JPS58120860A - Low temperature plasma treating apparatus of sheet-like substance - Google Patents

Low temperature plasma treating apparatus of sheet-like substance

Info

Publication number
JPS58120860A
JPS58120860A JP81682A JP81682A JPS58120860A JP S58120860 A JPS58120860 A JP S58120860A JP 81682 A JP81682 A JP 81682A JP 81682 A JP81682 A JP 81682A JP S58120860 A JPS58120860 A JP S58120860A
Authority
JP
Japan
Prior art keywords
sheet
chamber
temperature plasma
low
plasma processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP81682A
Other languages
Japanese (ja)
Other versions
JPH0121260B2 (en
Inventor
山東　美一
後藤　徳樹
逸雄 田中
石徹白　博司
南方　松夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sando Iron Works Co Ltd
Unitika Ltd
Original Assignee
Sando Iron Works Co Ltd
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sando Iron Works Co Ltd, Unitika Ltd filed Critical Sando Iron Works Co Ltd
Priority to JP81682A priority Critical patent/JPS58120860A/en
Priority to DE19833300097 priority patent/DE3300097A1/en
Publication of JPS58120860A publication Critical patent/JPS58120860A/en
Publication of JPH0121260B2 publication Critical patent/JPH0121260B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/02—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements ultrasonic or sonic; Corona discharge
    • D06M10/025—Corona discharge or low temperature plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Textile Engineering (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は、編物、織物、不織布、樹脂製フィルム等金含
むシート状物質を低温プラズマ処理するための処理装置
に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a processing apparatus for subjecting sheet materials containing gold, such as knitted fabrics, woven fabrics, nonwoven fabrics, and resin films, to low-temperature plasma treatment.

従来工業的に織物、編物、不織布など布帛の精練処理、
仕上加工、あるいはフィルムに新しい特性を付与するた
めのコーテング加工は大部分が水系での処理が行われて
お）、ごく一部に有機溶剤による処理も行なわれている
。Conventional industrial scouring treatment of fabrics such as woven, knitted and non-woven fabrics,
Finishing processing or coating processing to impart new properties to the film is mostly carried out in aqueous systems; a small portion is also treated with organic solvents.

しかるに従来から行われているこれらの方法は水、有機
溶剤あるいは精練剤を使用し、かつ処理浴の昇温、処理
物の洗滌次いで乾燥など多量の水、エネルギー薬剤を使
用していた。また処理に伴う廃水も多量に発生し、公害
問題、廃水の処理によるコストアップなど、経済性に欠
けるものであった。However, these conventional methods use water, organic solvents, or scouring agents, and also use large amounts of water and energy agents to raise the temperature of the treatment bath, wash the material to be treated, and then dry it. Furthermore, a large amount of wastewater is generated due to the treatment, resulting in pollution problems and increased costs due to wastewater treatment, making it uneconomical.

このようなことから、最近では布帛等の繊維製品を低温
プラズマ処理して例えば布帛の糊抜、精練効果を得るこ
と、あるいは染色布帛樹脂フィルマあるいは樹脂シート
の表面に低温プラズマで処理して該染色布帛樹脂フィル
ム又は樹脂シートの表面改質処理を行なうこと等が提案
されているが、即に提案されているバッチ式の低温プラ
ズマ処理装置においては、長尺のシート状物をパッチ内
に設置した支軸又はロールに巻きとシ、これを他方の支
軸又はロールに巻きとって移行せしめる間にシート物に
低温プラズマ処理を施しているものであるが、運転中は
、・マツチ内は常に低温プラズマ雰囲気に保持され、し
かも該雰囲気中にロール状に巻かれているシート物が位
置されているために、ロール状に巻かれているシート物
の両端面部は常に低温プラズマ雰囲気にさらされている
のに対し、ロール状となって重ね合されている部分は、
他方のロールにより引き出されるまでは低温プラズマの
影響を受けないので長尺シート物の両側端縁部と、その
シート物の幅方向中央部とでは、低温プラズマによる処
理量が異り、処理むらを生じる問題点があった。For this reason, in recent years, textile products such as fabrics have been treated with low-temperature plasma to obtain, for example, desizing and scouring effects, or the surface of dyed fabric resin films or resin sheets has been treated with low-temperature plasma to achieve the dyeing effect. It has been proposed to perform surface modification treatment on fabric resin films or resin sheets, but in the batch-type low-temperature plasma treatment equipment that is currently being proposed, a long sheet-like material is installed inside the patch. The sheet material is subjected to low-temperature plasma treatment while it is being wound around a spindle or roll and transferred to the other spindle or roll.During operation, the inside of the mat is always kept at a low temperature. Since the sheet is kept in a plasma atmosphere and the rolled sheet is located in the atmosphere, both end surfaces of the rolled sheet are always exposed to the low-temperature plasma atmosphere. On the other hand, the part that is rolled and overlapped is
Since it is not affected by the low-temperature plasma until it is pulled out by the other roll, the amount of treatment by the low-temperature plasma is different between the edges of both sides of the long sheet and the center in the width direction of the sheet, which can prevent uneven processing. There were problems that arose.

