JPS6355869B2 - - Google Patents

Info

Publication number
JPS6355869B2
JPS6355869B2 JP57232399A JP23239982A JPS6355869B2 JP S6355869 B2 JPS6355869 B2 JP S6355869B2 JP 57232399 A JP57232399 A JP 57232399A JP 23239982 A JP23239982 A JP 23239982A JP S6355869 B2 JPS6355869 B2 JP S6355869B2
Authority
JP
Japan
Prior art keywords
source electrode
mos
contact
type
contact region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57232399A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59117151A (ja
Inventor
Tadashi Nakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP57232399A priority Critical patent/JPS59117151A/ja
Publication of JPS59117151A publication Critical patent/JPS59117151A/ja
Publication of JPS6355869B2 publication Critical patent/JPS6355869B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/84Combinations of enhancement-mode IGFETs and depletion-mode IGFETs

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP57232399A 1982-12-23 1982-12-23 Mos集積回路 Granted JPS59117151A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57232399A JPS59117151A (ja) 1982-12-23 1982-12-23 Mos集積回路

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57232399A JPS59117151A (ja) 1982-12-23 1982-12-23 Mos集積回路

Publications (2)

Publication Number Publication Date
JPS59117151A JPS59117151A (ja) 1984-07-06
JPS6355869B2 true JPS6355869B2 (enrdf_load_stackoverflow) 1988-11-04

Family

ID=16938629

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57232399A Granted JPS59117151A (ja) 1982-12-23 1982-12-23 Mos集積回路

Country Status (1)

Country Link
JP (1) JPS59117151A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS59117151A (ja) 1984-07-06

Similar Documents

Publication Publication Date Title
JPH0653497A (ja) 入出力保護回路を備えた半導体装置
JP2602974B2 (ja) Cmos半導体集積回路装置
JPS6355869B2 (enrdf_load_stackoverflow)
JPS6362904B2 (enrdf_load_stackoverflow)
JPH08115985A (ja) 低雑音の半導体集積回路
JPH038357A (ja) 半導体集積回路装置
JPH0412627B2 (enrdf_load_stackoverflow)
JP3128813B2 (ja) 半導体集積回路
JPH02294063A (ja) 半導体集積回路
JP3271435B2 (ja) 半導体集積回路装置
KR850007315A (ko) 상보형(相補形) 금속산화막 반도체 직접회로 장치
JPS5944782B2 (ja) 半導体集積回路
JPH0532908B2 (enrdf_load_stackoverflow)
JPH0636596Y2 (ja) Cmos半導体装置
KR850005159A (ko) 기판에 전원 공급 통로를 가진 반도체 집적회로
JPH056964A (ja) 半導体集積回路装置
JPS62104068A (ja) 半導体集積回路装置
JPH01273346A (ja) 半導体装置
JPH03116863A (ja) 半導体集積回路装置
JPS6042622B2 (ja) 相補型mos集積回路
JPS56108257A (en) Semiconductor integrated circuit device
JPH0314232B2 (enrdf_load_stackoverflow)
JPS59181658A (ja) 半導体装置
JPS6281053A (ja) 半導体集積回路装置
JPH02226760A (ja) 半導体論理回路