JPWO2014129333A1 - 光学部品 - Google Patents
光学部品 Download PDFInfo
- Publication number
- JPWO2014129333A1 JPWO2014129333A1 JP2015501391A JP2015501391A JPWO2014129333A1 JP WO2014129333 A1 JPWO2014129333 A1 JP WO2014129333A1 JP 2015501391 A JP2015501391 A JP 2015501391A JP 2015501391 A JP2015501391 A JP 2015501391A JP WO2014129333 A1 JPWO2014129333 A1 JP WO2014129333A1
- Authority
- JP
- Japan
- Prior art keywords
- film
- refractive index
- index layer
- transparent substrate
- optical component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 55
- 230000003373 anti-fouling effect Effects 0.000 claims abstract description 99
- 239000000758 substrate Substances 0.000 claims abstract description 78
- 230000003746 surface roughness Effects 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 28
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 24
- 239000011521 glass Substances 0.000 claims description 18
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 14
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 9
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 8
- 229910001887 tin oxide Inorganic materials 0.000 claims description 5
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 4
- 229910052594 sapphire Inorganic materials 0.000 claims description 4
- 239000010980 sapphire Substances 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 3
- 239000010408 film Substances 0.000 description 179
- 238000000034 method Methods 0.000 description 33
- 229910052731 fluorine Inorganic materials 0.000 description 31
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 30
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 30
- 239000011737 fluorine Substances 0.000 description 30
- 239000007789 gas Substances 0.000 description 27
- 150000003961 organosilicon compounds Chemical class 0.000 description 27
- 238000004544 sputter deposition Methods 0.000 description 22
- 238000010438 heat treatment Methods 0.000 description 18
- 239000002904 solvent Substances 0.000 description 17
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 16
- 229910001882 dioxygen Inorganic materials 0.000 description 16
- 229910052786 argon Inorganic materials 0.000 description 15
- 238000003426 chemical strengthening reaction Methods 0.000 description 14
- 238000012360 testing method Methods 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 239000011261 inert gas Substances 0.000 description 9
- 239000000523 sample Substances 0.000 description 9
- 235000002639 sodium chloride Nutrition 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 239000012298 atmosphere Substances 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 238000004439 roughness measurement Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 238000005342 ion exchange Methods 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000008707 rearrangement Effects 0.000 description 3
- -1 sweat Substances 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000005354 aluminosilicate glass Substances 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 229910001414 potassium ion Inorganic materials 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 description 1
- HJIMAFKWSKZMBK-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F HJIMAFKWSKZMBK-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229960004624 perflexane Drugs 0.000 description 1
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 210000004243 sweat Anatomy 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 230000026683 transduction Effects 0.000 description 1
- 238000010361 transduction Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013033388 | 2013-02-22 | ||
| JP2013033388 | 2013-02-22 | ||
| PCT/JP2014/052969 WO2014129333A1 (ja) | 2013-02-22 | 2014-02-07 | 光学部品 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2014129333A1 true JPWO2014129333A1 (ja) | 2017-02-02 |
Family
ID=51391129
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015501391A Pending JPWO2014129333A1 (ja) | 2013-02-22 | 2014-02-07 | 光学部品 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20150338552A1 (zh) |
| JP (1) | JPWO2014129333A1 (zh) |
| KR (1) | KR20150118156A (zh) |
| CN (1) | CN105008967A (zh) |
| DE (1) | DE112014000955T5 (zh) |
