JPS59107910A - アルゴンガスの精製方法 - Google Patents
アルゴンガスの精製方法Info
- Publication number
- JPS59107910A JPS59107910A JP21546482A JP21546482A JPS59107910A JP S59107910 A JPS59107910 A JP S59107910A JP 21546482 A JP21546482 A JP 21546482A JP 21546482 A JP21546482 A JP 21546482A JP S59107910 A JPS59107910 A JP S59107910A
- Authority
- JP
- Japan
- Prior art keywords
- argon
- molecular sieves
- type molecular
- bringing
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 title claims abstract description 62
- 229910052786 argon Inorganic materials 0.000 title claims abstract description 31
- 238000000034 method Methods 0.000 title claims description 22
- 239000002808 molecular sieve Substances 0.000 claims abstract description 12
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims abstract description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000000746 purification Methods 0.000 claims abstract description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052802 copper Inorganic materials 0.000 claims abstract description 5
- 239000010949 copper Substances 0.000 claims abstract description 5
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 5
- 239000007789 gas Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 230000008929 regeneration Effects 0.000 claims description 4
- 238000011069 regeneration method Methods 0.000 claims description 4
- 238000012423 maintenance Methods 0.000 abstract description 3
- 239000012535 impurity Substances 0.000 description 9
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 238000005247 gettering Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical class [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002090 carbon oxide Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 239000010457 zeolite Substances 0.000 description 2
- 101150050114 CTL1 gene Proteins 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000009749 continuous casting Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical class O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- -1 moisture Chemical compound 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 101150052401 slc44a1 gene Proteins 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B23/00—Noble gases; Compounds thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21546482A JPS59107910A (ja) | 1982-12-10 | 1982-12-10 | アルゴンガスの精製方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21546482A JPS59107910A (ja) | 1982-12-10 | 1982-12-10 | アルゴンガスの精製方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59107910A true JPS59107910A (ja) | 1984-06-22 |
| JPH0379288B2 JPH0379288B2 (enrdf_load_stackoverflow) | 1991-12-18 |
Family
ID=16672803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21546482A Granted JPS59107910A (ja) | 1982-12-10 | 1982-12-10 | アルゴンガスの精製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59107910A (enrdf_load_stackoverflow) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60239309A (ja) * | 1984-05-11 | 1985-11-28 | Seitetsu Kagaku Co Ltd | アルゴンの回収方法 |
| DE3621014A1 (de) * | 1985-06-28 | 1987-01-08 | Taiyo Sanso Co Ltd | Reinigungsvorrichtung fuer argon |
| JPH01297022A (ja) * | 1988-02-05 | 1989-11-30 | Zojirushi Corp | 金属製真空二重構造体及びその製造方法 |
| JPH0578108A (ja) * | 1991-02-25 | 1993-03-30 | Union Carbide Ind Gases Technol Corp | アルゴン精製方法及び装置 |
| JP2007045655A (ja) * | 2005-08-09 | 2007-02-22 | Japan Pionics Co Ltd | ガスの精製方法及び精製装置 |
