JPH0321213B2 - - Google Patents

Info

Publication number
JPH0321213B2
JPH0321213B2 JP57093710A JP9371082A JPH0321213B2 JP H0321213 B2 JPH0321213 B2 JP H0321213B2 JP 57093710 A JP57093710 A JP 57093710A JP 9371082 A JP9371082 A JP 9371082A JP H0321213 B2 JPH0321213 B2 JP H0321213B2
Authority
JP
Japan
Prior art keywords
temperature
low
temperature plasma
reactor
electrode plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57093710A
Other languages
Japanese (ja)
Other versions
JPS58210844A (en
Inventor
Yoshikazu Santo
Tokuki Goto
Itsuo Tanaka
Hiroshi Ishidoshiro
Matsuo Namikata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SANDO TETSUKOSHO KK
YUNICHIKA KK
Original Assignee
SANDO TETSUKOSHO KK
YUNICHIKA KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SANDO TETSUKOSHO KK, YUNICHIKA KK filed Critical SANDO TETSUKOSHO KK
Priority to JP57093710A priority Critical patent/JPS58210844A/en
Publication of JPS58210844A publication Critical patent/JPS58210844A/en
Publication of JPH0321213B2 publication Critical patent/JPH0321213B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B29C2059/147Low pressure plasma; Glow discharge plasma
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2313/00Use of textile products or fabrics as reinforcement

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Plasma Technology (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Description

【発明の詳細な説明】 本発明は、編物、織物、不織布等の繊維製品あ
るいはフイルムを連続的に低温プラズマ処理する
ための低温プラズマ処理装置における低温プラズ
マ雰囲気中の被処理物の温度を制御することがで
きるようにした方法及び装置に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention controls the temperature of a processed object in a low-temperature plasma atmosphere in a low-temperature plasma processing apparatus for continuously low-temperature plasma treating textile products such as knitted fabrics, woven fabrics, non-woven fabrics, or films. The present invention relates to a method and apparatus that enable this.

従来、工業的に織物、織物、不織布などの布帛
あるいは紐、カーペツトなどの繊維製品あるいは
フイルムを連続的に処理する例えば染色前の工程
では、繊維に付着している撥水性夾雑物の除去、
あるいは親水化し布帛に染料液が容易に浸透せし
めるための精練工程および染色後柔軟、撥水、静
電防止、防汚、吸水などの特性を付与する仕上工
程があるが、いずれの工程も水系で処理を行つて
いた。
Conventionally, in the industrial process of continuously processing fabrics such as woven fabrics, woven fabrics, non-woven fabrics, textile products such as strings and carpets, or films such as strings and carpets, for example, in the process before dyeing, water repellent impurities attached to the fibers are removed,
Alternatively, there is a scouring process that makes the fabric hydrophilic so that the dye solution can easily penetrate into the fabric, and a finishing process that imparts properties such as flexibility, water repellency, antistatic, stain resistance, and water absorption after dyeing, but both processes are water-based. It was being processed.

たとえば精練工程では、木綿を含む布帛の場合
カセイソーダ、ソーダ灰などのアルカリ精練助剤
を付与し、100℃前後で20分以上スチーミングあ
るいはアルカリ、精練助剤を含む水溶液で煮沸し
て、撥水性夾雑物を水溶化せしめ次いで処理布帛
に付着している薬剤および可溶化された夾雑物等
の付着物を除去するための手段として水洗を繰り
返し行い更には、水洗後乾燥する工程が必要であ
つた。
For example, in the scouring process, fabrics containing cotton are coated with an alkaline scouring aid such as caustic soda or soda ash, and then steamed at around 100°C for 20 minutes or more or boiled in an aqueous solution containing alkali and scouring aids to make them water repellent. In order to make the impurities solubilized in water, and then to remove the chemicals adhering to the treated fabric and the solubilized impurities, it was necessary to repeatedly wash the fabric with water and then dry it after washing with water. .

