JPS6311659B2 - - Google Patents

Info

Publication number
JPS6311659B2
JPS6311659B2 JP11192984A JP11192984A JPS6311659B2 JP S6311659 B2 JPS6311659 B2 JP S6311659B2 JP 11192984 A JP11192984 A JP 11192984A JP 11192984 A JP11192984 A JP 11192984A JP S6311659 B2 JPS6311659 B2 JP S6311659B2
Authority
JP
Japan
Prior art keywords
ink
mask pattern
mask
substrate
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11192984A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60254729A (ja
Inventor
Seiji Morisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP59111929A priority Critical patent/JPS60254729A/ja
Publication of JPS60254729A publication Critical patent/JPS60254729A/ja
Publication of JPS6311659B2 publication Critical patent/JPS6311659B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP59111929A 1984-05-31 1984-05-31 マスク基板上のマスクパタ−ンの修正方法 Granted JPS60254729A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59111929A JPS60254729A (ja) 1984-05-31 1984-05-31 マスク基板上のマスクパタ−ンの修正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59111929A JPS60254729A (ja) 1984-05-31 1984-05-31 マスク基板上のマスクパタ−ンの修正方法

Publications (2)

Publication Number Publication Date
JPS60254729A JPS60254729A (ja) 1985-12-16
JPS6311659B2 true JPS6311659B2 (enExample) 1988-03-15

Family

ID=14573662

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59111929A Granted JPS60254729A (ja) 1984-05-31 1984-05-31 マスク基板上のマスクパタ−ンの修正方法

Country Status (1)

Country Link
JP (1) JPS60254729A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62195662A (ja) * 1986-02-24 1987-08-28 Seiko Instr & Electronics Ltd マスクリペア方法及び装置
JP4337746B2 (ja) * 2005-03-09 2009-09-30 セイコーエプソン株式会社 フォトマスクおよびその製造方法、電子機器の製造方法

Also Published As

Publication number Publication date
JPS60254729A (ja) 1985-12-16

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