JPS6259051B2 - - Google Patents

Info

Publication number
JPS6259051B2
JPS6259051B2 JP54149238A JP14923879A JPS6259051B2 JP S6259051 B2 JPS6259051 B2 JP S6259051B2 JP 54149238 A JP54149238 A JP 54149238A JP 14923879 A JP14923879 A JP 14923879A JP S6259051 B2 JPS6259051 B2 JP S6259051B2
Authority
JP
Japan
Prior art keywords
trichlorosilane
silicon
hydrogen
reaction
silicon tetrachloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54149238A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5673617A (en
Inventor
Toshio Noda
Eiichi Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Titanium Co Ltd
Original Assignee
Osaka Titanium Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Titanium Co Ltd filed Critical Osaka Titanium Co Ltd
Priority to JP14923879A priority Critical patent/JPS5673617A/ja
Publication of JPS5673617A publication Critical patent/JPS5673617A/ja
Publication of JPS6259051B2 publication Critical patent/JPS6259051B2/ja
Granted legal-status Critical Current

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  • Silicon Compounds (AREA)
JP14923879A 1979-11-17 1979-11-17 Manufacture of trichlorosilane Granted JPS5673617A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14923879A JPS5673617A (en) 1979-11-17 1979-11-17 Manufacture of trichlorosilane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14923879A JPS5673617A (en) 1979-11-17 1979-11-17 Manufacture of trichlorosilane

Publications (2)

Publication Number Publication Date
JPS5673617A JPS5673617A (en) 1981-06-18
JPS6259051B2 true JPS6259051B2 (OSRAM) 1987-12-09

Family

ID=15470895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14923879A Granted JPS5673617A (en) 1979-11-17 1979-11-17 Manufacture of trichlorosilane

Country Status (1)

Country Link
JP (1) JPS5673617A (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009018713A1 (fr) * 2007-08-08 2009-02-12 Xuzhou Southeast Polysilicon R & D Ltd Procédés et dispositifs améliorés servant à préparer trichloro-hydrosilicium et polysilicium
CN103723734A (zh) * 2012-10-10 2014-04-16 浙江昱辉阳光能源有限公司 一种制备三氯氢硅的工艺
CN110655086A (zh) * 2019-11-12 2020-01-07 唐山三孚硅业股份有限公司 三氯氢硅生产工艺中提高四氯化硅转化率的方法

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
DE10061682A1 (de) 2000-12-11 2002-07-04 Solarworld Ag Verfahren zur Herstellung von Reinstsilicium
DE10062413A1 (de) * 2000-12-14 2002-07-04 Solarworld Ag Verfahren zur Herstellung von Trichlorsilan
US20020187096A1 (en) * 2001-06-08 2002-12-12 Kendig James Edward Process for preparation of polycrystalline silicon
WO2010116500A1 (ja) * 2009-04-08 2010-10-14 電気化学工業株式会社 トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法
JP5535679B2 (ja) 2010-02-18 2014-07-02 株式会社トクヤマ トリクロロシランの製造方法
JP5337749B2 (ja) 2010-03-10 2013-11-06 信越化学工業株式会社 トリクロロシランの製造方法
NO334216B1 (no) * 2010-08-13 2014-01-13 Elkem As Fremgangsmåte for fremstilling av triklorsilan og silisium for bruk ved fremstilling av triklorsilan
US8226920B1 (en) * 2011-01-07 2012-07-24 Mitsubishi Polycrystalline Silicon America Corporation (MIPSA) Apparatus and method for producing polycrystalline silicon having a reduced amount of boron compounds by venting the system with an inert gas
JP6008385B2 (ja) * 2012-03-22 2016-10-19 株式会社大阪チタニウムテクノロジーズ クロロシラン類の製造方法及び製造装置
JP5909153B2 (ja) 2012-06-14 2016-04-26 信越化学工業株式会社 高純度多結晶シリコンの製造方法
JP5879283B2 (ja) 2013-02-13 2016-03-08 信越化学工業株式会社 トリクロロシランの製造方法
WO2015047043A1 (ko) 2013-09-30 2015-04-02 주식회사 엘지화학 트리클로로실란 제조방법
US9643851B2 (en) 2013-09-30 2017-05-09 Lg Chem, Ltd. Method for producing trichlorosilane
KR101580171B1 (ko) 2014-01-23 2015-12-24 한국화학연구원 금속 실리사이드 표면개질 방법, 표면개질된 금속 실리사이드를 이용한 삼염화실란의 제조방법 및 제조장치
KR101816339B1 (ko) 2014-05-13 2018-01-08 주식회사 엘지화학 연속식 관형반응기를 이용한 클로로실란가스 제조방법
JP6095613B2 (ja) 2014-07-10 2017-03-15 信越化学工業株式会社 クロロシランの精製方法
KR101616043B1 (ko) 2014-07-22 2016-04-27 한화케미칼 주식회사 삼염화실란의 제조방법
KR20160069380A (ko) 2014-12-08 2016-06-16 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR101754457B1 (ko) 2014-12-08 2017-07-06 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR20160102807A (ko) 2015-02-23 2016-08-31 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR20160144609A (ko) 2015-06-09 2016-12-19 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR102012910B1 (ko) 2015-06-26 2019-08-22 주식회사 엘지화학 트리클로로실란 제조장치 및 제조방법
KR20170001411A (ko) 2015-06-26 2017-01-04 주식회사 엘지화학 트리클로로실란 제조방법 및 제조장치
KR102012914B1 (ko) 2015-09-14 2019-08-22 주식회사 엘지화학 트리클로로실란 제조장치 및 제조방법
KR102009929B1 (ko) 2015-09-15 2019-08-12 주식회사 엘지화학 트리클로로실란 제조방법
JP7369323B2 (ja) 2021-11-01 2023-10-25 株式会社トクヤマ トリクロロシランの製造方法及び多結晶シリコンロッドの製造方法
CN116924410A (zh) * 2023-07-20 2023-10-24 江苏中能硅业科技发展有限公司 一种改良西门子法、流化床法联合生产工艺及装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3148035A (en) * 1960-03-10 1964-09-08 Wacker Chemie Gmbh Apparatus for the continuous production of silicon chloroform and/or silicon tetrachloride
JPS52133022A (en) * 1976-04-30 1977-11-08 Mitsubishi Metal Corp Production of high purity silicon
US4117094A (en) * 1977-06-13 1978-09-26 Texas Instruments Incorporated Process for silicon and trichlorosilane production

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009018713A1 (fr) * 2007-08-08 2009-02-12 Xuzhou Southeast Polysilicon R & D Ltd Procédés et dispositifs améliorés servant à préparer trichloro-hydrosilicium et polysilicium
CN103723734A (zh) * 2012-10-10 2014-04-16 浙江昱辉阳光能源有限公司 一种制备三氯氢硅的工艺
CN110655086A (zh) * 2019-11-12 2020-01-07 唐山三孚硅业股份有限公司 三氯氢硅生产工艺中提高四氯化硅转化率的方法

Also Published As

Publication number Publication date
JPS5673617A (en) 1981-06-18

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