本発明はかかる問題点を解消するためになされたもので
、パッチ式の低温プラズマ処理装置において、シート物
の全面に亘って均一なる低温プラズマ処理ができる処理
装置を提供することを目的とするものである。The present invention has been made to solve such problems, and an object of the present invention is to provide a patch-type low-temperature plasma processing apparatus that can perform uniform low-temperature plasma treatment over the entire surface of a sheet object. It is.

以下に本発明を図面に示す実施例に基いて詳細に説明す
る。The present invention will be explained in detail below based on embodiments shown in the drawings.

１は反応器であって、この反応器１には処理すべきシー
ト物（布帛、樹脂シート等）を出入れするための開口部
２．３が設けられておシ、更にこれらの開口部２，３は
蓋４によって密閉されるようになっている。この反応器
１の内部は、第１のシート巻取室５、第１の減圧室６、
低温プラズマ処理室７、第２の減圧室８、第２のシート
巻取室９の順で区分形成されておシ、各室を区分してい
る隔壁１０には、シート物１１を通過することはできる
が、隣設された室間の通気性を妨げることができるシー
ルロール１２が設けられている。このシールロール１２
の気密性は、左程高いもので々くてよく、若干の通気性
は許されるものであってもよい。またシールロール１２
の代シにリッグシールを使ってもよい。そして第１のシ
ート巻取室５及び第２のシート巻取室９内にはシート巻
取軸１３が架設され、第１の減圧室６及び第２の減圧室
８内にはシート物をタイミング移行せしめるためのガイ
ドロール群１４が配設され、更に低温プラズマ処理室７
内においても同様のがイドロール群１５が配設されてい
る。１６は第１の減圧室６及び第２の減圧室８に接続さ
れているパキーームパイプであってこのバキュームパイ
グ１６は図示しない真空ポンプに接続されている。１７
は低温プラズマ処理室７に接続されているガス供給口で
あって、このガス供給口１７は反応器１外で発生せしめ
た低温プラズマにより活性化されたガスをこのガス供給
口１７を介して低温プラズマ処理室７内へ供給するよう
に本実施例では構成しているが、他の実施例として図示
しないが低温プラズマ処理室７内に、シート物の移行を
妨げない位置に２極の電極体を配置して、その電極体に
高周波（長波長から短波長まで使用できるが望ましくは
１　ｋＨｚ〜３００　ＭＨｚの範囲）をかけ、更にガス
供給口１７よシ該処理室７内に気体を供給することによ
り該低温プラズマ処理室７内に低温プラズマが発生てれ
るようにしてもよい。Reference numeral 1 denotes a reactor, and this reactor 1 is provided with openings 2.3 through which sheet materials to be treated (fabrics, resin sheets, etc.) are taken in and out, and these openings 2. , 3 are sealed by a lid 4. The inside of this reactor 1 includes a first sheet winding chamber 5, a first decompression chamber 6,
A low-temperature plasma processing chamber 7, a second decompression chamber 8, and a second sheet winding chamber 9 are formed in this order. However, a sealing roll 12 is provided that can impede ventilation between adjacent chambers. This seal roll 12
The airtightness may be as high as possible, and some degree of air permeability may be allowed. Also, the seal roll 12
You may use a rig seal instead. A sheet winding shaft 13 is installed in the first sheet winding chamber 5 and the second sheet winding chamber 9, and a sheet material is transported in the first decompression chamber 6 and the second decompression chamber 8 at a timing. A guide roll group 14 is provided for the transition, and a low temperature plasma processing chamber 7 is also provided.
A similar idler group 15 is also provided inside. Reference numeral 16 denotes a paquim pipe connected to the first decompression chamber 6 and the second decompression chamber 8, and the vacuum pipe 16 is connected to a vacuum pump (not shown). 17
is a gas supply port connected to the low temperature plasma processing chamber 7, and this gas supply port 17 supplies the gas activated by the low temperature plasma generated outside the reactor 1 to the low temperature through the gas supply port 17. In this embodiment, the plasma is supplied into the plasma processing chamber 7, but as another embodiment (not shown), a bipolar electrode body is installed in the low temperature plasma processing chamber 7 at a position that does not interfere with the transfer of the sheet material. is placed, high frequency (can be used from long wavelength to short wavelength, but preferably in the range of 1 kHz to 300 MHz) is applied to the electrode body, and gas is further supplied into the processing chamber 7 through the gas supply port 17. In this way, low-temperature plasma may be generated within the low-temperature plasma processing chamber 7.

