JPS61251135A - 自動現像装置 - Google Patents

自動現像装置

Info

Publication number
JPS61251135A
JPS61251135A JP60093139A JP9313985A JPS61251135A JP S61251135 A JPS61251135 A JP S61251135A JP 60093139 A JP60093139 A JP 60093139A JP 9313985 A JP9313985 A JP 9313985A JP S61251135 A JPS61251135 A JP S61251135A
Authority
JP
Japan
Prior art keywords
substrate
developer
development
stage
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60093139A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0431173B2 (cg-RX-API-DMAC7.html
Inventor
Nobuji Tsuchiya
土屋　宜司
Yasuo Matsuoka
康男 松岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP60093139A priority Critical patent/JPS61251135A/ja
Priority to US06/851,206 priority patent/US4755844A/en
Publication of JPS61251135A publication Critical patent/JPS61251135A/ja
Publication of JPH0431173B2 publication Critical patent/JPH0431173B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D5/00—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
    • G03D5/04—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected using liquid sprays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP60093139A 1985-04-30 1985-04-30 自動現像装置 Granted JPS61251135A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60093139A JPS61251135A (ja) 1985-04-30 1985-04-30 自動現像装置
US06/851,206 US4755844A (en) 1985-04-30 1986-04-14 Automatic developing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60093139A JPS61251135A (ja) 1985-04-30 1985-04-30 自動現像装置

Publications (2)

Publication Number Publication Date
JPS61251135A true JPS61251135A (ja) 1986-11-08
JPH0431173B2 JPH0431173B2 (cg-RX-API-DMAC7.html) 1992-05-25

Family

ID=14074191

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60093139A Granted JPS61251135A (ja) 1985-04-30 1985-04-30 自動現像装置

Country Status (2)

Country Link
US (1) US4755844A (cg-RX-API-DMAC7.html)
JP (1) JPS61251135A (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62117323A (ja) * 1985-11-18 1987-05-28 Toshiba Corp 自動現像装置
JPH0210824A (ja) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd 電子線レジスト現像方法

Families Citing this family (50)