また仕上工程においては、水に溶解あるいは分
散させた仕上加工剤を付与した後乾燥機を通して
水分を蒸発除去させる工程が必要であり加工目的
によつてはさらに高温熱処理により仕上剤を反応
固着せしめる工程が必要であつた。
In addition, in the finishing process, it is necessary to apply a finishing agent dissolved or dispersed in water and then pass it through a dryer to evaporate and remove the moisture. was necessary.

ところがかかる処理手段では処理用の薬剤がコ
スト高になること、薬剤を布帛に反応せしめるた
めに多量の熱量を必要とすること、さらには、精
練工程の場合処理された布帛に含まれる残液、あ
るいは夾雑物及び又は付着物を除去せしめるため
の多数の水洗機、及びこれらの各水洗機内に供給
すべき多量の水資源が必要であること、更に水洗
された排液を廃棄処理するための装置が必要であ
る等のことから、布帛を処理するには多量の水資
源、熱エネルギー設備費等がかさんでいるのが現
状である。更には水洗機より排出される廃液中に
は必然的にも薬剤が含まれることから、排液公害
等の問題も生じ該廃液の処理にも多大なる設備
費、人件費等が嵩んでいのもので、特に繊維加工
業界においては、経済的に欠けるものであつた。
However, with such treatment means, the cost of the treatment chemicals is high, a large amount of heat is required to cause the chemicals to react with the fabric, and furthermore, in the case of the scouring process, the residual liquid contained in the treated fabric, Alternatively, a large number of water washers are required to remove impurities and/or deposits, a large amount of water resources are required to be supplied to each of these washers, and a device is required to dispose of the washed waste liquid. Currently, processing of fabrics requires a large amount of water resources, heat energy equipment, etc., which is expensive. Furthermore, since the waste liquid discharged from water washing machines inevitably contains chemicals, problems such as waste liquid pollution arise, and the treatment of the waste liquid also requires a large amount of equipment and personnel costs. However, it was economically insufficient, especially in the textile processing industry.

このようなことから、最近では、布帛等の繊維
製品に低温プラズマ雰囲気で処理して、例えば布
帛の糊抜、精練効果あるいは仕上加工効果を得る
ことが提案されているが、この布帛の低温プラズ
マ(以下これを単にプラズマと称す)処理時にお
ける布帛の温度を変化させることにより、その反
応器内の真空度及び高周波エネルギーが一定であ
つても、繊維製品へのプラズマ処理効果を変化さ
せることができることに着目して本発明がなされ
たものである。即ちプラズマ反応器内の真空度及
び高周波エネルギーが一定であつても、その反応
器内のプラズマ雰囲気中の繊維製品温度を上昇さ
せることにより、繊維製品へのプラズマ反応速度
が早くなりそのプラズマ反応処理時間を短縮する
ことができる。また耐熱性の弱い繊維製品のプラ
ズマ処理時においてはそのプラズマ雰囲気中の繊
維製品温度を低下させることが望ましい。すなわ
ち、プラズマ雰囲気中の繊維製品温度を低下させ
ることによりその処理時間は延びるが、耐熱性の
弱い繊維製品の焦げや痩化を防止することができ
る。従つて、このようなことからプラズマ処理す
べき繊維製品の品質に応じてプラズマ雰囲気中の
繊維製品温度を加減することができれば繊維製品
の質に応じて効率よく、しかもその品質低下を招
くことなくプラズマ処理を行なうことができる。
For this reason, it has recently been proposed to treat textile products such as fabrics in a low-temperature plasma atmosphere to obtain, for example, desizing, scouring effects, or finishing effects on the fabrics. (hereinafter simply referred to as plasma) By changing the temperature of the fabric during treatment, the effect of plasma treatment on textile products can be changed even if the degree of vacuum and high frequency energy in the reactor are constant. The present invention has been made with an eye to what can be done. In other words, even if the degree of vacuum and high-frequency energy within the plasma reactor are constant, by increasing the temperature of the textile product in the plasma atmosphere within the reactor, the plasma reaction rate on the textile product will increase and the plasma reaction treatment will increase. It can save time. Furthermore, when a textile product with low heat resistance is subjected to plasma treatment, it is desirable to lower the temperature of the textile product in the plasma atmosphere. That is, by lowering the temperature of the textile product in the plasma atmosphere, the processing time is extended, but it is possible to prevent the textile product, which has weak heat resistance, from being scorched or thinned. Therefore, if it is possible to adjust the temperature of the textile product in the plasma atmosphere according to the quality of the textile product to be plasma treated, it will be possible to efficiently adjust the temperature of the textile product according to the quality of the textile product, without causing a decrease in its quality. Plasma treatment can be performed.

