JPS6256575B2 - - Google Patents

Info

Publication number
JPS6256575B2
JPS6256575B2 JP17468080A JP17468080A JPS6256575B2 JP S6256575 B2 JPS6256575 B2 JP S6256575B2 JP 17468080 A JP17468080 A JP 17468080A JP 17468080 A JP17468080 A JP 17468080A JP S6256575 B2 JPS6256575 B2 JP S6256575B2
Authority
JP
Japan
Prior art keywords
target
substrate
recording medium
magnetic recording
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17468080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57100627A (en
Inventor
Sadao Kadokura
Takashi Tomie
Masahiko Naoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=15982810&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPS6256575(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP17468080A priority Critical patent/JPS57100627A/ja
Priority to CA000391981A priority patent/CA1181033A/en
Priority to US06/329,822 priority patent/US4407894A/en
Priority to DE8181110352T priority patent/DE3176675D1/de
Priority to EP19810110352 priority patent/EP0054269B1/en
Publication of JPS57100627A publication Critical patent/JPS57100627A/ja
Priority to US06/502,662 priority patent/US4507364A/en
Priority to CA000451231A priority patent/CA1184881A/en
Publication of JPS6256575B2 publication Critical patent/JPS6256575B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/656—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing Co
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/90—Magnetic feature
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
JP17468080A 1980-12-12 1980-12-12 Manufacture of vertical magnetic recording medium Granted JPS57100627A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP17468080A JPS57100627A (en) 1980-12-12 1980-12-12 Manufacture of vertical magnetic recording medium
CA000391981A CA1181033A (en) 1980-12-12 1981-12-10 Perpendicular magnetic recording medium and method for producing the same
US06/329,822 US4407894A (en) 1980-12-12 1981-12-11 Method for producing a perpendicular magnetic recording medium
DE8181110352T DE3176675D1 (en) 1980-12-12 1981-12-11 Perpendicular magnetic recording medium, method for producing the same, and sputtering device
EP19810110352 EP0054269B1 (en) 1980-12-12 1981-12-11 Perpendicular magnetic recording medium, method for producing the same, and sputtering device
US06/502,662 US4507364A (en) 1980-12-12 1983-07-14 Perpendicular magnetic recording medium
CA000451231A CA1184881A (en) 1980-12-12 1984-04-03 Perpendicular magnetic recording medium, method for producing the same, and sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17468080A JPS57100627A (en) 1980-12-12 1980-12-12 Manufacture of vertical magnetic recording medium

Publications (2)

Publication Number Publication Date
JPS57100627A JPS57100627A (en) 1982-06-22
JPS6256575B2 true JPS6256575B2 (OSRAM) 1987-11-26

Family

ID=15982810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17468080A Granted JPS57100627A (en) 1980-12-12 1980-12-12 Manufacture of vertical magnetic recording medium

Country Status (5)

Country Link
US (2) US4407894A (OSRAM)
EP (1) EP0054269B1 (OSRAM)
JP (1) JPS57100627A (OSRAM)
CA (1) CA1181033A (OSRAM)
DE (1) DE3176675D1 (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007086276A1 (ja) 2006-01-25 2007-08-02 Ulvac, Inc. スパッタリング装置及び成膜方法

