JPS62103387A - 電気めつき液 - Google Patents

電気めつき液

Info

Publication number
JPS62103387A
JPS62103387A JP305786A JP305786A JPS62103387A JP S62103387 A JPS62103387 A JP S62103387A JP 305786 A JP305786 A JP 305786A JP 305786 A JP305786 A JP 305786A JP S62103387 A JPS62103387 A JP S62103387A
Authority
JP
Japan
Prior art keywords
plating
salt
salts
electroplating solution
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP305786A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0319308B2 (OSRAM
Inventor
Toru Murakami
透 村上
Hiroshi Uotani
魚谷 鴻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
Original Assignee
Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uemera Kogyo Co Ltd, C Uyemura and Co Ltd filed Critical Uemera Kogyo Co Ltd
Publication of JPS62103387A publication Critical patent/JPS62103387A/ja
Publication of JPH0319308B2 publication Critical patent/JPH0319308B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electroplating And Plating Baths Therefor (AREA)
JP305786A 1985-07-29 1986-01-10 電気めつき液 Granted JPS62103387A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP60-167014 1985-07-29
JP16701485 1985-07-29

Publications (2)

Publication Number Publication Date
JPS62103387A true JPS62103387A (ja) 1987-05-13
JPH0319308B2 JPH0319308B2 (OSRAM) 1991-03-14

Family

ID=15841785

Family Applications (2)

Application Number Title Priority Date Filing Date
JP305786A Granted JPS62103387A (ja) 1985-07-29 1986-01-10 電気めつき液
JP305886A Granted JPS62109991A (ja) 1985-07-29 1986-01-10 電気めつき液

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP305886A Granted JPS62109991A (ja) 1985-07-29 1986-01-10 電気めつき液

Country Status (1)

Country Link
JP (2) JPS62103387A (OSRAM)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH049492A (ja) * 1990-04-26 1992-01-14 Nippon Kagaku Sangyo Kk 硬質ニッケル合金めっき浴
JP2001107284A (ja) * 1999-10-01 2001-04-17 Shimizu:Kk ほう酸を含まないニッケルめっき浴
JP2005082856A (ja) * 2003-09-08 2005-03-31 Osaka Prefecture ニッケル−モリブデン合金めっき液とそのめっき皮膜及びめっき物品
JP2007262430A (ja) * 2006-03-27 2007-10-11 C Uyemura & Co Ltd 電気めっき方法
JP2009079247A (ja) * 2007-09-26 2009-04-16 C Uyemura & Co Ltd 電気めっき方法
JP2015206122A (ja) * 2013-10-25 2015-11-19 オーエム産業株式会社 電気Niめっき液
KR20190108029A (ko) * 2018-03-13 2019-09-23 어드밴텍 글로벌, 리미티드 철-니켈 합금 섀도우 마스크 및 그 제조 방법
WO2019179897A1 (en) * 2018-03-20 2019-09-26 Aveni Process for electrodeposition of cobalt
FR3079242A1 (fr) * 2018-03-20 2019-09-27 Aveni Procede d'electrodeposition de cobalt
WO2019201623A2 (en) 2018-04-19 2019-10-24 Basf Se Composition for cobalt or cobalt alloy electroplating

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04116191A (ja) * 1990-09-04 1992-04-16 C Uyemura & Co Ltd 電気めっき方法
JPH05331676A (ja) * 1992-05-27 1993-12-14 Sumitomo Metal Mining Co Ltd 電気鉄めっき液
JPH05331677A (ja) * 1992-05-27 1993-12-14 Sumitomo Metal Mining Co Ltd 電気鉄めっき液
US7494578B2 (en) * 2004-03-01 2009-02-24 Atotech Deutschland Gmbh Iron-phosphorus electroplating bath and method
JP4994422B2 (ja) 2009-05-13 2012-08-08 リズム時計工業株式会社 検知システム、検知システムの信号処理方法、および、煙感知器
JP5631775B2 (ja) 2011-02-24 2014-11-26 新光電気工業株式会社 複合めっき液
JP2014227570A (ja) * 2013-05-22 2014-12-08 日東電工株式会社 無電解めっき方法、多層基材の製造方法、多層基材および入力装置
KR101616194B1 (ko) * 2014-09-03 2016-04-27 연세대학교 산학협력단 적외선 조명을 이용한 객체 추출 방법 및 그 장치