本発明はかかることから鑑みてなされたもの
で、構造簡単にしてプラズマ雰囲気中の被処理物
(繊維製品あるいはフイルム等)の温度を加減す
ることができるようにした低温プラズマ雰囲気中
の被処理物温度制御方法及びその装置を提供する
ことを目的とするものである。
The present invention has been made in view of the above, and has a simplified structure that allows the temperature of the processed object (textile products, film, etc.) in the plasma atmosphere to be adjusted. The object of the present invention is to provide a temperature control method and device.

以下に本発明を図面に示す実施例に基いて詳細
に説明する。
The present invention will be explained in detail below based on embodiments shown in the drawings.

1は連続処理が可能な反応器であつて、この反
応器1は低温プラズマ処理すべき布帛2をこの反
応器1内に連続的に導入するための導入口3と、
反応器1内の布帛を連続的に導出させるための導
出口4が設けられている。またこの導入口3及び
導出口4の夫々には、布帛を連続的に挿通するこ
とはできるが、反応器1内を真空(0.1〜
10Torr、望ましくは0.5〜2Torr)に保つことが
できるシール機構5及び6が設けられているが、
かかるシール機構5,6は、本発明者らが開発し
ている公知のシール機構を利用することによつて
反応器1の導入口及び導出口をシールすることが
できる。更にこの反応器1の内部には、低温プラ
ズマ処理機構が設けられているが、この低温プラ
ズマ処理機構は移行する布帛2の移送路を境とし
て上方に設置された高周波発生電極7と、その下
方に設置されたアース電極8とを有し、この一方
の高周波発生電極7には反応器1外に設箱された
発振器(図示せず)からの高周波が供給されてい
るものであり、他方のアース電極8はアースされ
ている。上記の高周波発生電極7は金網あるいは
多孔性の金属板等で平面的に形成されており、ま
たアース電極8は第2図に示す如く金属管を密間
隔で蛇行状かつ平面状に折曲げ形成したものであ
る。9は高周波発生電極7の全面に向けてガスを
吹き出すための絶縁材料からなるガスノズル、1
0はアース電極8を囲むようにして形成されてい
る絶縁性材料からなる吸気ダクトであつて、この
吸気ダクト10は図示しない真空ポンプに接続さ
れている。11は反応器1内に配設された布帛の
ガイドロールであつて、このガイドロールにより
上下対の電極7と8との間に形成される布帛通路
12内に布帛を移送することができる。また前記
のアース電極8を形成している金続管内には反応
器1の外部より湯又は水、油、気体等流通するこ
とができ、この金属管内を通つた流体は反応器1
外に設けた温度計13によつてその流体温を測定
することもできるようになつている。
1 is a reactor capable of continuous treatment, and this reactor 1 has an inlet 3 for continuously introducing a fabric 2 to be subjected to low-temperature plasma treatment into this reactor 1;
A discharge port 4 is provided for continuously withdrawing the fabric in the reactor 1. In addition, although it is possible to continuously insert the fabric into each of the inlet port 3 and outlet port 4, the inside of the reactor 1 is kept under vacuum (0.1~
10Torr, preferably 0.5 to 2Torr) are provided with sealing mechanisms 5 and 6.
Such sealing mechanisms 5 and 6 can seal the inlet and outlet of the reactor 1 by using a known sealing mechanism developed by the present inventors. Furthermore, inside this reactor 1, a low-temperature plasma treatment mechanism is provided, and this low-temperature plasma treatment mechanism includes a high-frequency generation electrode 7 installed above the transfer path of the moving fabric 2, and a high-frequency generation electrode 7 installed below One of the high-frequency generating electrodes 7 is supplied with high-frequency waves from an oscillator (not shown) installed outside the reactor 1, and the other high-frequency generating electrode 7 is Earth electrode 8 is grounded. The above-mentioned high-frequency generating electrode 7 is formed in a flat shape using a wire mesh or a porous metal plate, and the ground electrode 8 is formed by bending a metal tube into a meandering and flat shape at close intervals as shown in FIG. This is what I did. 9 is a gas nozzle made of an insulating material for blowing out gas toward the entire surface of the high-frequency generating electrode 7;
Reference numeral 0 denotes an intake duct made of an insulating material and formed to surround the ground electrode 8, and this intake duct 10 is connected to a vacuum pump (not shown). Reference numeral 11 denotes a fabric guide roll disposed within the reactor 1, which allows the fabric to be transferred into a fabric passage 12 formed between the upper and lower pair of electrodes 7 and 8. In addition, hot water, water, oil, gas, etc. can flow into the metal pipe forming the earth electrode 8 from the outside of the reactor 1, and the fluid passing through the metal pipe flows into the reactor 1.
The temperature of the fluid can also be measured with a thermometer 13 installed outside.

