JPS5655047A - Developing method and device therefor - Google Patents

Developing method and device therefor

Info

Publication number
JPS5655047A
JPS5655047A JP13148679A JP13148679A JPS5655047A JP S5655047 A JPS5655047 A JP S5655047A JP 13148679 A JP13148679 A JP 13148679A JP 13148679 A JP13148679 A JP 13148679A JP S5655047 A JPS5655047 A JP S5655047A
Authority
JP
Japan
Prior art keywords
head
developer
container
substrate
evacuated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13148679A
Other languages
Japanese (ja)
Other versions
JPS614175B2 (en
Inventor
Kenzo Hatada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13148679A priority Critical patent/JPS5655047A/en
Publication of JPS5655047A publication Critical patent/JPS5655047A/en
Publication of JPS614175B2 publication Critical patent/JPS614175B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To uniformly and accurately develop by forming a space with a pinner head in which a semiconductor substrate coated with a resist is evacuated in vacuum and a recessed container, introducing a developer thereinto, developing it, isolating the container from the head and rotating the head. CONSTITUTION:A semiconductor substrate 1 coated with a resist is evacuated in vacuum on a spinner head 2, a recessed container 3 is lowered by a piston mechanism 7, and a space is thus formed therebetween. Then, a developer 10 is introduced through a pipe 4, and the substrate is developed. Subsequently, the developer is exhausted, and a rinsing liquid 10' is then introduced through the pipe 4 to rinse it. Then the container is raised, the head 3 is rotated in high speed, and the rinsing liquid adhered onto the substrate 1 is removed. Since a complete dipping developing can be thus executed, a uniform and accurate patter development can be enabled, and the amount of the developer can be thus saved.
JP13148679A 1979-10-11 1979-10-11 Developing method and device therefor Granted JPS5655047A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13148679A JPS5655047A (en) 1979-10-11 1979-10-11 Developing method and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13148679A JPS5655047A (en) 1979-10-11 1979-10-11 Developing method and device therefor

Publications (2)

Publication Number Publication Date
JPS5655047A true JPS5655047A (en) 1981-05-15
JPS614175B2 JPS614175B2 (en) 1986-02-07

Family

ID=15059102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13148679A Granted JPS5655047A (en) 1979-10-11 1979-10-11 Developing method and device therefor

Country Status (1)

Country Link
JP (1) JPS5655047A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61196535A (en) * 1985-02-26 1986-08-30 Mitsubishi Electric Corp Semiconductor manufacturing device
JPS61251135A (en) * 1985-04-30 1986-11-08 Toshiba Corp Automatic developing apparatus
JPS62141501A (en) * 1985-12-16 1987-06-25 Mitsubishi Electric Corp Color filter dyeing device
JPH01122125A (en) * 1987-11-05 1989-05-15 Seiko Epson Corp Method and apparatus for wet treating semiconductor substrate
US4855775A (en) * 1987-04-28 1989-08-08 Tokyo Electron Limited Developing apparatus
JPH024986A (en) * 1987-10-31 1990-01-09 Dainippon Screen Mfg Co Ltd Surface treatment of substrate
JPH0210824A (en) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd Electron-beam resist developing method
JPH03139832A (en) * 1989-10-25 1991-06-14 Ebara Corp Jet scrubber

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61196535A (en) * 1985-02-26 1986-08-30 Mitsubishi Electric Corp Semiconductor manufacturing device
JPS61251135A (en) * 1985-04-30 1986-11-08 Toshiba Corp Automatic developing apparatus
JPH0431173B2 (en) * 1985-04-30 1992-05-25
JPS62141501A (en) * 1985-12-16 1987-06-25 Mitsubishi Electric Corp Color filter dyeing device
US4855775A (en) * 1987-04-28 1989-08-08 Tokyo Electron Limited Developing apparatus
JPH024986A (en) * 1987-10-31 1990-01-09 Dainippon Screen Mfg Co Ltd Surface treatment of substrate
JPH01122125A (en) * 1987-11-05 1989-05-15 Seiko Epson Corp Method and apparatus for wet treating semiconductor substrate
JPH0210824A (en) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd Electron-beam resist developing method
JPH03139832A (en) * 1989-10-25 1991-06-14 Ebara Corp Jet scrubber

Also Published As

Publication number Publication date
JPS614175B2 (en) 1986-02-07

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