JPS5961104A - 多層軟磁性膜の製造方法 - Google Patents

多層軟磁性膜の製造方法

Info

Publication number
JPS5961104A
JPS5961104A JP17146182A JP17146182A JPS5961104A JP S5961104 A JPS5961104 A JP S5961104A JP 17146182 A JP17146182 A JP 17146182A JP 17146182 A JP17146182 A JP 17146182A JP S5961104 A JPS5961104 A JP S5961104A
Authority
JP
Japan
Prior art keywords
soft magnetic
thin film
magnetic thin
magnetic film
multilayer soft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17146182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH056333B2 (enrdf_load_stackoverflow
Inventor
Osamu Yokoyama
修 横山
Tsuneo Handa
恒雄 半田
Mitsuhiro Inazumi
満広 稲積
Akihiko Kawachi
河内　明彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP17146182A priority Critical patent/JPS5961104A/ja
Publication of JPS5961104A publication Critical patent/JPS5961104A/ja
Publication of JPH056333B2 publication Critical patent/JPH056333B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F41/305—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices applying the spacer or adjusting its interface, e.g. in order to enable particular effect different from exchange coupling
    • H01F41/307—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices applying the spacer or adjusting its interface, e.g. in order to enable particular effect different from exchange coupling insulating or semiconductive spacer

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)
JP17146182A 1982-09-30 1982-09-30 多層軟磁性膜の製造方法 Granted JPS5961104A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17146182A JPS5961104A (ja) 1982-09-30 1982-09-30 多層軟磁性膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17146182A JPS5961104A (ja) 1982-09-30 1982-09-30 多層軟磁性膜の製造方法

Publications (2)

Publication Number Publication Date
JPS5961104A true JPS5961104A (ja) 1984-04-07
JPH056333B2 JPH056333B2 (enrdf_load_stackoverflow) 1993-01-26

Family

ID=15923533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17146182A Granted JPS5961104A (ja) 1982-09-30 1982-09-30 多層軟磁性膜の製造方法

Country Status (1)

Country Link
JP (1) JPS5961104A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6196510A (ja) * 1984-10-17 1986-05-15 Hitachi Ltd 高透磁率多層磁性体膜
US4752344A (en) * 1986-12-22 1988-06-21 International Business Machines Corporation Magnetic layer and method of manufacture

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5669809A (en) * 1979-11-09 1981-06-11 Tdk Corp Magnetic material and its manufacture
JPS5733432A (en) * 1980-08-01 1982-02-23 Sekisui Chem Co Ltd Magnetic recording medium and its production
JPS5853021A (ja) * 1981-09-24 1983-03-29 Victor Co Of Japan Ltd 多層磁性薄膜

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5669809A (en) * 1979-11-09 1981-06-11 Tdk Corp Magnetic material and its manufacture
JPS5733432A (en) * 1980-08-01 1982-02-23 Sekisui Chem Co Ltd Magnetic recording medium and its production
JPS5853021A (ja) * 1981-09-24 1983-03-29 Victor Co Of Japan Ltd 多層磁性薄膜

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6196510A (ja) * 1984-10-17 1986-05-15 Hitachi Ltd 高透磁率多層磁性体膜
US4752344A (en) * 1986-12-22 1988-06-21 International Business Machines Corporation Magnetic layer and method of manufacture

Also Published As

Publication number Publication date
JPH056333B2 (enrdf_load_stackoverflow) 1993-01-26

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