JPS6455376A - Crucible for vapor deposition - Google Patents
Crucible for vapor depositionInfo
- Publication number
- JPS6455376A JPS6455376A JP21100687A JP21100687A JPS6455376A JP S6455376 A JPS6455376 A JP S6455376A JP 21100687 A JP21100687 A JP 21100687A JP 21100687 A JP21100687 A JP 21100687A JP S6455376 A JPS6455376 A JP S6455376A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- recess
- evaporated
- central part
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To attain uniform evaporation and to make the thickness of a formed film uniform by forming the bottom of the recess of a crucible so as to gradually shallow the recess from the central part of the crucible toward both ends. CONSTITUTION:When a material to be evaporated is put in the recess 18 of a crucible 11 for vapor deposition, the bottom of the recess 18 is formed so as to gradually and linearly shallow the recess 18 from the central part of the crucible toward both ends of the crucible in the longitudinal direction. Since the amt. of the material to be evaporated in the crucible 11 is reduced at both ends of the crucible in the longitudinal direction, the material can be sufficiently heated. The amt. of the material evaporated from both ends can be made nearly equal to that evaporated from the central part and the thickness of a formed film can be made uniform over the entire region in the transverse direction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21100687A JPS6455376A (en) | 1987-08-25 | 1987-08-25 | Crucible for vapor deposition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21100687A JPS6455376A (en) | 1987-08-25 | 1987-08-25 | Crucible for vapor deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6455376A true JPS6455376A (en) | 1989-03-02 |
Family
ID=16598768
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21100687A Pending JPS6455376A (en) | 1987-08-25 | 1987-08-25 | Crucible for vapor deposition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6455376A (en) |
-
1987
- 1987-08-25 JP JP21100687A patent/JPS6455376A/en active Pending
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