JPS5768024A - Developing method for photoresist film - Google Patents

Developing method for photoresist film

Info

Publication number
JPS5768024A
JPS5768024A JP14380780A JP14380780A JPS5768024A JP S5768024 A JPS5768024 A JP S5768024A JP 14380780 A JP14380780 A JP 14380780A JP 14380780 A JP14380780 A JP 14380780A JP S5768024 A JPS5768024 A JP S5768024A
Authority
JP
Japan
Prior art keywords
film
developer
tube
substrate
rinsing solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14380780A
Other languages
Japanese (ja)
Inventor
Hiroshi Maruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14380780A priority Critical patent/JPS5768024A/en
Publication of JPS5768024A publication Critical patent/JPS5768024A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain an accurate resist pattern by exposing a photoresist film coated on a substrate in accordance with the prescribed pattern, and gradually increasing the rinsing solution adding amount contained in a developer to substitute for the developer on the substrate when the developer is injected to develop the film. CONSTITUTION:A glass substrate 2 having a photoresist film 1 exposed in accordance with the prescribed pattern is secured with a vacuum chuck to a rotating stainless steel disc 3, is disposed on the film 1, and stainless steel nozzle tubes 4, 5 throttled at the ends are arranged at an interval. Subsequently, developer is injected together with high pressure N2 gas from the tube 4, rinsing solution is also injected together with high pressure gas from the nozzle tube 5 simultaneously, and the film 1 is developed. With this construction, the pressure of the N2 gas is controlled to gradually decrease the developer from the tube 4, and the rinsing solution from the tube 5 is increased. In this manner, the film to be removed of the film 1 can be eliminated on the substrate 2.
JP14380780A 1980-10-15 1980-10-15 Developing method for photoresist film Pending JPS5768024A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14380780A JPS5768024A (en) 1980-10-15 1980-10-15 Developing method for photoresist film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14380780A JPS5768024A (en) 1980-10-15 1980-10-15 Developing method for photoresist film

Publications (1)

Publication Number Publication Date
JPS5768024A true JPS5768024A (en) 1982-04-26

Family

ID=15347424

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14380780A Pending JPS5768024A (en) 1980-10-15 1980-10-15 Developing method for photoresist film

Country Status (1)

Country Link
JP (1) JPS5768024A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011092879A (en) * 2009-10-30 2011-05-12 Miura Co Ltd Steam separator

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011092879A (en) * 2009-10-30 2011-05-12 Miura Co Ltd Steam separator

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