極
JP2013147731A (ja) * 2011-12-22 2013-08-01 Sumitomo Electric Ind Ltd 溶融塩電解による金属の製造方法
JP2015193899A (ja) * 2013-11-19 2015-11-05 住友電気工業株式会社 電析用電解質および金属膜の製造方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
F. R. CLAYTON ET AL.: "Electrochemical Studies of Titanium in Molten Fluorides", J. ELECTROCHEM. SOC. ELECTROCHEMICAL SCIENCE AND TECHNOLOGY, vol. 120, no. 9, JPN6018016226, 1973, pages 1193 - 1199, XP055555016, ISSN: 0004528492, DOI: 10.1149/1.2403659 *
SONG JIANXUN ET AL.: "The Influence of Fluoride Anion on the Equilibrium between Titanium Ions and Electrodeposition of Ti", MATERIALS TRANSACTIONS, vol. 55, no. 8, JPN6018016228, 2014, pages 1299 - 1303, XP055557019, ISSN: 0004528491, DOI: 10.2320/matertrans.M2014071 *

Also Published As

Publication number Publication date
US20200102664A1 (en) 2020-04-02
CN110475910A (zh) 2019-11-19
EP3633078A4 (de) 2021-03-03
WO2018216319A1 (ja) 2018-11-29
EP3633078A1 (de) 2020-04-08
KR20200010182A (ko) 2020-01-30

Similar Documents

Publication Publication Date Title
JP6960095B2 (ja) 金属多孔体、不溶性陽極、燃料電池用電極、水素の製造装置、生体材料、および金属多孔体の製造方法
WO2018216319A1 (ja) チタンめっき部材の製造方法
JP6960096B2 (ja) 複合金属多孔体、不溶性陽極、燃料電池用電極、水素の製造装置、形状記憶合金、生体材料、および複合金属多孔体の製造方法
JP6571112B2 (ja) 移動する金属ストリップのメッキ法およびそれにより製造された被覆金属ストリップ
Norikawa et al. Electrodeposition of titanium in a water-soluble KF–KCl molten salt
JP6947212B2 (ja) 溶融塩チタンめっき液組成物およびチタンめっき部材の製造方法
Singh et al. Development of corrosion-resistant electroplating on AZ91 Mg alloy by employing air and water-stable eutectic based ionic liquid bath
JP4883534B2 (ja) 溶融塩浴、溶融塩浴の製造方法およびタングステン析出物
JP6802255B2 (ja) 導電性材料及びその製造方法
Marín-Sánchez et al. Electrodeposition of Zn-Mn coatings on steel from 1-ethyl-3-methylimidazolium bis (trifluoromethanesulfonyl) imide ionic liquid
JPWO2019098378A1 (ja) 黒色酸化被膜を備えるマグネシウム又はアルミニウム金属部材及びその製造方法
JP7086172B2 (ja) チタンめっき部材の製造方法及びチタンめっき部材
CN113463148A (zh) 一种在钛或钛合金基材表面电镀金的方法
WO2022138219A1 (ja) 金属充填微細構造体および金属充填微細構造体の製造方法
KR20210045310A (ko) 산성 수계 은-니켈 합금 전기도금 조성물 및 방법
WO2021176769A1 (ja) チタンめっき用電解質及びチタンめっき用電解質を用いたチタンめっき部材の製造方法
WO2020217603A1 (ja) チタン含有部材の製造方法
JP7052130B1 (ja) 塩素発生用電極およびその製造方法
JP6091150B2 (ja) フッ化処理による表面改質方法
Gill et al. Improved experimental method for electroless deposition of iridium using a platinum sublayer to form a catalyst coated membrane
Norikawa et al. A New Electrodeposition Process of Metallic Ti Films Utilizing Water-soluble KF–KCl Molten Salts
KR20240024950A (ko) 공업용 전해 프로세스용 전극

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20200923

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210615

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20211207