JPS58120875A - Low temperature continuous plasma treating method and apparatus of fabric - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a processing method and apparatus for continuously subjecting fabrics such as knitted fabrics, woven fabrics, and nonwoven fabrics to low-temperature plasma treatment.

2. Conventional means of processing (pre-treatment) such as desizing and scouring of industrially produced knitted fabrics, woven fabrics, etc. require a large amount of heat resources, water quality sources or specific It is well known to use moist heat treatment using all the chemicals. To describe an example of this well-known pretreatment in detail, for example, a fabric to be treated is impregnated with a treatment liquid in which a penetrant is mixed with a caustic liquid, and then steamed in a high-pressure reaction chamber. Teaming is continued for a predetermined period of time to complete the entire reaction with the chemical solution, and then washing with water is repeated as a means to completely remove the chemical solution or foreign matter adhering to the fabric to be treated. The water-washed fabric to be treated was passed through a dryer and dried to complete the desired pretreatment. However, with such pre-treatment means, a chemical solution for treatment is required, and in order to cause this chemical solution to react with the fabric, many liters of steam are required. In order to remove +1 kimono such as residual liquid or impurities contained in the reaction-treated fabric, a large number of water washers and a large amount of water source to be supplied to each of these washers are required, and furthermore, water washing is required. Pretreatment of fabrics requires a large amount of water resources, as equipment is required to dispose of the wastewater.
The current situation is that heat energy is wasted. Furthermore, since the waste liquid discharged from washing machines inevitably contains chemicals, problems such as waste liquid pollution arise, and processing of the waste liquid also requires significant equipment and personnel costs. However, it lacked economic efficiency, especially for the textile processing industry. For this reason, it has recently been proposed to treat textile products such as fabrics with low-temperature plasma to obtain, for example, desizing and scouring effects. It is required to remove as much as possible the elastic material contained in the fabric immediately before it is supplied to the plasma processing chamber. This is because when a fabric containing an elastic material is supplied into a reactor where a low-temperature plasma atmosphere is maintained, the elastic action of the elastic material lowers the degree of vacuum in the reactor and prevents the generation of low-temperature plasma. In addition, there were other problems such as the elastic material itself turning into low-temperature plasma and causing side reactions.

The present invention was invented to solve this problem, and is a continuous low-temperature plasma processing apparatus in which a compartment is provided in a reactor, which is the low-temperature plasma processing apparatus, to form at least a plurality of processing chambers. , in the reactor,
To provide a treatment method and apparatus capable of effectively performing low-temperature plasma treatment on fabric by forming a primary treatment chamber for removing an elastic substance and a secondary treatment chamber for subsequent low-temperature plasma treatment. It is for money purpose.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The apparatus according to the present invention will be explained in detail below based on embodiments shown in the drawings.

(2) is a reactor, and the reactor 1 has an inlet 3 for continuously introducing the fabric 2 to be subjected to low-temperature plasma treatment into the reactor 1; A discharge port 4 is provided for the discharge. Also, this introduction port 3
Although it is possible to continuously insert the fabric into each of the outlet port 4 and the outlet port 4, the inside of the reactor 1 is kept under vacuum (0,1~]OTor
Seal mechanisms 5 and 6 are provided which can maintain the pressure at a temperature of 0.05 to 2 Torr, preferably 0.5 to 2 Torr, and these seal mechanisms 5 and 6 utilize known seal mechanisms developed by the present inventors. By this, the inlet and outlet of the reactor 1 can be sealed. Furthermore, inside this reactor 1, a first compartment 9, a second compartment 1O1, and a third compartment 11 are separated along the transport direction of the fabric 2 by a partition wall 7.
A seal roll 2 is provided on the partition wall 7 separating each chamber, which allows the fabric 2 to pass through but prevents air permeability between adjacent chambers. ing. Note that a ridge seal may be used for the seal roll 9. The first compartment 9 is provided with contact drying means for fabrics using thermal sill rolls 13, and the fourth compartment 10 is equipped with a low-temperature nolasma treatment structure. This low-temperature plasma treatment mechanism consists of a pair of electrode plates 14 that are vertically spaced apart as a 2-ft boundary between the moving fabrics.
and 15, one electrode plate 14 is supplied with high frequency from an oscillator (not shown) installed outside the reactor l, and the hydraulic electrode plate 15 is grounded. . These electrode plates 14 and 15 housed in the housing are made of, for example, a wire mesh or a porous metal plate, and are required to have uniform gas dispersion and distribution over the entire surface of the electrode plates. This is because low-temperature plasma can be generated substantially uniformly over the entire surface of the electrode plate, and gas excited by high frequency waves can be caused to float approximately uniformly near the entire surface of the metal plate. ] 6 is an intake duct for blowing out gas toward the entire surface of the electrode plate 14, and I7 is an intake duct installed opposite to the gas nozzle 16 with both electrode plates sandwiched between them. is connected to a vacuum chamber (not shown).Although the first compartment 9 is equipped with a drying means using a heat cylinder, for example, heating drying means using microwaves, or heating drying means using infrared rays can be used. It may be a means.

