JPS52134431A - Image formation - Google Patents

Image formation

Info

Publication number
JPS52134431A
JPS52134431A JP4994476A JP4994476A JPS52134431A JP S52134431 A JPS52134431 A JP S52134431A JP 4994476 A JP4994476 A JP 4994476A JP 4994476 A JP4994476 A JP 4994476A JP S52134431 A JPS52134431 A JP S52134431A
Authority
JP
Japan
Prior art keywords
image formation
formation
relief image
image
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4994476A
Other languages
Japanese (ja)
Inventor
Tadao Kaneko
Motoyasu Terao
Keizo Kato
Motoo Akagi
Saburo Nonogaki
Seiji Yonezawa
Yoshitoshi Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4994476A priority Critical patent/JPS52134431A/en
Publication of JPS52134431A publication Critical patent/JPS52134431A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To enable a relief image of high resolution with high sensitivity using visible light or infrared light, by combining the advantages due to formation of a relief image with photoresist and formation of a thin metallic film image deposited by vacuum evaporation.
JP4994476A 1976-05-04 1976-05-04 Image formation Pending JPS52134431A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4994476A JPS52134431A (en) 1976-05-04 1976-05-04 Image formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4994476A JPS52134431A (en) 1976-05-04 1976-05-04 Image formation

Publications (1)

Publication Number Publication Date
JPS52134431A true JPS52134431A (en) 1977-11-10

Family

ID=12845123

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4994476A Pending JPS52134431A (en) 1976-05-04 1976-05-04 Image formation

Country Status (1)

Country Link
JP (1) JPS52134431A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56128921A (en) * 1980-03-14 1981-10-08 Dainippon Printing Co Ltd Manufacture of electrode substrate for liquid-crystal display element
JP2009034960A (en) * 2007-08-03 2009-02-19 Toppan Printing Co Ltd Regeneration method of elimination plate for reverse offset printing, and elimination plate for reverse offset printing

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56128921A (en) * 1980-03-14 1981-10-08 Dainippon Printing Co Ltd Manufacture of electrode substrate for liquid-crystal display element
JP2009034960A (en) * 2007-08-03 2009-02-19 Toppan Printing Co Ltd Regeneration method of elimination plate for reverse offset printing, and elimination plate for reverse offset printing

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