以上が本実施例の構成であるが次にその作用について述
べる。The configuration of this embodiment has been described above, and its operation will now be described.

（５） 先ず第１のシート巻取室５内に長尺シート物１１を巻き
取ったシート巻取軸１３をセットし、その長尺シート物
１１の先端を各室を通して第２のシート巻取室９内に架
設したシート巻取軸１３に巻きつけて、そのシート巻取
軸１３にシート物を巻替ることができるように準備し、
更に蓋４を閉めて反応器１を密閉する。次に真空ポンプ
を駆動して・９キユームパイプ１６を負圧となし低温プ
ラズマ処理室７内の真空度が０．５　Ｔｏｒｒ以下にな
った時点でガス供給口１７より低温プラズマ処理室７内
に低温プラズマを供給するか、あるいはガス供給口１７
よシ酸素又は酸素を含む混合ガスあるいはその他のがス
を室７内に供給して、この低温プラズマ処理室７内の真
空度が０．５〜１０　Ｔｏｒｒとなるように調整した上
で高周波電源よシ高周波例えば１３．５６　ＭＨｚを電
極板に給電して、低温プラズマ処理室７内を低温プラズ
マの雰囲気とさせる。(5) First, the sheet winding shaft 13 on which the long sheet object 11 is wound is set in the first sheet winding chamber 5, and the tip of the long sheet object 11 is passed through each chamber to the second sheet winding chamber. Prepare the sheet material so that it can be wound around a sheet winding shaft 13 installed in the chamber 9 and rewinded on the sheet winding shaft 13,
Furthermore, the lid 4 is closed to seal the reactor 1. Next, the vacuum pump is driven to create a negative pressure in the vacuum pipe 16, and when the degree of vacuum in the low-temperature plasma processing chamber 7 becomes 0.5 Torr or less, a low temperature is supplied into the low-temperature plasma processing chamber 7 through the gas supply port 17. Supply plasma or gas supply port 17
Oxygen, a mixed gas containing oxygen, or other gas is supplied into the chamber 7, and the degree of vacuum in the low-temperature plasma processing chamber 7 is adjusted to 0.5 to 10 Torr, and then a high frequency power source is applied. A high frequency power, for example, 13.56 MHz, is supplied to the electrode plate to create a low temperature plasma atmosphere in the low temperature plasma processing chamber 7.

次いで第２のシート巻取室９内の巻取シ軸１３を駆動し
てシート物１１を減圧室及び低温プラズマ処理室を移行
させる。かくしてシート物１１を低（６） 温プラズマ処理室７内の低温プラズマ雰囲気中に移行せ
しめることにより、該シート物１１が布帛である場合は
この布帛の繊維自体に含有されている夾雑物及び繊維に
付与されている糊剤の一部は、分解し又一部は親水化さ
れて、水に容易に溶解する様になる。またシート物が染
色布帛、フィルム樹脂シートである場合は該シートの表
面改質加工ができる。Next, the winding shaft 13 in the second sheet winding chamber 9 is driven to move the sheet material 11 between the decompression chamber and the low-temperature plasma processing chamber. In this way, by transferring the sheet object 11 into the low temperature plasma atmosphere in the low (6) temperature plasma processing chamber 7, when the sheet object 11 is a fabric, the contaminants and fibers contained in the fibers of the fabric itself are removed. A part of the glue applied to the film decomposes and a part becomes hydrophilic and becomes easily soluble in water. Furthermore, when the sheet material is a dyed fabric or a film resin sheet, the surface of the sheet can be modified.

