JPH01295421A - Peripheral exposure apparatus - Google Patents

Peripheral exposure apparatus

Info

Publication number
JPH01295421A
JPH01295421A JP63126769A JP12676988A JPH01295421A JP H01295421 A JPH01295421 A JP H01295421A JP 63126769 A JP63126769 A JP 63126769A JP 12676988 A JP12676988 A JP 12676988A JP H01295421 A JPH01295421 A JP H01295421A
Authority
JP
Japan
Prior art keywords
wafer
edge
detected signal
spin chuck
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63126769A
Other languages
English (en)
Inventor
Kenji Kawai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63126769A priority Critical patent/JPH01295421A/ja
Publication of JPH01295421A publication Critical patent/JPH01295421A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
JP63126769A 1988-05-24 1988-05-24 Peripheral exposure apparatus Pending JPH01295421A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63126769A JPH01295421A (en) 1988-05-24 1988-05-24 Peripheral exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63126769A JPH01295421A (en) 1988-05-24 1988-05-24 Peripheral exposure apparatus

Publications (1)

Publication Number Publication Date
JPH01295421A true JPH01295421A (en) 1989-11-29

Family

ID=14943471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63126769A Pending JPH01295421A (en) 1988-05-24 1988-05-24 Peripheral exposure apparatus

Country Status (1)

Country Link
JP (1) JPH01295421A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4115510A1 (de) * 1990-05-21 1991-11-28 Hamatech Halbleiter Maschinenb Vorrichtung zur randentlackung einer substrats
JPH04291938A (en) * 1991-03-20 1992-10-16 Ushio Inc Aligner and exposure method for inessential resist on wafer
JP2002196500A (ja) * 2000-12-22 2002-07-12 Ushio Inc フィルム回路基板の周辺露光装置
KR100667254B1 (ko) * 2005-12-22 2007-01-11 세메스 주식회사 노광 장치 및 이를 이용한 노광 방법

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4115510A1 (de) * 1990-05-21 1991-11-28 Hamatech Halbleiter Maschinenb Vorrichtung zur randentlackung einer substrats
JPH04291938A (en) * 1991-03-20 1992-10-16 Ushio Inc Aligner and exposure method for inessential resist on wafer
JP2002196500A (ja) * 2000-12-22 2002-07-12 Ushio Inc フィルム回路基板の周辺露光装置
KR100523890B1 (ko) * 2000-12-22 2005-10-26 우시오덴키 가부시키가이샤 필름 회로 기판의 주변 노광 장치
KR100667254B1 (ko) * 2005-12-22 2007-01-11 세메스 주식회사 노광 장치 및 이를 이용한 노광 방법

Similar Documents

Publication Publication Date Title
JPH03138957A (en) Wafer positioning apparatus
JPH01295421A (en) Peripheral exposure apparatus
EP0358425A3 (en) Position detecting method and apparatus
JPS60188955A (en) Exposing device
JPH02124406A (en) Semiconductor manufacturing apparatus
JPH0256924A (en) Aligner
JPH01264220A (en) Reduction projection aligner
JPS59100806A (en) Positioning and transferring device of angle of wafer in testing device of flatness of wafer for lsi
JPH01217916A (en) Wafer periphery exposure mechanism
JPS61151524A (en) Image forming device
JPS6269104A (en) Edge detecting device
JPH03155114A (en) Positioning of reduction projecting exposure device
JPH01239560A (en) Developing device
JPH02130405A (en) Appearance inspecting device for ic
JPS63187644A (en) Production device for semiconductor
JPS62128140A (en) Orientation flat detecting device
JPH01248516A (en) X-ray aligner
JPS6143442A (en) Orientation device of wafer
JPH04301503A (en) Detecting apparatus for center of wafer
JPS63232348A (en) Device for positioning semiconductor wafer
JPH0312946A (en) Wafer prealignment method
JPH0274815A (en) Interval measuring apparatus
JPH03296245A (en) Method of recognizing wafer shape
JPS6264904A (en) Apparatus for measuring shape
JPH04172207A (en) Apparatus of light interference type for measuring film thickness