JPS5210868A - Electron radiation type vapor source - Google Patents

Electron radiation type vapor source

Info

Publication number
JPS5210868A
JPS5210868A JP8697375A JP8697375A JPS5210868A JP S5210868 A JPS5210868 A JP S5210868A JP 8697375 A JP8697375 A JP 8697375A JP 8697375 A JP8697375 A JP 8697375A JP S5210868 A JPS5210868 A JP S5210868A
Authority
JP
Japan
Prior art keywords
vapor source
radiation type
electron radiation
type vapor
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8697375A
Other languages
Japanese (ja)
Other versions
JPS585260B2 (en
Inventor
Toshinori Takagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OOSAKA KOUON DENKI KK
OSAKA KOUON DENKI KK
Original Assignee
OOSAKA KOUON DENKI KK
OSAKA KOUON DENKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OOSAKA KOUON DENKI KK, OSAKA KOUON DENKI KK filed Critical OOSAKA KOUON DENKI KK
Priority to JP50086973A priority Critical patent/JPS585260B2/en
Priority to GB4345975A priority patent/GB1483966A/en
Priority to US05/625,041 priority patent/US4152478A/en
Priority to DE2547552A priority patent/DE2547552B2/en
Publication of JPS5210868A publication Critical patent/JPS5210868A/en
Priority to US06/011,917 priority patent/US4217855A/en
Publication of JPS585260B2 publication Critical patent/JPS585260B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:A vapor source which achieves improvement in the adhesion and crystallinity of deposited films and control of crystal structure by the multiplied effects of vapor streams of evaporating materials and electron beams, and which can be used for welding of dissimilar substrates or a substrate to other material.
JP50086973A 1974-10-23 1975-07-15 Denshihoushi Yagatajyouhatsugen Expired JPS585260B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP50086973A JPS585260B2 (en) 1975-07-15 1975-07-15 Denshihoushi Yagatajyouhatsugen
GB4345975A GB1483966A (en) 1974-10-23 1975-10-22 Vapourized-metal cluster ion source and ionized-cluster beam deposition
US05/625,041 US4152478A (en) 1974-10-23 1975-10-23 Ionized-cluster deposited on a substrate and method of depositing ionized cluster on a substrate
DE2547552A DE2547552B2 (en) 1974-10-23 1975-10-23 Layer vapor deposition process and equipment
US06/011,917 US4217855A (en) 1974-10-23 1979-02-13 Vaporized-metal cluster ion source and ionized-cluster beam deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50086973A JPS585260B2 (en) 1975-07-15 1975-07-15 Denshihoushi Yagatajyouhatsugen

Publications (2)

Publication Number Publication Date
JPS5210868A true JPS5210868A (en) 1977-01-27
JPS585260B2 JPS585260B2 (en) 1983-01-29

Family

ID=13901807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50086973A Expired JPS585260B2 (en) 1974-10-23 1975-07-15 Denshihoushi Yagatajyouhatsugen

Country Status (1)

Country Link
JP (1) JPS585260B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933098A (en) * 1972-07-29 1974-03-26

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933098A (en) * 1972-07-29 1974-03-26

Also Published As

Publication number Publication date
JPS585260B2 (en) 1983-01-29

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