以上が本実施例の構成であるが、次にその作用
について述べると、先ず真空ポンプ(図示せず)
を駆動して反応器1内の真空度が0.5〜5Torrと
なるように減圧した後、ガスノズル9より空気又
は酸素あるいはその他のガスを反応器1内に供給
して、この反応器1内の真空度が約1Torrとなる
ように調整する。そこで高周波電源(図示せず)
より高周波、例えば13.56MHzを高周波発生電極
に給電してプラズマを発生させる。かくして発生
するプラズマ及びこのプラズマにより励起された
ガスの雰囲気中、即ち両電極7,8間の布帛通路
12内に布帛2を移行せしめることにより、該布
帛2の繊維に低温プラズマが作用し、布帛の親水
化が達成されるものであるが、上記プラズマの発
生を持続することによつてそのプラズマ雰囲気中
が加熱されるが、この加熱温度が上昇されると、
上記被処理布帛2が、例えば耐熱性に弱い化繊で
ある場合には、該布帛が痩化したり、焦げを生じ
ることがあるので、そのプラズマ雰囲気中を走行
する被処理物の温度を低下させる必要がある。そ
こで、上記のアース電極を兼ねている金属管8内
へ例えば冷水を通水することにより、該電極を冷
却し、更に上記プラズマ雰囲気中を走行する被処
理物2を、その冷却電極8に近接又は接触させて
移行させることによりプラズマ雰囲気中の被処理
物の温度を低下させることができるので、その被
処理物の品質低下を防止することができる。
The above is the configuration of this embodiment.Next, to describe its function, first, a vacuum pump (not shown) is used.
After reducing the pressure in the reactor 1 to a degree of vacuum of 0.5 to 5 Torr, air, oxygen, or other gas is supplied into the reactor 1 from the gas nozzle 9 to reduce the vacuum in the reactor 1. Adjust so that the temperature is approximately 1 Torr. Therefore, a high frequency power source (not shown)
A higher frequency, for example 13.56 MHz, is supplied to the high frequency generation electrode to generate plasma. By moving the fabric 2 into the atmosphere of the plasma thus generated and the gas excited by this plasma, that is, into the fabric passage 12 between the electrodes 7 and 8, the low-temperature plasma acts on the fibers of the fabric 2, causing the fabric to By continuing to generate the plasma, the plasma atmosphere is heated, and when this heating temperature is increased,
If the fabric 2 to be treated is, for example, a synthetic fiber with poor heat resistance, the fabric may become thin or scorched, so it is necessary to lower the temperature of the fabric to be treated running in the plasma atmosphere. There is. Therefore, by passing cold water, for example, into the metal tube 8 that also serves as the earth electrode, the electrode is cooled, and the workpiece 2 traveling in the plasma atmosphere is brought close to the cooling electrode 8. Alternatively, the temperature of the object to be processed in the plasma atmosphere can be lowered by bringing the object into contact with the object and moving the object, thereby preventing deterioration in the quality of the object.

