JPS6072925A - 有機溶媒可溶性の感光性ポリイミド - Google Patents

有機溶媒可溶性の感光性ポリイミド

Info

Publication number
JPS6072925A
JPS6072925A JP18352083A JP18352083A JPS6072925A JP S6072925 A JPS6072925 A JP S6072925A JP 18352083 A JP18352083 A JP 18352083A JP 18352083 A JP18352083 A JP 18352083A JP S6072925 A JPS6072925 A JP S6072925A
Authority
JP
Japan
Prior art keywords
polyimide
aromatic diamine
photosensitive polyimide
diamine compound
organic solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18352083A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0225378B2 (US06650917-20031118-M00005.png
Inventor
Tsunetomo Nakano
中野　常朝
Hiroshi Yasuno
安野　弘
Kazuaki Nishio
一章 西尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP18352083A priority Critical patent/JPS6072925A/ja
Publication of JPS6072925A publication Critical patent/JPS6072925A/ja
Publication of JPH0225378B2 publication Critical patent/JPH0225378B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP18352083A 1983-09-30 1983-09-30 有機溶媒可溶性の感光性ポリイミド Granted JPS6072925A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18352083A JPS6072925A (ja) 1983-09-30 1983-09-30 有機溶媒可溶性の感光性ポリイミド

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18352083A JPS6072925A (ja) 1983-09-30 1983-09-30 有機溶媒可溶性の感光性ポリイミド

Publications (2)

Publication Number Publication Date
JPS6072925A true JPS6072925A (ja) 1985-04-25
JPH0225378B2 JPH0225378B2 (US06650917-20031118-M00005.png) 1990-06-01

Family

ID=16137281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18352083A Granted JPS6072925A (ja) 1983-09-30 1983-09-30 有機溶媒可溶性の感光性ポリイミド

Country Status (1)

Country Link
JP (1) JPS6072925A (US06650917-20031118-M00005.png)

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4765137A (en) * 1986-03-07 1988-08-23 Yamaha Hatsudoki Kabushiki Kaisha Exhaust gas control means for engine
JPH0243221A (ja) * 1988-06-10 1990-02-13 Occidental Chem Corp 新規可溶性ポリイミドシロキサン及びその製法及び用途
US4909033A (en) * 1985-11-26 1990-03-20 Yamaha Hatsudoki Kabushiki Kaisha High performance exhaust system for internal combustion engine
JPH02163741A (ja) * 1988-12-16 1990-06-25 Hitachi Chem Co Ltd 感光性樹脂組成物およびこれを用いた感光性エレメント
JPH0359034A (ja) * 1989-07-27 1991-03-14 Hitachi Chem Co Ltd ポリイミド系樹脂の製造法
US5665523A (en) * 1994-03-29 1997-09-09 Nitto Denko Corporation Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern
US5674461A (en) * 1993-12-09 1997-10-07 Honda Giken Kogyo Kabushiki Kaisha Exhaust device
US5851736A (en) * 1991-03-05 1998-12-22 Nitto Denko Corporation Heat-resistant photoresist composition, photosensitive substrate, and process for forming heat-resistant positive or negative pattern
US6001534A (en) * 1997-03-31 1999-12-14 Shin-Etsu Chemical Co., Ltd. Photosensitive resin composition
US6436593B1 (en) 1999-09-28 2002-08-20 Hitachi Chemical Dupont Microsystems Ltd. Positive photosensitive resin composition, process for producing pattern and electronic parts
US7435525B2 (en) 2004-05-07 2008-10-14 Hitachi Chemical Dupont Microsystems Ltd. Positive photosensitive resin composition, method for forming pattern, and electronic part
US7638254B2 (en) 2004-05-07 2009-12-29 Hitachi Chemical Dupont Microsystems Ltd Positive photosensitive resin composition, method for forming pattern, and electronic part
US20110200939A1 (en) * 2009-08-28 2011-08-18 Lg Chem, Ltd. Polyamic acid, polyimide, photosensitive resin composition comprising the same and dry film manufactured by the same
WO2011105576A1 (ja) * 2010-02-26 2011-09-01 日産化学工業株式会社 ジアミン化合物、液晶配向剤及び液晶表示素子
US8298747B2 (en) 2007-03-12 2012-10-30 Hitachi Chemical Dupont Microsystems, Ltd. Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part
US8420291B2 (en) 2007-10-29 2013-04-16 Hitachi Chemical Dupont Microsystems, Ltd. Positive photosensitive resin composition, method for forming pattern, electronic component
US8758977B2 (en) 2005-09-22 2014-06-24 Hitachi Chemical Dupont Microsystems, Ltd. Negative-type photosensitive resin composition, pattern forming method and electronic parts
JP2018081225A (ja) * 2016-11-17 2018-05-24 Jsr株式会社 液晶配向剤、液晶素子の製造方法、液晶配向膜、液晶素子、重合体

