JPS635901B2 - - Google Patents

Info

Publication number
JPS635901B2
JPS635901B2 JP57226039A JP22603982A JPS635901B2 JP S635901 B2 JPS635901 B2 JP S635901B2 JP 57226039 A JP57226039 A JP 57226039A JP 22603982 A JP22603982 A JP 22603982A JP S635901 B2 JPS635901 B2 JP S635901B2
Authority
JP
Japan
Prior art keywords
wafer
axis
rotary table
orientation flat
trajectory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57226039A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59117120A (ja
Inventor
Akira Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57226039A priority Critical patent/JPS59117120A/ja
Publication of JPS59117120A publication Critical patent/JPS59117120A/ja
Publication of JPS635901B2 publication Critical patent/JPS635901B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP57226039A 1982-12-24 1982-12-24 ウエハのプリアライメント装置 Granted JPS59117120A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57226039A JPS59117120A (ja) 1982-12-24 1982-12-24 ウエハのプリアライメント装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57226039A JPS59117120A (ja) 1982-12-24 1982-12-24 ウエハのプリアライメント装置

Publications (2)

Publication Number Publication Date
JPS59117120A JPS59117120A (ja) 1984-07-06
JPS635901B2 true JPS635901B2 (enrdf_load_html_response) 1988-02-05

Family

ID=16838814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57226039A Granted JPS59117120A (ja) 1982-12-24 1982-12-24 ウエハのプリアライメント装置

Country Status (1)

Country Link
JP (1) JPS59117120A (enrdf_load_html_response)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6235640A (ja) * 1985-08-09 1987-02-16 Nec Kyushu Ltd 半導体基板のプリアライメント機構
JP5662255B2 (ja) * 2010-07-21 2015-01-28 株式会社神戸製鋼所 リアクトル

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5864043A (ja) * 1981-10-13 1983-04-16 Nippon Telegr & Teleph Corp <Ntt> 円板形状体の位置決め装置

Also Published As

Publication number Publication date
JPS59117120A (ja) 1984-07-06

Similar Documents

Publication Publication Date Title
KR100885082B1 (ko) 버퍼링 성능을 가진 에지 그립 얼라이너
JPH02311288A (ja) 要素搬送アライメント装置及び方法
JPH1089904A (ja) Ｖノッチウェハ位置決め装置
CN208759384U (zh) 一种圆盘类零件的定位机构
JPS6320380B2 (enrdf_load_html_response)
JPH05343294A (ja) 縮小投影露光装置
JPS635901B2 (enrdf_load_html_response)
JPH01169939A (ja) 半導体ウエハのセンタ合せ装置
JPS59147444A (ja) 板状物体の位置合わせ方法およびその装置
JP3072484B2 (ja) ウエハ位置決め装置
JP3780470B2 (ja) 複合偏心軸を芯合せする方法
JP2674237B2 (ja) 基板の切断方法
JP2000176791A (ja) ワーク位置決め装置及びワーク位置決め方法
US12424473B2 (en) Centering device, centering method and substrate processing apparatus
JP3009243B2 (ja) Ｖノッチウエハの位置決め機構
JPH056662Y2 (enrdf_load_html_response)
JPH1070177A (ja) 円板形状体の位置決め方法及び装置
JPS63266850A (ja) 円形基板の位置決め装置
JPH06151566A (ja) オリフラ位置検出装置およびオリフラ位置合わせ装置
JPH01246842A (ja) 半導体ウエハの位置合せ装置
JPS61280631A (ja) ウエハ位置検出装置
JPS6262054B2 (enrdf_load_html_response)
JP2001319963A (ja) ウェハの位置合わせ装置
JPH01295421A (ja) 周辺露光装置
JPH05299399A (ja) ウエハー側周面の鏡面面取り装置と方法