* Cited by examiner, † Cited by third party
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JPS63271931A (ja) * 1987-04-28 1988-11-09 Tokyo Electron Ltd 現像装置
JPH0264646A (ja) * 1988-08-31 1990-03-05 Toshiba Corp レジストパターンの現像方法及びこの方法に使用する現像装置
US4922277A (en) * 1988-11-28 1990-05-01 The United States Of America As Represented By The Secretary Of The Air Force Silicon wafer photoresist developer
JP2585784B2 (ja) * 1989-02-03 1997-02-26 株式会社東芝 自動現像装置および方法
US5416552A (en) * 1994-01-28 1995-05-16 Surface Tek, Inc. Apparatus and method for replenishing developer
US5853961A (en) * 1995-04-19 1998-12-29 Tokyo Electron Limited Method of processing substrate and apparatus for processing substrate
US5821035A (en) * 1996-03-06 1998-10-13 Sony Corporation Resist developing apparatus and resist developing method
TW359854B (en) * 1996-06-21 1999-06-01 Tokyo Electron Ltd Processing apparatus and processing method
US5988896A (en) * 1996-10-26 1999-11-23 Applied Science Fiction, Inc. Method and apparatus for electronic film development
US6069714A (en) 1996-12-05 2000-05-30 Applied Science Fiction, Inc. Method and apparatus for reducing noise in electronic film development
US6017688A (en) 1997-01-30 2000-01-25 Applied Science Fiction, Inc. System and method for latent film recovery in electronic film development
AU3307099A (en) 1998-02-23 1999-09-06 Applied Science Fiction, Inc. Progressive area scan in electronic film development
US5913721A (en) * 1998-04-06 1999-06-22 Taiwan Semiconductor Manufacturing Co. Ltd. Ventilation hood with enhanced particle control and method of using
US6594041B1 (en) 1998-11-20 2003-07-15 Applied Science Fiction, Inc. Log time processing and stitching system
US6781620B1 (en) 1999-03-16 2004-08-24 Eastman Kodak Company Mixed-element stitching and noise reduction system
TW495389B (en) 1999-06-29 2002-07-21 Applied Science Fiction Inc Slot coater device for applying developer to film for electronic film development
US6439784B1 (en) 1999-08-17 2002-08-27 Applied Science Fiction, Inc. Method and system for using calibration patches in electronic film processing
AU2054401A (en) * 1999-12-17 2001-06-25 Applied Science Fiction, Inc. Method and system for selective enhancement of image data
US6447178B2 (en) 1999-12-30 2002-09-10 Applied Science Fiction, Inc. System, method, and apparatus for providing multiple extrusion widths
US6554504B2 (en) 1999-12-30 2003-04-29 Applied Science Fiction, Inc. Distributed digital film processing system and method
US6965692B1 (en) 1999-12-30 2005-11-15 Eastman Kodak Company Method and apparatus for improving the quality of reconstructed information
US6788335B2 (en) 1999-12-30 2004-09-07 Eastman Kodak Company Pulsed illumination signal modulation control & adjustment method and system
US6864973B2 (en) 1999-12-30 2005-03-08 Eastman Kodak Company Method and apparatus to pre-scan and pre-treat film for improved digital film processing handling
US6813392B2 (en) 1999-12-30 2004-11-02 Eastman Kodak Company Method and apparatus for aligning multiple scans of the same area of a medium using mathematical correlation
WO2001050193A1 (en) 1999-12-30 2001-07-12 Applied Science Fiction, Inc. Improved system and method for digital film development using visible light
US20010030685A1 (en) * 1999-12-30 2001-10-18 Darbin Stephen P. Method and apparatus for digital film processing using a scanning station having a single sensor
AU2743701A (en) * 1999-12-30 2001-07-16 Applied Science Fiction, Inc. System and method for digital film development using visible light
US6707557B2 (en) 1999-12-30 2004-03-16 Eastman Kodak Company Method and system for estimating sensor dark current drift and sensor/illumination non-uniformities
US6505977B2 (en) 1999-12-30 2003-01-14 Applied Science Fiction, Inc. System and method for digital color dye film processing
US20020051215A1 (en) * 1999-12-30 2002-05-02 Thering Michael R. Methods and apparatus for transporting and positioning film in a digital film processing system
US6475711B1 (en) 1999-12-31 2002-11-05 Applied Science Fiction, Inc. Photographic element and digital film processing method using same
WO2001050192A1 (en) * 1999-12-31 2001-07-12 Applied Science Fiction, Inc. Digital film processing method
WO2001095028A2 (en) 2000-02-03 2001-12-13 Applied Science Fiction Method and system for self-service film processing
AU2001236693A1 (en) * 2000-02-03 2001-08-14 Applied Science Fiction Film processing solution cartridge and method for developing and digitizing film
US6619863B2 (en) 2000-02-03 2003-09-16 Eastman Kodak Company Method and system for capturing film images
AU2001239745A1 (en) 2000-02-03 2001-08-14 Applied Science Fiction Method, system, and software for signal processing using pyramidal decomposition
US20010040701A1 (en) * 2000-02-03 2001-11-15 Edgar Albert D. Photographic film having time resolved sensitivity distinction
AU2001238039A1 (en) 2000-02-03 2001-08-14 Applied Science Fiction Method, system and software for signal processing using sheep and shepherd artifacts
US7020344B2 (en) 2000-02-03 2006-03-28 Eastman Kodak Company Match blur system and method
US20060182337A1 (en) * 2000-06-28 2006-08-17 Ford Benjamin C Method and apparatus for improving the quality of reconstructed information
US20020118402A1 (en) * 2000-09-19 2002-08-29 Shaw Timothy C. Film bridge for digital film scanning system
EP1323292A2 (en) * 2000-09-21 2003-07-02 Applied Science Fiction Dynamic image correction and imaging systems
US20020146171A1 (en) * 2000-10-01 2002-10-10 Applied Science Fiction, Inc. Method, apparatus and system for black segment detection
US6888997B2 (en) * 2000-12-05 2005-05-03 Eastman Kodak Company Waveguide device and optical transfer system for directing light to an image plane
CN1520532A (zh) 2001-02-09 2004-08-11 伊斯曼柯达公司 数字洗片溶液和数字洗片方法
US6805501B2 (en) * 2001-07-16 2004-10-19 Eastman Kodak Company System and method for digital film development using visible light
US7263240B2 (en) * 2002-01-14 2007-08-28 Eastman Kodak Company Method, system, and software for improving signal quality using pyramidal decomposition
US6955485B2 (en) * 2002-03-01 2005-10-18 Tokyo Electron Limited Developing method and developing unit
CN100490505C (zh) * 2004-02-13 2009-05-20 索尼株式会社 图像处理装置和图像处理方法
CN101344733B (zh) * 2007-07-11 2010-09-29 上海宏力半导体制造有限公司 一种光阻涂布和显影设备