| WO2013119883A1 (en) | 2012-02-10 | 2013-08-15 | Entegris, Inc. | Gas purifier |
| WO2016062714A1 (en) * | 2014-10-20 | 2016-04-28 | Renishaw Plc | Additive manufacturing apparatus and methods |
| CN108069407A (zh) * | 2017-12-28 | 2018-05-25 | 江西石华精细化工科技协同创新有限公司 | 一种绝氧气体的脱水除氧方法 |
| WO2019187811A1 (ja) * | 2018-03-29 | 2019-10-03 | エア・ウォーター株式会社 | 精製ガスの製造装置および精製ガスの製造方法 |
| WO2019187810A1 (ja) * | 2018-03-27 | 2019-10-03 | エア・ウォーター株式会社 | 精製ガスの製造装置および精製ガスの製造方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS506440A (enrdf_load_stackoverflow) * | 1973-05-17 | 1975-01-23 | ||
| JPS5242755A (en) * | 1975-10-01 | 1977-04-02 | Hitachi Ltd | Process for measuring displacements on the overall peripheral surface of a cylindrical object by means of moire fringe |
| JPS53147669A (en) * | 1977-05-30 | 1978-12-22 | Daiyo Sanso | Removing agent for removing hydrogen* carbon monoxide* oxygen* etc* from mixed gas |
| JPS5726377A (en) * | 1980-07-24 | 1982-02-12 | Nippon Oxygen Co Ltd | Production of argon gas |
-
1982
- 1982-12-10 JP JP21546482A patent/JPS59107910A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS506440A (enrdf_load_stackoverflow) * | 1973-05-17 | 1975-01-23 | ||
| JPS5242755A (en) * | 1975-10-01 | 1977-04-02 | Hitachi Ltd | Process for measuring displacements on the overall peripheral surface of a cylindrical object by means of moire fringe |
| JPS53147669A (en) * | 1977-05-30 | 1978-12-22 | Daiyo Sanso | Removing agent for removing hydrogen* carbon monoxide* oxygen* etc* from mixed gas |
| JPS5726377A (en) * | 1980-07-24 | 1982-02-12 | Nippon Oxygen Co Ltd | Production of argon gas |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60239309A (ja) * | 1984-05-11 | 1985-11-28 | Seitetsu Kagaku Co Ltd | アルゴンの回収方法 |
| DE3621014A1 (de) * | 1985-06-28 | 1987-01-08 | Taiyo Sanso Co Ltd | Reinigungsvorrichtung fuer argon |
| JPS623008A (ja) * | 1985-06-28 | 1987-01-09 | 大陽酸素株式会社 | アルゴンの超精製装置、並びに精製方法 |
| JPH01297022A (ja) * | 1988-02-05 | 1989-11-30 | Zojirushi Corp | 金属製真空二重構造体及びその製造方法 |
| JPH0578108A (ja) * | 1991-02-25 | 1993-03-30 | Union Carbide Ind Gases Technol Corp | アルゴン精製方法及び装置 |
| JP2007045655A (ja) * | 2005-08-09 | 2007-02-22 | Japan Pionics Co Ltd | ガスの精製方法及び精製装置 |
| US9694319B2 (en) | 2012-02-10 | 2017-07-04 | Entegris, Inc. | Gas purifier |
| WO2013119883A1 (en) | 2012-02-10 | 2013-08-15 | Entegris, Inc. | Gas purifier |
| EP3207976A1 (en) | 2012-02-10 | 2017-08-23 | Entegris, Inc. | Gas purifier |
| US10245554B2 (en) | 2012-02-10 | 2019-04-02 | Entegris, Inc. | Gas purifier |
| WO2016062714A1 (en) * | 2014-10-20 | 2016-04-28 | Renishaw Plc | Additive manufacturing apparatus and methods |
| US10632567B2 (en) | 2014-10-20 | 2020-04-28 | Renishaw Plc | Additive manufacturing apparatus and methods |
| CN108069407A (zh) * | 2017-12-28 | 2018-05-25 | 江西石华精细化工科技协同创新有限公司 | 一种绝氧气体的脱水除氧方法 |
| CN108069407B (zh) * | 2017-12-28 | 2020-11-17 | 江西石华精细化工科技协同创新有限公司 | 一种绝氧气体的脱水除氧方法 |
| WO2019187810A1 (ja) * | 2018-03-27 | 2019-10-03 | エア・ウォーター株式会社 | 精製ガスの製造装置および精製ガスの製造方法 |
| JP2019171231A (ja) * | 2018-03-27 | 2019-10-10 | エア・ウォーター株式会社 | 精製ガスの製造装置および精製ガスの製造方法 |
| WO2019187811A1 (ja) * | 2018-03-29 | 2019-10-03 | エア・ウォーター株式会社 | 精製ガスの製造装置および精製ガスの製造方法 |
| JP2019172532A (ja) * | 2018-03-29 | 2019-10-10 | エア・ウォーター株式会社 | 精製ガスの製造装置および精製ガスの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0379288B2 (enrdf_load_stackoverflow) | 1991-12-18 |
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