18 is the third compartment] The fabric provided in the interior of 1 is an idroll, and 19 and 20 are the cloths provided in the first compartment 9 and the third compartment 11.

The above is the configuration of this embodiment, which is the force r, and its function will be described below. First, the vacuum pumper (not shown) (6) is driven to provide a negative force to each vacuum/mother eve 19 and 20 and the intake duct) 17. The pressure becomes 17, and the inside of the first compartment 9 and the third compartment 11 becomes a decompression chamber maintained at 10 to Q. When the pressure is reduced to 5 Torr or less, the first
The drying means installed in the compartment 9 is operated, and gas is supplied from the gas nozzle 16 into the second compartment 10 to maintain a degree of vacuum in the second compartment 10 from 01 to 10 Torr.
More desirably, a high frequency wave in the range of 11 cHz to 300 MHz is applied to the electrode plate 14, for example, from a long wavelength to a short wavelength. This reduced pressure condition is 01 to 10 Torr K.
The reason for this limitation is that plasma generation, which will be described later, is unstable when the degree of reduced pressure is IO'I'orr or higher;
Maintaining the degree of vacuum below Torr is expensive;
Furthermore, the low-temperature plasma gas concentration also decreases, and the processing effect also decreases.

That is, when the gas from the gas nozzle 16 is passed between the pair of electrode plates 4 and 15 to which a high frequency is applied, low temperature plasma is generated, and the inside of the second compartment 10 becomes a low temperature plasma atmosphere. When the fabric 2 is then transferred through the reactor 1, it is first subjected to a drying treatment in a first compartment, and
Elastic substances contained in the fabric can be removed. The fabric from which the elastic material has been removed in the first compartment is directly fed into the second compartment, passes through a low temperature plasma atmosphere, is subjected to low temperature plasma treatment, and is then transferred to the third compartment. 11 and is led out of the reactor 1.

Therefore, in the present invention, a vacuum chamber through which the fabric can pass continuously is provided before and after a low-temperature plasma treatment chamber through which the fabric can pass continuously, and a vacuum chamber through which the fabric can pass continuously is provided. Since a heating means is provided to remove all removable substances contained in the fabric to be introduced into the room, the fabric immediately before being supplied into the low-temperature plasma atmosphere of the second compartment is The elastic material contained in the fabric is effectively removed by the heating means installed in the reduced pressure chamber, and the fabric is supplied into the low-temperature plasma atmosphere, making it possible to maintain this low-temperature plasma atmosphere well. Moreover, there is no problem of poor reaction due to elastic materials.
High-quality low-temperature plasma processing is achieved.

In addition, by providing a reduced pressure chamber (low pressure chamber) adjacent to the front and back of the second compartment that maintains a low-temperature plasma atmosphere, the sealing performance (vacuum efficiency) between this second compartment and the outside is improved.
This also has the effect of improving low-temperature plasma generation. Furthermore, in the present invention, the fabric heated and dried in a reduced pressure chamber is introduced into a low-temperature plasma atmosphere without being exposed to normal pressure, so moisture in the outside air is not introduced into the plasma atmosphere. This has the effect of maintaining a good degree of vacuum inside.

[Brief explanation of the drawing]

The drawing is an explanatory cross-sectional view showing an embodiment of the processing apparatus according to the present invention. DESCRIPTION OF SYMBOLS 1... Reactor, 2... Fabric 3... Inlet, 4... Outlet, 5.6... Seal mechanism, 7... Partition wall, 9... First compartment ,
10... Second compartment, 11... Third compartment, 12... Seal roll, 13... Heat cylinder roll, 14.15... Electrode plate, 16... Gas nozzle,
17...Intake duct, 18...Guide roll, 19.20...Vacuum pino.

Claims (1)

[Claims] 1. A method for continuous low-temperature plasma treatment of fabrics, which comprises heating and drying the fabric to be treated with hot plasma in a reduced pressure chamber, and then passing the fabric through a low-temperature plasma 4 atmosphere without exposing it to normal pressure 1.2 , a vacuum chamber through which the fabric can pass continuously should be placed before and after the low-temperature plasma processing chamber through which the fabric can pass continuously, and the vacuum chamber in front of the vacuum chamber should be introduced into the low-temperature plasma processing chamber. A low-temperature continuous plasma treatment apparatus for fabric, characterized in that it is provided with heating means for removing volatile substances contained in the fabric.