またそれとは逆に耐熱性が高い被処理布帛の場
合は、そのプラズマ雰囲気中の被処理物の温度を
高くすることによりプラズマ反応時間を早めるこ
とができるので、この場合には金属管8内へ加熱
流体を流通させ金属管8を加熱し、更に上記プラ
ズマ雰囲気中を走行する被処理物2をその金属管
8に近接又は接触させて進行させることにより、
プラズマ雰囲気中の被処理物の温度を効果的に可
熱することができるものである。
On the other hand, in the case of a fabric to be treated that has high heat resistance, the plasma reaction time can be accelerated by increasing the temperature of the fabric to be treated in the plasma atmosphere. By circulating a heating fluid to heat the metal tube 8, and further moving the workpiece 2 traveling in the plasma atmosphere in close proximity to or in contact with the metal tube 8,
It is possible to effectively increase the temperature of the object to be processed in the plasma atmosphere.

以上のように本発明は繊違製品あるいはフイル
ム等を低温プラズマ処理するための低温プラズマ
反応器内に流通できる金属管を屈曲させて電極を
形成し、この電極によつて発生される低温プラズ
マ雰囲気中を通過する被処理物の温度を、この電
極内に流通させる流体で制御するようにしたもの
であるから、そのプラズマ雰囲気中の被処理物の
温度を処理すべき被処理物に応じて、制御するこ
とにより低温プラズマ処理の処理時間を早めるこ
と、あるいは高温による被処理物の損傷を未然に
防止すること、さらには、繊維製品の内芯部にま
で低温プラズマガスを作用させて有効な低温プラ
ズマ処理布帛を得ることができる等の効果があ
る。
As described above, the present invention forms an electrode by bending a metal tube that can flow into a low-temperature plasma reactor for low-temperature plasma treatment of textile products or films, and generates a low-temperature plasma atmosphere by the electrode. Since the temperature of the object to be processed passing through the electrode is controlled by the fluid flowing through the electrode, the temperature of the object to be processed in the plasma atmosphere can be adjusted depending on the object to be processed. By controlling the temperature, it is possible to speed up the processing time of low-temperature plasma treatment, prevent damage to the object to be treated due to high temperatures, and even apply low-temperature plasma gas to the inner core of textile products to achieve effective low-temperature treatment. There are effects such as being able to obtain plasma-treated fabrics.

【図面の簡単な説明】[Brief explanation of the drawing]

図面はいずれも本発明を実施する有効な装置の
実施例を示し、第1図はその断面図、第2図はア
ース電極のみの平面図である。 1……反応器、2……布帛、3……導入口、4
……導出口、5,6……シール機構、7……高周
波発生電極、8……アース電極、9……ガスノズ
ル、10……吸気ダクト、11……ガイドロー
ル、12……布帛通路、13……温度計。
The drawings all show an embodiment of an effective device for carrying out the invention, with FIG. 1 being a sectional view thereof and FIG. 2 being a plan view of only the ground electrode. 1... Reactor, 2... Fabric, 3... Inlet, 4
... Outlet, 5, 6 ... Seal mechanism, 7 ... High frequency generation electrode, 8 ... Earth electrode, 9 ... Gas nozzle, 10 ... Intake duct, 11 ... Guide roll, 12 ... Fabric passage, 13 ……thermometer.