ところが本発明においては、密閉することができる反応
器内を、第１のシート巻取室、第１の減圧室、低温グラ
ズマ処理室、第２の減圧室、第２のシート巻取室の順で
区分形成し、更に各室相互間は、シール機構を介してシ
ート物の通過可能に連通せしめると共に、第１の減圧室
及び第２の減圧室には真空ポンプに通じるバキュームパ
イｆを接続せしめ、更に、低温プラズマ処理室には低温
プラズマによシ活性化されたガスの供給口又はガス供給
口と電極体を設け、第１のシート巻取室及び第２のシー
ト巻取室にはシート巻取軸を配置せしめたことを特徴と
するシート状物質の低温プラズマ処理装置であるから、
シート巻取室５及び９が低温プラズマ処理室７と区分さ
れて、それらのシート巻取室内には低温プラズマにより
活性化されたガスがｆｙｔｔ人されないように形成され
ているから、そのシート巻取室内にあるシート物に低温
プラズマが作用することがない。従って巻取軸１３に巻
かれているシート物１１へ両端縁部に過度な低温ノラズ
マ処理がなされることがなく、従ってシート物１１の全
面に亘って均一な低温ノラズマ処理ができる効果がある
。更に本発明では低温ノラズマ処理室７とシート巻取室
５及び９との間に減圧室６及び８が形成されていること
から、この減圧室において、低温プラズマ処理室７内に
供給される直前の該シート物に含有される挿抜成分（水
分）等が除去されるので、低温プラズマ処理室７内の真
空度を良好に保つことができる。更にシート巻取室と低
温プラズマ処理室との間に減圧室が設けられていること
からそのシート巻取室内へ、低温プラズマ処理室内の低
温プラズマが全く流入されることがなく、前述の均一処
理が効果的になされる特長もある。However, in the present invention, the interior of the reactor which can be sealed is arranged in the order of the first sheet winding chamber, the first decompression chamber, the low temperature glazma processing chamber, the second decompression chamber, and the second sheet winding chamber. Further, each chamber is communicated with each other via a sealing mechanism so that a sheet object can pass therethrough, and a vacuum pipe f leading to a vacuum pump is connected to the first reduced pressure chamber and the second reduced pressure chamber. Further, the low temperature plasma processing chamber is provided with a gas supply port or a gas supply port and an electrode body activated by low temperature plasma, and the first sheet winding chamber and the second sheet winding chamber are provided with a gas supply port or a gas supply port and an electrode body. Since it is a low-temperature plasma processing apparatus for sheet-like materials characterized by having a winding shaft arranged,
The sheet winding chambers 5 and 9 are separated from the low-temperature plasma processing chamber 7, and the sheet winding chambers are formed to prevent gas activated by the low-temperature plasma from entering the sheet winding chambers. Low-temperature plasma does not act on sheet objects in the room. Therefore, the sheet material 11 wound around the take-up shaft 13 is not subjected to excessive low-temperature nolasma treatment on both edges, and therefore the low-temperature nolasma treatment can be applied uniformly over the entire surface of the sheet material 11. Furthermore, in the present invention, since the decompression chambers 6 and 8 are formed between the low temperature plasma processing chamber 7 and the sheet winding chambers 5 and 9, in these decompression chambers, immediately before being supplied into the low temperature plasma processing chamber 7, Since the insertion/extraction component (moisture) contained in the sheet material is removed, the degree of vacuum in the low temperature plasma processing chamber 7 can be maintained at a good level. Furthermore, since a decompression chamber is provided between the sheet winding chamber and the low-temperature plasma processing chamber, the low-temperature plasma in the low-temperature plasma processing chamber does not flow into the sheet winding chamber at all, resulting in the above-mentioned uniform processing. It also has the advantage of being effective.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明よりなる装置の実施例を示した断面説明図
である。 １・・反応器　　　　　２，３・・・開［１部４　・蓋
　　　　　　　　　５・・第１のシート巻取室６・・・
第１の減圧室　　７　低温ノラズマ処理室８・・第２の
減圧室　　９　・第２のシート巻取室１０・・隔壁　　
　　　　１１　・シート物１２・・・シールロール　１
３・・シー）　巻取軸１４　　ガイドロール群　１５　
・・Ｉイドロール群１６　バキュームパイア′１′１７
・・ガス供給口（９） ４４ｊ− −發The drawing is an explanatory cross-sectional view showing an embodiment of the device according to the present invention. 1... Reactor 2, 3... Open [1 part 4 - Lid 5... First sheet winding chamber 6...
First decompression chamber 7 Low temperature nolasma processing chamber 8...Second decompression chamber 9 - Second sheet winding chamber 10...Partition wall
11 ・Sheet object 12... Seal roll 1
3... Sea) Winding shaft 14 Guide roll group 15
・・Iidroll group 16 Vacuum Pier'1'17
・・Gas supply port (9) 44j--

Claims (1)

