JPS5384683A - Antireflection film forming method of photo mask - Google Patents

Antireflection film forming method of photo mask

Info

Publication number
JPS5384683A
JPS5384683A JP15939876A JP15939876A JPS5384683A JP S5384683 A JPS5384683 A JP S5384683A JP 15939876 A JP15939876 A JP 15939876A JP 15939876 A JP15939876 A JP 15939876A JP S5384683 A JPS5384683 A JP S5384683A
Authority
JP
Japan
Prior art keywords
film forming
forming method
antireflection film
photo mask
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15939876A
Other languages
Japanese (ja)
Inventor
Hiroo Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15939876A priority Critical patent/JPS5384683A/en
Publication of JPS5384683A publication Critical patent/JPS5384683A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To improve resolution by forming transparent film by a plasma vapor phase growth method in a method of forming antireflection films by laminating the transparant films in multilayer on a glass plate.
COPYRIGHT: (C)1978,JPO&Japio
JP15939876A 1976-12-30 1976-12-30 Antireflection film forming method of photo mask Pending JPS5384683A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15939876A JPS5384683A (en) 1976-12-30 1976-12-30 Antireflection film forming method of photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15939876A JPS5384683A (en) 1976-12-30 1976-12-30 Antireflection film forming method of photo mask

Publications (1)

Publication Number Publication Date
JPS5384683A true JPS5384683A (en) 1978-07-26

Family

ID=15692896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15939876A Pending JPS5384683A (en) 1976-12-30 1976-12-30 Antireflection film forming method of photo mask

Country Status (1)

Country Link
JP (1) JPS5384683A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63204259A (en) * 1987-02-20 1988-08-23 Hitachi Ltd Mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63204259A (en) * 1987-02-20 1988-08-23 Hitachi Ltd Mask

Similar Documents

Publication Publication Date Title
JPS53135348A (en) Etching method for multilayer film
JPS5340281A (en) Photo mask material and manufacturtof it
JPS5384683A (en) Antireflection film forming method of photo mask
JPS53147549A (en) Forming method of antireflection film
JPS5421273A (en) Manufacture for photo mask
JPS5291665A (en) Photodiode
JPS5389673A (en) Fine pattern forming method of semiconductor device
JPS5334880A (en) Laminate consisting of polarized film and glass
JPS5282253A (en) Stripe filter for color separation
JPS5373073A (en) Treatment method for photo resist
JPS5360177A (en) Photo mask
JPS52134431A (en) Image formation
JPS5379497A (en) Passive reflector for display unit of lightreception type
JPS5380994A (en) Lift-off method
JPS5219530A (en) Device for locating a frame of micro-film
JPS53147548A (en) Dichroic film removed of ripples
JPS5413269A (en) Forming method of two layer protective film
JPS5440080A (en) Forming method of photo resist film
JPS51148354A (en) Manufacturing method of fluorescent face of beam index type color pict ure tube
JPS547359A (en) Dichroic film having suitable half-width
JPS5360638A (en) Photosensitive material for pattern formation for accelerated particle beamexposure and pattern formation
JPS53127290A (en) Manufacture for photo conductive film
JPS52148117A (en) Plotting film
JPS533168A (en) Semiconductor evaporating apparatus
JPS5350241A (en) Electrodeposit coating