JPS6323331A - 蓋体の開閉機構 - Google Patents
蓋体の開閉機構Info
- Publication number
- JPS6323331A JPS6323331A JP61250343A JP25034386A JPS6323331A JP S6323331 A JPS6323331 A JP S6323331A JP 61250343 A JP61250343 A JP 61250343A JP 25034386 A JP25034386 A JP 25034386A JP S6323331 A JPS6323331 A JP S6323331A
- Authority
- JP
- Japan
- Prior art keywords
- opening
- lid
- chamber
- support
- rod
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002452 interceptive effect Effects 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 15
- 239000004065 semiconductor Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- SGTNSNPWRIOYBX-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-{[2-(3,4-dimethoxyphenyl)ethyl](methyl)amino}-2-(propan-2-yl)pentanenitrile Chemical compound C1=C(OC)C(OC)=CC=C1CCN(C)CCCC(C#N)(C(C)C)C1=CC=C(OC)C(OC)=C1 SGTNSNPWRIOYBX-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61250343A JPS6323331A (ja) | 1986-10-21 | 1986-10-21 | 蓋体の開閉機構 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61250343A JPS6323331A (ja) | 1986-10-21 | 1986-10-21 | 蓋体の開閉機構 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56147559A Division JPS5848935A (ja) | 1981-09-18 | 1981-09-18 | 自動プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6323331A true JPS6323331A (ja) | 1988-01-30 |
| JPS6323653B2 JPS6323653B2 (enExample) | 1988-05-17 |
Family
ID=17206506
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61250343A Granted JPS6323331A (ja) | 1986-10-21 | 1986-10-21 | 蓋体の開閉機構 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6323331A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001509640A (ja) * | 1997-07-11 | 2001-07-24 | ブルックス オートメーション インコーポレイテッド | 正圧力による自動封止アクセス扉 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04143661A (ja) * | 1990-10-04 | 1992-05-18 | Daikin Ind Ltd | 風速測定器 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5239210U (enExample) * | 1975-09-10 | 1977-03-19 | ||
| JPS53153219U (enExample) * | 1977-05-09 | 1978-12-02 | ||
| JPS559940U (enExample) * | 1978-07-07 | 1980-01-22 | ||
| JPS5689680A (en) * | 1979-12-21 | 1981-07-21 | Tokyo Shibaura Electric Co | Switchgear for double door |
| JPS5730320A (en) * | 1980-07-29 | 1982-02-18 | Fujitsu Ltd | Substrate holder for molecular beam epitaxy |
-
1986
- 1986-10-21 JP JP61250343A patent/JPS6323331A/ja active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5239210U (enExample) * | 1975-09-10 | 1977-03-19 | ||
| JPS53153219U (enExample) * | 1977-05-09 | 1978-12-02 | ||
| JPS559940U (enExample) * | 1978-07-07 | 1980-01-22 | ||
| JPS5689680A (en) * | 1979-12-21 | 1981-07-21 | Tokyo Shibaura Electric Co | Switchgear for double door |
| JPS5730320A (en) * | 1980-07-29 | 1982-02-18 | Fujitsu Ltd | Substrate holder for molecular beam epitaxy |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001509640A (ja) * | 1997-07-11 | 2001-07-24 | ブルックス オートメーション インコーポレイテッド | 正圧力による自動封止アクセス扉 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6323653B2 (enExample) | 1988-05-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2019216264A (ja) | オンザフライ基板センタリングを含む処理装置 | |
| JPS6130030B2 (enExample) | ||
| JPH11233583A (ja) | 半導体処理用ロードロック装置及び方法 | |
| US20020052094A1 (en) | Serial wafer handling mechanism | |
| JP3462657B2 (ja) | 薄膜形成装置および薄膜形成方法 | |
| CN100567562C (zh) | 薄膜形成装置 | |
| JPH05196150A (ja) | ゲートバルブ | |
| RU192228U1 (ru) | Вакуумная установка для нанесения тонкопленочных покрытий на подложку | |
| JPS6323331A (ja) | 蓋体の開閉機構 | |
| JPH0669315A (ja) | 基板搬送装置 | |
| WO2003088351A1 (fr) | Structure d'orifice dans un dispositif de traitement de semi-conducteur | |
| JPH03155619A (ja) | 真空処理装置 | |
| JPS5858726A (ja) | 半導体処理装置 | |
| JPS6350433B2 (enExample) | ||
| JP2550787B2 (ja) | 半導体装置の製造装置 | |
| JPH0590381A (ja) | 搬送装置 | |
| KR100761771B1 (ko) | 공정 챔버 | |
| JP2527763Y2 (ja) | 半導体プロセス装置 | |
| JPH0719340A (ja) | 真空チャンバ | |
| JPH01120811A (ja) | 半導体ウエハ処理装置 | |
| JPS63192222A (ja) | ドライプロセス半導体製造装置のチヤンバ開口部の開閉構造 | |
| JP3182496B2 (ja) | 真空ロード・アンロード方法および真空ゲートバルブならびに真空搬送容器 | |
| WO2018105427A1 (ja) | 基板上に膜を形成する方法、及び、成膜システム | |
| JPH08162520A (ja) | 被処理体移送用真空容器及びそれを用いた処理方法 | |
| JPS5848935A (ja) | 自動プラズマ処理装置 |