【特許請求の範囲】[Claims] 密閉することができる反応器内を、第１のシート巻取室
、第１の減圧室、低温プラズマ処理室、第２の減圧室、
第２の７一ト巻取室の順で区分形成し、更に各室相互間
は、シール機構を介してシート物の通過可能に連通せし
めると共に、第１の減圧室及び第２の減圧室には真空Ｉ
ンプに通じるパキーームｉ４イグを接続せしめ、更に、
低温プラズマ処理室には低温プラズマによシ活性化され
たガスの供給口又はガス供給口と電極体を設け、第１の
シート巻取室及び第２のシート巻取室にはシート巻取軸
を配置せしめたことを特徴とするシート状物質の低温プ
ラズマ処理装置。The inside of the reactor which can be sealed is a first sheet winding chamber, a first reduced pressure chamber, a low temperature plasma processing chamber, a second reduced pressure chamber,
The second winding chamber is divided into seven winding chambers, and each chamber is connected to each other via a sealing mechanism so that a sheet material can pass therethrough. is vacuum I
Connect the Paquim i4 Ig that leads to the pump, and further,
The low-temperature plasma processing chamber is provided with a supply port for gas activated by low-temperature plasma or a gas supply port and an electrode body, and a sheet winding shaft is provided in the first sheet winding chamber and the second sheet winding chamber. 1. A low-temperature plasma processing apparatus for sheet-like materials, characterized in that:
JP81682A 1982-01-06 1982-01-06 Low temperature plasma treating apparatus of sheet-like substance Granted JPS58120860A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP81682A JPS58120860A (en) 1982-01-06 1982-01-06 Low temperature plasma treating apparatus of sheet-like substance
DE19833300097 DE3300097A1 (en) 1982-01-06 1983-01-04 Installation for treating materials which are like plates or webs with a low-temperature plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP81682A JPS58120860A (en) 1982-01-06 1982-01-06 Low temperature plasma treating apparatus of sheet-like substance

Publications (2)

Publication Number Publication Date
JPS58120860A true JPS58120860A (en) 1983-07-18
JPH0121260B2 JPH0121260B2 (en) 1989-04-20

Family

ID=11484193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP81682A Granted JPS58120860A (en) 1982-01-06 1982-01-06 Low temperature plasma treating apparatus of sheet-like substance

Country Status (2)

Country Link
JP (1) JPS58120860A (en)
DE (1) DE3300097A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60228673A (en) * 1984-04-25 1985-11-13 Hitachi Ltd Control device for plasma treating device
JP2010228180A (en) * 2009-03-26 2010-10-14 Ube Ind Ltd Rewound polyimide film and method of manufacturing the same

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3312307A1 (en) * 1983-04-06 1984-10-11 Sando Iron Works Co., Ltd., Wakayama, Wakayama Device for the treatment of a textile material
DE4313284A1 (en) * 1993-04-23 1994-10-27 Leybold Ag Slot lock for introducing or discharging substrates from one treatment chamber into an adjacent one
DE19540255A1 (en) * 1995-10-28 1997-04-30 Leybold Ag Apparatus for film coating a substrate
EP0783174B1 (en) 1995-10-27 2006-12-13 Applied Materials GmbH & Co. KG Apparatus for coating a substrate
DE19540053A1 (en) * 1995-10-27 1997-04-30 Leybold Ag Substrate coating device for application of non-conductive layers using magnetron sputtering
FR2975308B1 (en) * 2011-05-16 2015-06-26 Valeo Systemes Dessuyage SEALING DEVICE FOR THE VACUUM TREATMENT OF A SURFACE OF AN OBJECT

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5583735U (en) * 1978-12-06 1980-06-09
JPS5590533A (en) * 1978-12-28 1980-07-09 Toray Ind Inc Low temperature plasma treatment of substrate

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53121469A (en) * 1977-03-31 1978-10-23 Toshiba Corp Gas etching unit
JPS5718737A (en) * 1980-06-21 1982-01-30 Shin Etsu Chem Co Ltd Apparatus for continuous plasma treatment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5583735U (en) * 1978-12-06 1980-06-09
JPS5590533A (en) * 1978-12-28 1980-07-09 Toray Ind Inc Low temperature plasma treatment of substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60228673A (en) * 1984-04-25 1985-11-13 Hitachi Ltd Control device for plasma treating device
JPH0413022B2 (en) * 1984-04-25 1992-03-06 Hitachi Seisakusho Kk
JP2010228180A (en) * 2009-03-26 2010-10-14 Ube Ind Ltd Rewound polyimide film and method of manufacturing the same

Also Published As

Publication number Publication date
JPH0121260B2 (en) 1989-04-20
DE3300097A1 (en) 1983-08-04

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