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4909033A (en) * 1985-11-26 1990-03-20 Yamaha Hatsudoki Kabushiki Kaisha High performance exhaust system for internal combustion engine
US4765137A (en) * 1986-03-07 1988-08-23 Yamaha Hatsudoki Kabushiki Kaisha Exhaust gas control means for engine
JPH0243221A (ja) * 1988-06-10 1990-02-13 Occidental Chem Corp 新規可溶性ポリイミドシロキサン及びその製法及び用途
JPH02163741A (ja) * 1988-12-16 1990-06-25 Hitachi Chem Co Ltd 感光性樹脂組成物およびこれを用いた感光性エレメント
JPH0359034A (ja) * 1989-07-27 1991-03-14 Hitachi Chem Co Ltd ポリイミド系樹脂の製造法
US5851736A (en) * 1991-03-05 1998-12-22 Nitto Denko Corporation Heat-resistant photoresist composition, photosensitive substrate, and process for forming heat-resistant positive or negative pattern
US5674461A (en) * 1993-12-09 1997-10-07 Honda Giken Kogyo Kabushiki Kaisha Exhaust device
US5665523A (en) * 1994-03-29 1997-09-09 Nitto Denko Corporation Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern
US6001534A (en) * 1997-03-31 1999-12-14 Shin-Etsu Chemical Co., Ltd. Photosensitive resin composition
US6436593B1 (en) 1999-09-28 2002-08-20 Hitachi Chemical Dupont Microsystems Ltd. Positive photosensitive resin composition, process for producing pattern and electronic parts
US7435525B2 (en) 2004-05-07 2008-10-14 Hitachi Chemical Dupont Microsystems Ltd. Positive photosensitive resin composition, method for forming pattern, and electronic part
US7638254B2 (en) 2004-05-07 2009-12-29 Hitachi Chemical Dupont Microsystems Ltd Positive photosensitive resin composition, method for forming pattern, and electronic part
EP2469337A1 (en) 2004-05-07 2012-06-27 Hitachi Chemical DuPont MicroSystems Ltd. Positive photosensitive resin composition, method for forming pattern, and electronic component
US8758977B2 (en) 2005-09-22 2014-06-24 Hitachi Chemical Dupont Microsystems, Ltd. Negative-type photosensitive resin composition, pattern forming method and electronic parts
US8871422B2 (en) 2005-09-22 2014-10-28 Hitachi Chemical Dupont Microsystems Ltd. Negative-type photosensitive resin composition, pattern forming method and electronic parts
US8298747B2 (en) 2007-03-12 2012-10-30 Hitachi Chemical Dupont Microsystems, Ltd. Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part
US8420291B2 (en) 2007-10-29 2013-04-16 Hitachi Chemical Dupont Microsystems, Ltd. Positive photosensitive resin composition, method for forming pattern, electronic component
US20110200939A1 (en) * 2009-08-28 2011-08-18 Lg Chem, Ltd. Polyamic acid, polyimide, photosensitive resin composition comprising the same and dry film manufactured by the same
WO2011105576A1 (ja) * 2010-02-26 2011-09-01 日産化学工業株式会社 ジアミン化合物、液晶配向剤及び液晶表示素子
JP5783166B2 (ja) * 2010-02-26 2015-09-24 日産化学工業株式会社 液晶配向剤、液晶表示素子及びジアミン化合物
JP2018081225A (ja) * 2016-11-17 2018-05-24 Jsr株式会社 液晶配向剤、液晶素子の製造方法、液晶配向膜、液晶素子、重合体

Also Published As

Publication number Publication date
JPH0225378B2 (US06650917-20031118-M00005.png) 1990-06-01

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