JPS646529B2 - - Google Patents
Info
- Publication number
- JPS646529B2 JPS646529B2 JP8617780A JP8617780A JPS646529B2 JP S646529 B2 JPS646529 B2 JP S646529B2 JP 8617780 A JP8617780 A JP 8617780A JP 8617780 A JP8617780 A JP 8617780A JP S646529 B2 JPS646529 B2 JP S646529B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- substrate
- fecl
- heated
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 32
- 239000010409 thin film Substances 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 21
- 230000005291 magnetic effect Effects 0.000 claims description 16
- 229910052742 iron Inorganic materials 0.000 claims description 10
- 229910001566 austenite Inorganic materials 0.000 claims description 9
- 239000000779 smoke Substances 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 claims description 5
- 238000009835 boiling Methods 0.000 claims description 4
- 239000012159 carrier gas Substances 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 3
- 229910000859 α-Fe Inorganic materials 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims 1
- 238000000034 method Methods 0.000 description 17
- 239000010408 film Substances 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000005297 pyrex Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000010405 reoxidation reaction Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Compounds Of Iron (AREA)
- Chemical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8617780A JPS5711833A (en) | 1980-06-25 | 1980-06-25 | Preparation of thin oxide magnetic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8617780A JPS5711833A (en) | 1980-06-25 | 1980-06-25 | Preparation of thin oxide magnetic film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5711833A JPS5711833A (en) | 1982-01-21 |
| JPS646529B2 true JPS646529B2 (enrdf_load_stackoverflow) | 1989-02-03 |
Family
ID=13879470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8617780A Granted JPS5711833A (en) | 1980-06-25 | 1980-06-25 | Preparation of thin oxide magnetic film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5711833A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06235660A (ja) * | 1993-02-10 | 1994-08-23 | Nec Corp | 分光分析装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5265898A (en) * | 1975-11-26 | 1977-05-31 | Nippon Telegr & Teleph Corp <Ntt> | Preparing oxidized magnetic thin film |
-
1980
- 1980-06-25 JP JP8617780A patent/JPS5711833A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06235660A (ja) * | 1993-02-10 | 1994-08-23 | Nec Corp | 分光分析装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5711833A (en) | 1982-01-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6180527A (ja) | 磁気記録媒体用耐摩耗・耐腐蝕性膜の作成方法 | |
| JPH0373419A (ja) | 磁気記録媒体 | |
| US5989673A (en) | Caromium-tantalum oxides (Cr-TaOx), sputtering targets and thin film seedlayer/sublayers for thin film magnetic recording media | |
| JPS646529B2 (enrdf_load_stackoverflow) | ||
| JP2761859B2 (ja) | 磁気記録媒体 | |
| JPS644336B2 (enrdf_load_stackoverflow) | ||
| JPS6346970B2 (enrdf_load_stackoverflow) | ||
| JP2529395B2 (ja) | 金属薄膜型磁気記録媒体の製造方法 | |
| JP2605803B2 (ja) | 磁気記録媒体 | |
| JPS62102414A (ja) | 磁気記録媒体 | |
| JP2538123B2 (ja) | 固定磁気ディスクおよびその製造方法 | |
| JPH04328324A (ja) | 磁気記録媒体の製造方法 | |
| JPS60167122A (ja) | 金属薄膜型磁気記録媒体の製造方法 | |
| JPS59203223A (ja) | 金属薄膜型磁気記録媒体 | |
| JPH0456779B2 (enrdf_load_stackoverflow) | ||
| JPH06282841A (ja) | 磁気記録媒体及びその製造方法 | |
| JPS6326823A (ja) | 磁気記録媒体及びその製造方法 | |
| JPS5868229A (ja) | 磁気記録媒体 | |
| JPS60121522A (ja) | 磁気記録媒体およびその製造方法 | |
| JPH10112019A (ja) | 磁気記録媒体及びその製造方法 | |
| JPS58212623A (ja) | 磁気記録媒体の製造方法 | |
| JPH0991663A (ja) | 磁気記録媒体、及びその製造方法 | |
| JP2003022528A (ja) | 磁気記録媒体の製造法 | |
| JPS6057211B2 (ja) | 磁気記録媒体の製作法 | |
| JPS6045932A (ja) | 磁気記録媒体 |