JPS58120860A - シ−ト状物質の低温プラズマ処理装置 - Google Patents

シ−ト状物質の低温プラズマ処理装置

Info

Publication number
JPS58120860A
JPS58120860A JP81682A JP81682A JPS58120860A JP S58120860 A JPS58120860 A JP S58120860A JP 81682 A JP81682 A JP 81682A JP 81682 A JP81682 A JP 81682A JP S58120860 A JPS58120860 A JP S58120860A
Authority
JP
Japan
Prior art keywords
sheet
chamber
temperature plasma
low
plasma processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP81682A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0121260B2 (enExample
Inventor
山東　美一
後藤　徳樹
逸雄 田中
石徹白　博司
南方　松夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sando Iron Works Co Ltd
Unitika Ltd
Original Assignee
Sando Iron Works Co Ltd
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sando Iron Works Co Ltd, Unitika Ltd filed Critical Sando Iron Works Co Ltd
Priority to JP81682A priority Critical patent/JPS58120860A/ja
Priority to DE19833300097 priority patent/DE3300097A1/de
Publication of JPS58120860A publication Critical patent/JPS58120860A/ja
Publication of JPH0121260B2 publication Critical patent/JPH0121260B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00—Physical treatment of fibres, threads, yarns, fabrics or fibrous goods made from such materials, e.g. by ultrasonic waves, corona discharge, irradiation, electric currents or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/02—Sonic or ultrasonic waves; Corona discharge
    • D06M10/025—Corona discharge or low temperature plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Textile Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP81682A 1982-01-06 1982-01-06 シ−ト状物質の低温プラズマ処理装置 Granted JPS58120860A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP81682A JPS58120860A (ja) 1982-01-06 1982-01-06 シ−ト状物質の低温プラズマ処理装置
DE19833300097 DE3300097A1 (de) 1982-01-06 1983-01-04 Anlage zum behandeln von platten- bzw. bahnaehnlichen stoffen mit einem niedertemperatur-plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP81682A JPS58120860A (ja) 1982-01-06 1982-01-06 シ−ト状物質の低温プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS58120860A true JPS58120860A (ja) 1983-07-18
JPH0121260B2 JPH0121260B2 (enExample) 1989-04-20

Family

ID=11484193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP81682A Granted JPS58120860A (ja) 1982-01-06 1982-01-06 シ−ト状物質の低温プラズマ処理装置

Country Status (2)

Country Link
JP (1) JPS58120860A (enExample)
DE (1) DE3300097A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60228673A (ja) * 1984-04-25 1985-11-13 Hitachi Ltd プラズマ処理装置用制御装置
JP2010228180A (ja) * 2009-03-26 2010-10-14 Ube Ind Ltd 巻き替えポリイミドフィルムロール及びその製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3312307A1 (de) * 1983-04-06 1984-10-11 Sando Iron Works Co., Ltd., Wakayama, Wakayama Vorrichtung zum behandeln eines textilguts
DE4313284A1 (de) * 1993-04-23 1994-10-27 Leybold Ag Spaltschleuse für das Ein- oder Ausbringen von Substraten von der einen in eine benachbarte Behandlungskammer
DE19540053A1 (de) * 1995-10-27 1997-04-30 Leybold Ag Vorrichtung zum Beschichten eines Substrats, insbesondere mit elektrisch nichtleitenden Schichten
ES2279517T3 (es) 1995-10-27 2007-08-16 APPLIED MATERIALS GMBH & CO. KG Dispositivo para recubrir un sustrato.
DE19540255A1 (de) * 1995-10-28 1997-04-30 Leybold Ag Vorrichtung zum Beschichten eines Substrats
FR2975308B1 (fr) * 2011-05-16 2015-06-26 Valeo Systemes Dessuyage Dispositif d'etancheite pour le traitement sous vide d'une surface d'un objet

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5583735U (enExample) * 1978-12-06 1980-06-09
JPS5590533A (en) * 1978-12-28 1980-07-09 Toray Ind Inc Low temperature plasma treatment of substrate

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53121469A (en) * 1977-03-31 1978-10-23 Toshiba Corp Gas etching unit
JPS5718737A (en) * 1980-06-21 1982-01-30 Shin Etsu Chem Co Ltd Apparatus for continuous plasma treatment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5583735U (enExample) * 1978-12-06 1980-06-09
JPS5590533A (en) * 1978-12-28 1980-07-09 Toray Ind Inc Low temperature plasma treatment of substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60228673A (ja) * 1984-04-25 1985-11-13 Hitachi Ltd プラズマ処理装置用制御装置
JP2010228180A (ja) * 2009-03-26 2010-10-14 Ube Ind Ltd 巻き替えポリイミドフィルムロール及びその製造方法

Also Published As

Publication number Publication date
JPH0121260B2 (enExample) 1989-04-20
DE3300097A1 (de) 1983-08-04

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