JPS6223450B2 - - Google Patents
Info
- Publication number
- JPS6223450B2 JPS6223450B2 JP54059126A JP5912679A JPS6223450B2 JP S6223450 B2 JPS6223450 B2 JP S6223450B2 JP 54059126 A JP54059126 A JP 54059126A JP 5912679 A JP5912679 A JP 5912679A JP S6223450 B2 JPS6223450 B2 JP S6223450B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor film
- hydrogen
- plasma
- film
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Photovoltaic Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5912679A JPS55151328A (en) | 1979-05-16 | 1979-05-16 | Method and apparatus for fabricating hydrogen-containing amorphous semiconductor film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5912679A JPS55151328A (en) | 1979-05-16 | 1979-05-16 | Method and apparatus for fabricating hydrogen-containing amorphous semiconductor film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55151328A JPS55151328A (en) | 1980-11-25 |
JPS6223450B2 true JPS6223450B2 (en, 2012) | 1987-05-22 |
Family
ID=13104295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5912679A Granted JPS55151328A (en) | 1979-05-16 | 1979-05-16 | Method and apparatus for fabricating hydrogen-containing amorphous semiconductor film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55151328A (en, 2012) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57152173A (en) * | 1981-02-12 | 1982-09-20 | Atlantic Richfield Co | Amorphous semiconductor alloy and method of producing same |
US4339470A (en) * | 1981-02-13 | 1982-07-13 | Rca Corporation | Fabricating amorphous silicon solar cells by varying the temperature _of the substrate during deposition of the amorphous silicon layer |
JPS5853869A (ja) * | 1981-09-26 | 1983-03-30 | Semiconductor Energy Lab Co Ltd | 光電変換装置作製方法 |
JPS58103178A (ja) * | 1981-12-15 | 1983-06-20 | Kanegafuchi Chem Ind Co Ltd | 耐熱性薄膜太陽電池 |
JPS5952883A (ja) * | 1982-09-20 | 1984-03-27 | Fuji Electric Corp Res & Dev Ltd | 太陽電池 |
JPS60120515A (ja) * | 1983-12-05 | 1985-06-28 | Hitachi Ltd | 薄膜形成装置 |
JPS60131542A (ja) * | 1983-12-21 | 1985-07-13 | Hitachi Ltd | アモルフアスシリコン製造装置 |
JPS6199387A (ja) * | 1984-10-22 | 1986-05-17 | Fuji Xerox Co Ltd | 光電変換素子およびその製造方法 |
JP2675552B2 (ja) * | 1987-05-15 | 1997-11-12 | 鐘淵化学工業株式会社 | 非晶質半導体、非晶質半導体装置およびそれらの製法 |
JPH0449174Y2 (en, 2012) * | 1988-01-14 | 1992-11-19 | ||
US6720259B2 (en) * | 2001-10-02 | 2004-04-13 | Genus, Inc. | Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor deposition |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2214204C3 (de) * | 1972-03-23 | 1975-12-11 | Nikolaj Alexandrowitsch Michaljow | Reaktor zur kontinuierlichen Polymerisation |
JPS53103985A (en) * | 1977-02-22 | 1978-09-09 | Kokusai Electric Co Ltd | Growing film forming method |
-
1979
- 1979-05-16 JP JP5912679A patent/JPS55151328A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS55151328A (en) | 1980-11-25 |
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