JPS6355869B2 - - Google Patents
Info
- Publication number
- JPS6355869B2 JPS6355869B2 JP57232399A JP23239982A JPS6355869B2 JP S6355869 B2 JPS6355869 B2 JP S6355869B2 JP 57232399 A JP57232399 A JP 57232399A JP 23239982 A JP23239982 A JP 23239982A JP S6355869 B2 JPS6355869 B2 JP S6355869B2
- Authority
- JP
- Japan
- Prior art keywords
- source electrode
- mos
- contact
- type
- contact region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/84—Combinations of enhancement-mode IGFETs and depletion-mode IGFETs
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57232399A JPS59117151A (ja) | 1982-12-23 | 1982-12-23 | Mos集積回路 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57232399A JPS59117151A (ja) | 1982-12-23 | 1982-12-23 | Mos集積回路 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59117151A JPS59117151A (ja) | 1984-07-06 |
JPS6355869B2 true JPS6355869B2 (enrdf_load_stackoverflow) | 1988-11-04 |
Family
ID=16938629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57232399A Granted JPS59117151A (ja) | 1982-12-23 | 1982-12-23 | Mos集積回路 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59117151A (enrdf_load_stackoverflow) |
-
1982
- 1982-12-23 JP JP57232399A patent/JPS59117151A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59117151A (ja) | 1984-07-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0653497A (ja) | 入出力保護回路を備えた半導体装置 | |
JP2602974B2 (ja) | Cmos半導体集積回路装置 | |
JPS6355869B2 (enrdf_load_stackoverflow) | ||
JPS6362904B2 (enrdf_load_stackoverflow) | ||
JPH08115985A (ja) | 低雑音の半導体集積回路 | |
JPH038357A (ja) | 半導体集積回路装置 | |
JPH0412627B2 (enrdf_load_stackoverflow) | ||
JP3128813B2 (ja) | 半導体集積回路 | |
JPH02294063A (ja) | 半導体集積回路 | |
JP3271435B2 (ja) | 半導体集積回路装置 | |
KR850007315A (ko) | 상보형(相補形) 금속산화막 반도체 직접회로 장치 | |
JPS5944782B2 (ja) | 半導体集積回路 | |
JPH0532908B2 (enrdf_load_stackoverflow) | ||
JPH0636596Y2 (ja) | Cmos半導体装置 | |
KR850005159A (ko) | 기판에 전원 공급 통로를 가진 반도체 집적회로 | |
JPH056964A (ja) | 半導体集積回路装置 | |
JPS62104068A (ja) | 半導体集積回路装置 | |
JPH01273346A (ja) | 半導体装置 | |
JPH03116863A (ja) | 半導体集積回路装置 | |
JPS6042622B2 (ja) | 相補型mos集積回路 | |
JPS56108257A (en) | Semiconductor integrated circuit device | |
JPH0314232B2 (enrdf_load_stackoverflow) | ||
JPS59181658A (ja) | 半導体装置 | |
JPS6281053A (ja) | 半導体集積回路装置 | |
JPH02226760A (ja) | 半導体論理回路 |