JPS6486561A - Vertical mos transistor - Google Patents

Vertical mos transistor

Info

Publication number
JPS6486561A
JPS6486561A JP63116592A JP11659288A JPS6486561A JP S6486561 A JPS6486561 A JP S6486561A JP 63116592 A JP63116592 A JP 63116592A JP 11659288 A JP11659288 A JP 11659288A JP S6486561 A JPS6486561 A JP S6486561A
Authority
JP
Japan
Prior art keywords
groove
polysilicon
electrode
substrate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63116592A
Other languages
English (en)
Inventor
Keimei Mikoshiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63116592A priority Critical patent/JPS6486561A/ja
Publication of JPS6486561A publication Critical patent/JPS6486561A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/7827—Vertical transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)
JP63116592A 1987-06-17 1988-05-13 Vertical mos transistor Pending JPS6486561A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63116592A JPS6486561A (en) 1987-06-17 1988-05-13 Vertical mos transistor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP15178787 1987-06-17
JP63116592A JPS6486561A (en) 1987-06-17 1988-05-13 Vertical mos transistor

Publications (1)

Publication Number Publication Date
JPS6486561A true JPS6486561A (en) 1989-03-31

Family

ID=26454895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63116592A Pending JPS6486561A (en) 1987-06-17 1988-05-13 Vertical mos transistor

Country Status (1)

Country Link
JP (1) JPS6486561A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990011619A1 (en) * 1989-03-23 1990-10-04 Grumman Aerospace Corporation Single trench mosfet-capacitor cell for analog signal processing
WO1990012421A1 (en) * 1989-04-03 1990-10-18 Grumman Aerospace Corporation Trench jfet integrated circuit elements
US5053350A (en) * 1989-03-23 1991-10-01 Grumman Aerospace Corporation Method of making trench MOSFET capacitor cell for analog signal processing

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6126261A (ja) * 1984-07-16 1986-02-05 Nippon Telegr & Teleph Corp <Ntt> 縦形ｍｏｓ電界効果トランジスタの製造方法
JPS61185965A (ja) * 1984-12-07 1986-08-19 テキサス　インスツルメンツ　インコ−ポレイテツド メモリセルおよびその製法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6126261A (ja) * 1984-07-16 1986-02-05 Nippon Telegr & Teleph Corp <Ntt> 縦形ｍｏｓ電界効果トランジスタの製造方法
JPS61185965A (ja) * 1984-12-07 1986-08-19 テキサス　インスツルメンツ　インコ−ポレイテツド メモリセルおよびその製法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990011619A1 (en) * 1989-03-23 1990-10-04 Grumman Aerospace Corporation Single trench mosfet-capacitor cell for analog signal processing
US5053350A (en) * 1989-03-23 1991-10-01 Grumman Aerospace Corporation Method of making trench MOSFET capacitor cell for analog signal processing
WO1990012421A1 (en) * 1989-04-03 1990-10-18 Grumman Aerospace Corporation Trench jfet integrated circuit elements
US5010025A (en) * 1989-04-03 1991-04-23 Grumman Aerospace Corporation Method of making trench JFET integrated circuit elements

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