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH049492A (ja) * 1990-04-26 1992-01-14 Nippon Kagaku Sangyo Kk 硬質ニッケル合金めっき浴
JP2001107284A (ja) * 1999-10-01 2001-04-17 Shimizu:Kk ほう酸を含まないニッケルめっき浴
JP2005082856A (ja) * 2003-09-08 2005-03-31 Osaka Prefecture ニッケル−モリブデン合金めっき液とそのめっき皮膜及びめっき物品
JP2007262430A (ja) * 2006-03-27 2007-10-11 C Uyemura & Co Ltd 電気めっき方法
JP2009079247A (ja) * 2007-09-26 2009-04-16 C Uyemura & Co Ltd 電気めっき方法
JP2015206122A (ja) * 2013-10-25 2015-11-19 オーエム産業株式会社 電気Niめっき液
KR20190108029A (ko) * 2018-03-13 2019-09-23 어드밴텍 글로벌, 리미티드 철-니켈 합금 섀도우 마스크 및 그 제조 방법
FR3079242A1 (fr) * 2018-03-20 2019-09-27 Aveni Procede d'electrodeposition de cobalt
WO2019179897A1 (en) * 2018-03-20 2019-09-26 Aveni Process for electrodeposition of cobalt
FR3079241A1 (fr) * 2018-03-20 2019-09-27 Aveni Procede d'electrodeposition de cobalt
CN111771016A (zh) * 2018-03-20 2020-10-13 阿文尼公司 用于钴的电沉积的方法
US11384445B2 (en) 2018-03-20 2022-07-12 Aveni Process for electrodeposition of cobalt
CN111771016B (zh) * 2018-03-20 2023-05-23 阿文尼公司 用于钴的电沉积的方法
TWI804593B (zh) * 2018-03-20 2023-06-11 法商阿文尼公司 電鍍鈷之方法
WO2019201623A2 (en) 2018-04-19 2019-10-24 Basf Se Composition for cobalt or cobalt alloy electroplating
US11585004B2 (en) 2018-04-19 2023-02-21 Basf Se Composition for cobalt or cobalt alloy electroplating

Also Published As

Publication number Publication date
JPS62109991A (ja) 1987-05-21
JPH0319309B2 (OSRAM) 1991-03-14
JPH0319308B2 (OSRAM) 1991-03-14

Similar Documents

Publication Publication Date Title
JPS62103387A (ja) 電気めつき液
CA2159268C (en) Alkaline zinc and zinc alloy electroplating baths and processes
US5750018A (en) Cyanide-free monovalent copper electroplating solutions
CA1051818A (en) Bath and method for the electrodeposition of bright nickel-iron deposits
JPS6362595B2 (OSRAM)
JPH05271980A (ja) パラジウム−ニッケル合金メッキ液
GB2155493A (en) Electroplating zinc-iron alloy from alkaline bath
JP7349427B2 (ja) 3価クロムメッキ液およびこれを用いたクロムメッキ方法
JPS62278293A (ja) 電子部品の製造方法
US4310392A (en) Electrolytic plating
JP3171117B2 (ja) ニッケル、コバルト又はニッケル・コバルト合金とリンとの合金めっき浴及びめっき方法
US4021316A (en) Bath for the electrodeposition of bright tin-cobalt alloy
JPH01298192A (ja) 亜鉛−ニッケル合金めっき液
CN108754553A (zh) 基于杂环类生物碱配位的三价金无氰镀金电镀液及其应用
JPH02285091A (ja) ニッケル―銅合金めっき浴
JPS63114997A (ja) 電気めつき方法
JPH07233494A (ja) 鉄族合金電気めっき浴
JP2769614B2 (ja) 亜鉛−ニツケル合金用めつき浴
US3951760A (en) Bath for the electrodeposition of bright tin-cobalt alloy
US3475290A (en) Bright gold plating solution and process
JPH02301588A (ja) 錫,鉛,錫―鉛合金電気めっき浴及び電気めっき方法
JPH0319307B2 (OSRAM)
JPS63206494A (ja) シアン化合物を含まない光沢銅−亜鉛−錫合金電気めつき浴
JPS62278292A (ja) 電子部品の製造方法
JPS61223194A (ja) 金/スズ合金被膜の電着浴

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term