Claims (1)

【特許請求の範囲】 1 繊維製品あるいはフイルム等を低温プラズマ
処理するための低温プラズマ反応器内に、熱媒体
を流通できる金属管を用いて電極板に形成すると
共に、その電極板の板厚方向に通気性をもたらせ
るための隙間を形成してなる低温プラズマ発生極
板を内装し、この極板によつて発生される低温プ
ラズマ雰囲気中を通過する被処理物の温度を、こ
の電極内に流通させる流体で制御することを特徴
とする低温プラズマ雰囲気中の被処理物温度制御
方法。 2 繊維製品あるいはフイルム等を低温プラズマ
処理する反応器を有する低温プラズマ処理装置に
おいて、その反応器内に、温度制御流体を流通し
得る極板を形成すると共に、その極板の板厚方向
に通気する隙間を形成してなる低温プラズマ発生
極板を配置したことを特徴とする低温プラズマ雰
囲気中の被処理物温度制御装置。
[Claims] 1. In a low temperature plasma reactor for low temperature plasma treatment of textile products, films, etc., an electrode plate is formed using a metal tube through which a heat medium can flow, and the electrode plate is formed in the thickness direction of the electrode plate. A low-temperature plasma generating electrode plate with a gap formed to provide ventilation is installed inside the electrode, and the temperature of the object to be processed passing through the low-temperature plasma atmosphere generated by this electrode plate is controlled within the electrode. A method for controlling the temperature of a processed object in a low-temperature plasma atmosphere, the method comprising controlling the temperature of a workpiece in a low-temperature plasma atmosphere. 2. In a low-temperature plasma processing apparatus having a reactor for treating textile products, films, etc. with low-temperature plasma, an electrode plate through which a temperature control fluid can flow is formed in the reactor, and ventilation is provided in the thickness direction of the electrode plate. 1. An apparatus for controlling the temperature of a processed object in a low-temperature plasma atmosphere, characterized in that a low-temperature plasma generating electrode plate having a gap formed therein is disposed.
JP57093710A 1982-06-01 1982-06-01 Method and device for controlling temperature of material to be treated in low temperature plasma atmosphere Granted JPS58210844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57093710A JPS58210844A (en) 1982-06-01 1982-06-01 Method and device for controlling temperature of material to be treated in low temperature plasma atmosphere

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57093710A JPS58210844A (en) 1982-06-01 1982-06-01 Method and device for controlling temperature of material to be treated in low temperature plasma atmosphere

Publications (2)

Publication Number Publication Date
JPS58210844A JPS58210844A (en) 1983-12-08
JPH0321213B2 true JPH0321213B2 (en) 1991-03-22

Family

ID=14089968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57093710A Granted JPS58210844A (en) 1982-06-01 1982-06-01 Method and device for controlling temperature of material to be treated in low temperature plasma atmosphere

Country Status (1)

Country Link
JP (1) JPS58210844A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012059872A (en) * 2010-09-08 2012-03-22 Hitachi High-Technologies Corp Heat treatment apparatus

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6119343A (en) * 1984-07-05 1986-01-28 Shin Etsu Chem Co Ltd Low-temperature plasma treatment of plain weave state fabric of tire cord
JPS6328967A (en) * 1986-07-18 1988-02-06 ユニチカ株式会社 Method and apparatus for low temperature plasma treatment of fiber product
WO2004099490A1 (en) * 2003-05-05 2004-11-18 Commonwealth Scientific And Industrial Research Organisation Plasma treatment apparatus and method
JP2011222404A (en) * 2010-04-13 2011-11-04 Akitoshi Okino Plasma processing method, plasma processing apparatus and processing object processed by plasma

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5480373A (en) * 1977-12-08 1979-06-27 Toray Ind Inc Method of treating high-polymer resin with electrical discharge
JPS5718737A (en) * 1980-06-21 1982-01-30 Shin Etsu Chem Co Ltd Apparatus for continuous plasma treatment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5480373A (en) * 1977-12-08 1979-06-27 Toray Ind Inc Method of treating high-polymer resin with electrical discharge
JPS5718737A (en) * 1980-06-21 1982-01-30 Shin Etsu Chem Co Ltd Apparatus for continuous plasma treatment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012059872A (en) * 2010-09-08 2012-03-22 Hitachi High-Technologies Corp Heat treatment apparatus

Also Published As

Publication number Publication date
JPS58210844A (en) 1983-12-08

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