JPS60254729A - マスク基板上のマスクパタ−ンの修正方法 - Google Patents

マスク基板上のマスクパタ−ンの修正方法

Info

Publication number
JPS60254729A
JPS60254729A JP59111929A JP11192984A JPS60254729A JP S60254729 A JPS60254729 A JP S60254729A JP 59111929 A JP59111929 A JP 59111929A JP 11192984 A JP11192984 A JP 11192984A JP S60254729 A JPS60254729 A JP S60254729A
Authority
JP
Japan
Prior art keywords
ink
mask pattern
pattern
laser beam
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59111929A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6311659B2 (enExample
Inventor
Seiji Morisawa
森沢　誠司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP59111929A priority Critical patent/JPS60254729A/ja
Publication of JPS60254729A publication Critical patent/JPS60254729A/ja
Publication of JPS6311659B2 publication Critical patent/JPS6311659B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP59111929A 1984-05-31 1984-05-31 マスク基板上のマスクパタ−ンの修正方法 Granted JPS60254729A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59111929A JPS60254729A (ja) 1984-05-31 1984-05-31 マスク基板上のマスクパタ−ンの修正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59111929A JPS60254729A (ja) 1984-05-31 1984-05-31 マスク基板上のマスクパタ−ンの修正方法

Publications (2)

Publication Number Publication Date
JPS60254729A true JPS60254729A (ja) 1985-12-16
JPS6311659B2 JPS6311659B2 (enExample) 1988-03-15

Family

ID=14573662

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59111929A Granted JPS60254729A (ja) 1984-05-31 1984-05-31 マスク基板上のマスクパタ−ンの修正方法

Country Status (1)

Country Link
JP (1) JPS60254729A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4950498A (en) * 1986-02-24 1990-08-21 Seiko Instruments Inc. Process for repairing pattern film
KR100749976B1 (ko) * 2005-03-09 2007-08-16 세이코 엡슨 가부시키가이샤 포토마스크 및 그 제조 방법, 전자 기기의 제조 방법

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4950498A (en) * 1986-02-24 1990-08-21 Seiko Instruments Inc. Process for repairing pattern film
KR100749976B1 (ko) * 2005-03-09 2007-08-16 세이코 엡슨 가부시키가이샤 포토마스크 및 그 제조 방법, 전자 기기의 제조 방법
US7776492B2 (en) 2005-03-09 2010-08-17 Seiko Epson Corporation Photomask, manufacturing method thereof, and manufacturing method of electronic device

Also Published As

Publication number Publication date
JPS6311659B2 (enExample) 1988-03-15

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