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5473578A (en) * 1977-11-24 1979-06-12 Toshiba Corp Pattern exposure method of semiconductor substrate and pattern exposure apparatus
JPS5655047A (en) * 1979-10-11 1981-05-15 Matsushita Electric Ind Co Ltd Developing method and device therefor
JPS5666044A (en) * 1979-11-05 1981-06-04 Toshiba Corp Semiconductor device
JPS5868749A (ja) * 1981-10-21 1983-04-23 Toshiba Corp レジスト現像装置
JPS58128441U (ja) * 1982-02-24 1983-08-31 富士通株式会社 現像装置
JPS6052622U (ja) * 1983-09-19 1985-04-13 関西日本電気株式会社 半導体製造装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
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US3727620A (en) * 1970-03-18 1973-04-17 Fluoroware Of California Inc Rinsing and drying device
US3769992A (en) * 1971-12-06 1973-11-06 Fluoroware Inc Spray processing machine
US4027686A (en) * 1973-01-02 1977-06-07 Texas Instruments Incorporated Method and apparatus for cleaning the surface of a semiconductor slice with a liquid spray of de-ionized water
US3990462A (en) * 1975-05-19 1976-11-09 Fluoroware Systems Corporation Substrate stripping and cleaning apparatus
US4015615A (en) * 1975-06-13 1977-04-05 International Business Machines Corporation Fluid application system
JPS5364472A (en) * 1976-11-22 1978-06-08 Hitachi Ltd Processing apparatus
US4161356A (en) * 1977-01-21 1979-07-17 Burchard John S Apparatus for in-situ processing of photoplates
US4132567A (en) * 1977-10-13 1979-01-02 Fsi Corporation Apparatus for and method of cleaning and removing static charges from substrates
US4286541A (en) * 1979-07-26 1981-09-01 Fsi Corporation Applying photoresist onto silicon wafers
JPS5794573A (en) * 1980-12-02 1982-06-12 Toshiba Corp Etching device
JPS57166032A (en) * 1981-04-03 1982-10-13 Toshiba Corp Spray type developing device for positive resist
JPS57208135A (en) * 1981-06-18 1982-12-21 Fujitsu Ltd Spray type resist developing apparatus
GB2108707B (en) * 1981-07-08 1985-06-19 Pioneer Electronic Corp Method and system for developing a photo-resist material used as a recording medium
JPS5823440A (ja) * 1981-08-04 1983-02-12 Nec Kyushu Ltd 半導体製造装置
JPS609129A (ja) * 1983-06-29 1985-01-18 Fujitsu Ltd ウエツト処理装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5473578A (en) * 1977-11-24 1979-06-12 Toshiba Corp Pattern exposure method of semiconductor substrate and pattern exposure apparatus
JPS5655047A (en) * 1979-10-11 1981-05-15 Matsushita Electric Ind Co Ltd Developing method and device therefor
JPS5666044A (en) * 1979-11-05 1981-06-04 Toshiba Corp Semiconductor device
JPS5868749A (ja) * 1981-10-21 1983-04-23 Toshiba Corp レジスト現像装置
JPS58128441U (ja) * 1982-02-24 1983-08-31 富士通株式会社 現像装置
JPS6052622U (ja) * 1983-09-19 1985-04-13 関西日本電気株式会社 半導体製造装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62117323A (ja) * 1985-11-18 1987-05-28 Toshiba Corp 自動現像装置
JPH0210824A (ja) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd 電子線レジスト現像方法

Also Published As

Publication number Publication date
JPH0431173B2 (cg-RX-API-DMAC7.html) 1992-05-25
US4755844A (en) 1988-07-05

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