JPS6324554B2 - - Google Patents
Info
- Publication number
- JPS6324554B2 JPS6324554B2 JP56061135A JP6113581A JPS6324554B2 JP S6324554 B2 JPS6324554 B2 JP S6324554B2 JP 56061135 A JP56061135 A JP 56061135A JP 6113581 A JP6113581 A JP 6113581A JP S6324554 B2 JPS6324554 B2 JP S6324554B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- water
- fluoroalkylsilane
- silanol oligomer
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000004819 silanols Chemical class 0.000 claims description 22
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims description 16
- 229920000642 polymer Polymers 0.000 claims description 12
- 239000012756 surface treatment agent Substances 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 31
- 238000011282 treatment Methods 0.000 description 20
- 239000005871 repellent Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 15
- 239000012528 membrane Substances 0.000 description 11
- 230000002940 repellent Effects 0.000 description 10
- 229910000077 silane Inorganic materials 0.000 description 9
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 5
- 125000003709 fluoroalkyl group Chemical group 0.000 description 5
- -1 polytetrafluoroethylene Polymers 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 239000004953 Aliphatic polyamide Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- 229920003231 aliphatic polyamide Polymers 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000008378 aryl ethers Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010411 cooking Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007644 letterpress printing Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004693 Polybenzimidazole Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 239000004955 Trogamid T Substances 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920002480 polybenzimidazole Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical group FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
Landscapes
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Lubricants (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6113581A JPS57177082A (en) | 1981-04-24 | 1981-04-24 | Surface treating agent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6113581A JPS57177082A (en) | 1981-04-24 | 1981-04-24 | Surface treating agent |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57177082A JPS57177082A (en) | 1982-10-30 |
| JPS6324554B2 true JPS6324554B2 (ko) | 1988-05-20 |
Family
ID=13162329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6113581A Granted JPS57177082A (en) | 1981-04-24 | 1981-04-24 | Surface treating agent |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57177082A (ko) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2502061B2 (ja) * | 1986-03-18 | 1996-05-29 | 旭硝子株式会社 | 柔軟性の高い撥水撥油剤 |
| JPH05170486A (ja) * | 1991-12-25 | 1993-07-09 | Central Glass Co Ltd | ガラス表面用撥水処理剤およびその撥水処理ガラス |
| DE69926093T2 (de) | 1998-02-13 | 2006-05-11 | Central Glass Co., Ltd., Ube | Wasserabweisende Lösung und Verfahren zur Herstellung einer wasserabweisenden Schicht auf einem Substrat mittels dieser Lösung |
| JP4951248B2 (ja) * | 2006-02-22 | 2012-06-13 | 三洋電機株式会社 | オープンショーケース |
| JP2016098189A (ja) * | 2014-11-19 | 2016-05-30 | セントラル硝子株式会社 | 含フッ素エーテル化合物、非水電解液、及び非水電解液電池 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS491648A (ko) * | 1972-03-09 | 1974-01-09 | ||
| JPS49127927A (ko) * | 1973-04-02 | 1974-12-07 | ||
| JPS5097616A (ko) * | 1973-12-28 | 1975-08-02 | ||
| JPS519739A (ja) * | 1974-07-10 | 1976-01-26 | Nikken Chemicals Co Ltd | Marutotorioosuoshuseibuntosuru denpuntono seizohoho |
| JPS53147029A (en) * | 1977-05-26 | 1978-12-21 | Central Glass Co Ltd | Fluoroorganosilicon compounds having hexafluoropropene oligomer residue and their uses |
-
1981
- 1981-04-24 JP JP6113581A patent/JPS57177082A/ja active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS491648A (ko) * | 1972-03-09 | 1974-01-09 | ||
| JPS49127927A (ko) * | 1973-04-02 | 1974-12-07 | ||
| JPS5097616A (ko) * | 1973-12-28 | 1975-08-02 | ||
| JPS519739A (ja) * | 1974-07-10 | 1976-01-26 | Nikken Chemicals Co Ltd | Marutotorioosuoshuseibuntosuru denpuntono seizohoho |
| JPS53147029A (en) * | 1977-05-26 | 1978-12-21 | Central Glass Co Ltd | Fluoroorganosilicon compounds having hexafluoropropene oligomer residue and their uses |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57177082A (en) | 1982-10-30 |
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