JPS5669809A - Magnetic material and its manufacture - Google Patents

Magnetic material and its manufacture

Info

Publication number
JPS5669809A
JPS5669809A JP14511179A JP14511179A JPS5669809A JP S5669809 A JPS5669809 A JP S5669809A JP 14511179 A JP14511179 A JP 14511179A JP 14511179 A JP14511179 A JP 14511179A JP S5669809 A JPS5669809 A JP S5669809A
Authority
JP
Japan
Prior art keywords
evaporating source
thin film
film
foil
beads
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14511179A
Other languages
Japanese (ja)
Inventor
Kiyoshi Kurakane
Masao Kakizaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP14511179A priority Critical patent/JPS5669809A/en
Publication of JPS5669809A publication Critical patent/JPS5669809A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To obtain a thin film having a faborable magnetic characteristic by a method wherein a thin film type metallic ferromagnetic material and a thin film type nonmetallic insulator having a large electric resistance are laminated alternately generating atoms or ions in a vacuum or in a low pressure. CONSTITUTION:A supporting member 3 is arranged over two electron beam evaporating source 1, 2 and an Al foil 4 are fixed to the under face with junks 5. Constituting the thin film forming device in this way, the permalloy beads are filled up in a melting pot provided in the evaporating source 1 using a supply device 6, and the nonmetallic dielectric material of Ni-Zn ferrite beads or SiO2 beads having a high electric resistance are filled up in a melting pot provided in the evaporating source 2 using a supply device 7. Then the evaporating source 1 is made to operate to form the permalloy film 10 of 1-20mum thickness on the surface of the foil 4, and in succession the evaporating source 1 is made to stop and the evaporating source 2 is made to operate to adhere the ferrite film or SiC film 11 of 50-5,000Angstrom thickness on the film 10. By this way, after the process is repeated, the foil 4 is molten off using a chemicals.
JP14511179A 1979-11-09 1979-11-09 Magnetic material and its manufacture Pending JPS5669809A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14511179A JPS5669809A (en) 1979-11-09 1979-11-09 Magnetic material and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14511179A JPS5669809A (en) 1979-11-09 1979-11-09 Magnetic material and its manufacture

Publications (1)

Publication Number Publication Date
JPS5669809A true JPS5669809A (en) 1981-06-11

Family

ID=15377631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14511179A Pending JPS5669809A (en) 1979-11-09 1979-11-09 Magnetic material and its manufacture

Country Status (1)

Country Link
JP (1) JPS5669809A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS599905A (en) * 1982-07-09 1984-01-19 Hitachi Ltd Magnetic substance film
JPS5961104A (en) * 1982-09-30 1984-04-07 Seiko Epson Corp Multi-layer soft magnetic film
JPS60128605A (en) * 1983-12-16 1985-07-09 Hitachi Ltd Amorphous magnetic alloy multilayer film and magnetic head using the same
JPH0282601A (en) * 1988-09-20 1990-03-23 Mitsubishi Mining & Cement Co Ltd Multilayer magnetic film
CN112216507A (en) * 2020-09-30 2021-01-12 电子科技大学 Preparation method and application of unsupported high-performance ferrite magnetic film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51138899A (en) * 1975-05-26 1976-11-30 Hitachi Ltd Layered high permiability magnetic material

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51138899A (en) * 1975-05-26 1976-11-30 Hitachi Ltd Layered high permiability magnetic material

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS599905A (en) * 1982-07-09 1984-01-19 Hitachi Ltd Magnetic substance film
JPH0519804B2 (en) * 1982-07-09 1993-03-17 Hitachi Ltd
JPS5961104A (en) * 1982-09-30 1984-04-07 Seiko Epson Corp Multi-layer soft magnetic film
JPH056333B2 (en) * 1982-09-30 1993-01-26 Seiko Epson Corp
JPS60128605A (en) * 1983-12-16 1985-07-09 Hitachi Ltd Amorphous magnetic alloy multilayer film and magnetic head using the same
JPH0282601A (en) * 1988-09-20 1990-03-23 Mitsubishi Mining & Cement Co Ltd Multilayer magnetic film
CN112216507A (en) * 2020-09-30 2021-01-12 电子科技大学 Preparation method and application of unsupported high-performance ferrite magnetic film

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