| TW (1) | TW201440902A (zh) |
| WO (1) | WO2014129333A1 (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10988410B2 (en) * | 2016-01-12 | 2021-04-27 | AGC Inc. | Glass substrate with antifouling layer and front plate for display |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2014199991A1 (ja) * | 2013-06-11 | 2017-02-23 | 日本電気硝子株式会社 | カバー部材、表示装置及びカバー部材の製造方法 |
| CN107922256B (zh) * | 2015-08-10 | 2021-07-27 | Ａｇｃ株式会社 | 带防污层的玻璃板 |
| JP7306438B2 (ja) * | 2016-01-12 | 2023-07-11 | Ａｇｃ株式会社 | 防汚層付きガラス基体及び表示装置用前面板 |
| JP6969626B2 (ja) * | 2016-01-12 | 2021-11-24 | Ａｇｃ株式会社 | 防汚層付きガラス基体の製造方法 |
| CN106977113A (zh) * | 2016-01-19 | 2017-07-25 | 精工爱普生株式会社 | 透光性部件、钟表及透光性部件的制造方法 |
| JP6799932B2 (ja) * | 2016-03-28 | 2020-12-16 | 株式会社トプコン | 手術顕微鏡用光学素子および医療用光学機器 |
| WO2018089580A1 (en) * | 2016-11-09 | 2018-05-17 | Corning Incorporated | Coated glass articles and processes for producing the same |
| US10877181B2 (en) * | 2016-11-11 | 2020-12-29 | AGC Inc. | Substrate with low-reflection property and manufacturing method thereof |
| KR102569079B1 (ko) * | 2017-04-20 | 2023-08-22 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 반사방지 부재 및 그 제조 방법 |
| WO2019064771A1 (ja) * | 2017-09-29 | 2019-04-04 | 日本電産株式会社 | レンズ、レンズユニットおよび撮像装置 |
| CN109683223B (zh) * | 2017-10-19 | 2023-01-03 | Ａｇｃ株式会社 | 透明构件 |
| WO2019188970A1 (ja) * | 2018-03-27 | 2019-10-03 | 日本電産株式会社 | 光学部品およびレンズユニット |
| WO2019208426A1 (ja) * | 2018-04-27 | 2019-10-31 | コニカミノルタ株式会社 | 光学薄膜、光学部材及び光学薄膜の製造方法 |
| CN110484878B (zh) * | 2018-05-15 | 2022-03-29 | 蓝思科技（长沙）有限公司 | 用于非金属盖板的浅金色涂层Logo及其制备方法 |
| JP6863343B2 (ja) | 2018-07-12 | 2021-04-21 | Ａｇｃ株式会社 | ガラス積層体、ディスプレイ用前面板、表示装置およびガラス積層体の製造方法 |
| JP2020060657A (ja) * | 2018-10-09 | 2020-04-16 | 日東電工株式会社 | 反射防止ガラス |
| US20210031232A1 (en) * | 2019-07-30 | 2021-02-04 | United Protective Technologies, Llc | Transparent superhydrophobic composition |
| US20230311448A1 (en) * | 2020-03-04 | 2023-10-05 | Dexerials Corporation | Method for manufacturing optical laminate |
| JP7089609B2 (ja) * | 2020-03-04 | 2022-06-22 | デクセリアルズ株式会社 | 光学積層体、物品、光学積層体の製造方法 |
| JP7089610B2 (ja) * | 2020-03-04 | 2022-06-22 | デクセリアルズ株式会社 | 光学積層体の製造方法 |
| EP4116083A4 (en) * | 2020-03-04 | 2024-06-19 | Dexerials Corporation | OPTICAL LAMINATE, ITEM AND METHOD FOR PRODUCING AN OPTICAL LAMINATE |
| EP4183573A1 (en) * | 2020-07-17 | 2023-05-24 | Dexerials Corporation | Method for producing optical multilayer body |
| JP7101297B2 (ja) * | 2020-07-17 | 2022-07-14 | デクセリアルズ株式会社 | 光学積層体、物品、光学積層体の製造方法 |
| US20230129985A1 (en) * | 2020-07-17 | 2023-04-27 | Dexerials Corporation | Optical laminate, article, and method for producing optical laminate |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005292516A (ja) * | 2004-03-31 | 2005-10-20 | Canon Optron Inc | 脂環式構造含有重合体組成物からなる光学部品 |
| KR20090064421A (ko) * | 2006-09-29 | 2009-06-18 | 다이니폰 인사츠 가부시키가이샤 | 광학 기능 필름 |
| FR2928461B1 (fr) * | 2008-03-10 | 2011-04-01 | Saint Gobain | Substrat transparent comportant un revetement antireflet |
| JP5326407B2 (ja) * | 2008-07-31 | 2013-10-30 | セイコーエプソン株式会社 | 時計用カバーガラス、および時計 |
| TWI756606B (zh) * | 2012-07-16 | 2022-03-01 | 美商唯亞威方案公司 | 光學濾波器及感測器系統 |
-
2014
- 2014-02-07 JP JP2015501391A patent/JPWO2014129333A1/ja active Pending
- 2014-02-07 KR KR1020157022449A patent/KR20150118156A/ko not_active Application Discontinuation
- 2014-02-07 WO PCT/JP2014/052969 patent/WO2014129333A1/ja active Application Filing
- 2014-02-07 DE DE112014000955.5T patent/DE112014000955T5/de not_active Withdrawn
- 2014-02-07 CN CN201480010204.1A patent/CN105008967A/zh active Pending
- 2014-02-17 TW TW103105116A patent/TW201440902A/zh unknown
-
2015
- 2015-08-03 US US14/816,176 patent/US20150338552A1/en not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10988410B2 (en) * | 2016-01-12 | 2021-04-27 | AGC Inc. | Glass substrate with antifouling layer and front plate for display |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2014129333A1 (ja) | 2014-08-28 |
| KR20150118156A (ko) | 2015-10-21 |
| US20150338552A1 (en) | 2015-11-26 |
| CN105008967A (zh) | 2015-10-28 |
| DE112014000955T5 (de) | 2015-11-05 |
| TW201440902A (zh) | 2014-11-01 |
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