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5834903A (ja) * 1981-08-27 1983-03-01 Tdk Corp 磁気記録媒体
US4666788A (en) * 1982-02-16 1987-05-19 Teijin Limited Perpendicular magnetic recording medium, method for producing the same, and sputtering device
JPS58141433A (ja) * 1982-02-16 1983-08-22 Teijin Ltd 磁気記録媒体とその製造方法
JPS592230A (ja) * 1982-06-25 1984-01-07 Toshiba Corp フロッピー磁気ディスク記録媒体の製造方法
DE3465647D1 (en) * 1983-03-08 1987-10-01 Ulvac Corp A magnetic recording member and a manufacturing method for such a member
US4599280A (en) * 1983-04-25 1986-07-08 Tdk Corporation Magnetic recording medium
US4684454A (en) * 1983-05-17 1987-08-04 Minnesota Mining And Manufacturing Company Sputtering process for making magneto optic alloy
JPS6039106A (ja) * 1983-08-10 1985-02-28 Res Dev Corp Of Japan 微粒子の製造方法
JPS6066330A (ja) * 1983-09-20 1985-04-16 Sanyo Electric Co Ltd テ−プ状媒体の製造方法
JPS60101726A (ja) * 1983-11-05 1985-06-05 Konishiroku Photo Ind Co Ltd 磁性層の形成方法
JPS60127527A (ja) * 1983-12-15 1985-07-08 Saiteku Kk 膜状積重磁気記録媒体およびその製造方法
JPH0644543B2 (ja) * 1984-01-18 1994-06-08 株式会社日立製作所 磁性膜デバイスの製造方法
DE3565694D1 (en) * 1984-02-02 1988-11-24 Hitachi Metals Ltd Process for manufacturing magnetic recording media
US4663193A (en) * 1984-12-26 1987-05-05 Hitachi Metals, Ltd. Process for manufacturing magnetic recording medium
US5574961A (en) * 1985-01-16 1996-11-12 The United States Of America As Represented By The Secretary Of The Navy Phase-separated material (U)
JPS6246449A (ja) * 1985-08-23 1987-02-28 Konishiroku Photo Ind Co Ltd 光磁気記録媒体の製造方法
EP0232505A1 (de) * 1985-12-20 1987-08-19 Siemens Aktiengesellschaft Magnetische Speichereinrichtung mit einem senkrecht zu magnetisierenden Aufzeichnungsmedium
JPS6314864A (ja) * 1986-07-08 1988-01-22 Ulvac Corp Ｃｏ基合金スパツタタ−ゲツトおよびその製造法
US4902531A (en) * 1986-10-30 1990-02-20 Nihon Shinku Gijutsu Kabushiki Kaisha Vacuum processing method and apparatus
JPS63270461A (ja) * 1986-12-26 1988-11-08 Teijin Ltd 対向ターゲット式スパッタ装置
US4963524A (en) * 1987-09-24 1990-10-16 Semiconductor Energy Laboratory Co., Ltd. Sputtering device for manufacturing superconducting oxide material and method therefor
JP2673807B2 (ja) * 1987-10-30 1997-11-05 パイオニア株式会社 光磁気記録媒体の製造方法
JPH02217467A (ja) * 1989-02-17 1990-08-30 Pioneer Electron Corp 対向ターゲット型スパッタリング装置
JP3125907B2 (ja) * 1993-09-27 2001-01-22 株式会社ミツバ 結晶配向薄膜製造装置
JP3606481B2 (ja) * 1995-10-31 2005-01-05 戸田工業株式会社 ＮｉＯ配向膜の製造法
JP3886209B2 (ja) * 1997-06-02 2007-02-28 貞夫 門倉 対向ターゲット式スパッタ装置
JPH1168134A (ja) * 1997-08-08 1999-03-09 Bridgestone Corp 太陽電池モジュール
JP4097893B2 (ja) 2000-12-05 2008-06-11 株式会社エフ・ティ・エスコーポレーション 対向ターゲット式スパッタ方法及び導電性膜の形成方法
US7294283B2 (en) * 2001-04-20 2007-11-13 Applied Process Technologies, Inc. Penning discharge plasma source
EP1390558B1 (en) 2001-04-20 2011-01-19 General Plasma, Inc. Penning discharge plasma source
JP4563629B2 (ja) * 2001-11-19 2010-10-13 株式会社エフ・ティ・エスコーポレーション 対向ターゲット式スパッタ装置
JP4066044B2 (ja) * 2002-11-08 2008-03-26 信行 高橋 成膜方法及びスパッタ装置
US7932678B2 (en) * 2003-09-12 2011-04-26 General Plasma, Inc. Magnetic mirror plasma source and method using same
US6962648B2 (en) * 2003-09-15 2005-11-08 Global Silicon Net Corp. Back-biased face target sputtering
US20060231384A1 (en) * 2005-04-13 2006-10-19 Makoto Nagashima Back-biased face target sputtering
US20060249370A1 (en) * 2003-09-15 2006-11-09 Makoto Nagashima Back-biased face target sputtering based liquid crystal display device
JP2007529633A (ja) * 2004-03-22 2007-10-25 オー・ツェー・エリコン・バルザース・アクチェンゲゼルシャフト 薄膜を製造するためのスパッタリング装置
US7477482B2 (en) 2005-04-19 2009-01-13 International Business Machines Corporation Magnetic recording head
US20070205096A1 (en) * 2006-03-06 2007-09-06 Makoto Nagashima Magnetron based wafer processing
WO2007109198A2 (en) * 2006-03-17 2007-09-27 Applied Process Technologies, Inc. Mirror magnetron plasma source
US8454810B2 (en) 2006-07-14 2013-06-04 4D-S Pty Ltd. Dual hexagonal shaped plasma source
US8308915B2 (en) * 2006-09-14 2012-11-13 4D-S Pty Ltd. Systems and methods for magnetron deposition
CN116352233B (zh) * 2023-05-30 2023-08-22 中镱新材料智能制造研究院(山西)有限公司 一种弹射式陶瓷颗粒增强复合材料熔融堆积增材制造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3856579A (en) * 1972-12-04 1974-12-24 Battelle Development Corp Sputtered magnetic materials comprising rare-earth metals and method of preparation
US4024299A (en) * 1973-10-15 1977-05-17 General Electric Company Process for preparing magnetic member
US4144585A (en) * 1974-03-19 1979-03-13 The United States Of America As Represented By The Secretary Of The Air Force Bubble domain structures and method of making
JPS5891B2 (ja) * 1977-09-30 1983-01-05 俊一 岩崎 磁気記録媒体
US4277809A (en) * 1979-09-26 1981-07-07 Memorex Corporation Apparatus for recording magnetic impulses perpendicular to the surface of a recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007086276A1 (ja) 2006-01-25 2007-08-02 Ulvac, Inc. スパッタリング装置及び成膜方法

Also Published As

Publication number Publication date
US4507364A (en) 1985-03-26
US4407894A (en) 1983-10-04
EP0054269B1 (en) 1988-03-02
CA1181033A (en) 1985-01-15
EP0054269A3 (en) 1983-08-10
JPS57100627A (en) 1982-06-22
EP0054269A2 (en) 1982-06-23
DE3176675D1 (en) 1988-04-07

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