JPS52135881A - Vacuum evaporation - Google Patents

Vacuum evaporation

Info

Publication number
JPS52135881A
JPS52135881A JP5223776A JP5223776A JPS52135881A JP S52135881 A JPS52135881 A JP S52135881A JP 5223776 A JP5223776 A JP 5223776A JP 5223776 A JP5223776 A JP 5223776A JP S52135881 A JPS52135881 A JP S52135881A
Authority
JP
Japan
Prior art keywords
vacuum evaporation
evaporation
evaporated
filament
wetting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5223776A
Other languages
Japanese (ja)
Inventor
Toshimitsu Manabe
Kunihiro Matsukuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5223776A priority Critical patent/JPS52135881A/en
Publication of JPS52135881A publication Critical patent/JPS52135881A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To make the evaporation uniform and to prevent the occurrence of thickness fluctuation of evaporated film, by preliminarily attaching a small amount of evaporation, wetting the filament with evaporated material and using it as evaporating source.
JP5223776A 1976-05-10 1976-05-10 Vacuum evaporation Pending JPS52135881A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5223776A JPS52135881A (en) 1976-05-10 1976-05-10 Vacuum evaporation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5223776A JPS52135881A (en) 1976-05-10 1976-05-10 Vacuum evaporation

Publications (1)

Publication Number Publication Date
JPS52135881A true JPS52135881A (en) 1977-11-14

Family

ID=12909104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5223776A Pending JPS52135881A (en) 1976-05-10 1976-05-10 Vacuum evaporation

Country Status (1)

Country Link
JP (1) JPS52135881A (en)

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