JPS5792861A - Semiconductor memory device - Google Patents
Semiconductor memory deviceInfo
- Publication number
- JPS5792861A JPS5792861A JP55170651A JP17065180A JPS5792861A JP S5792861 A JPS5792861 A JP S5792861A JP 55170651 A JP55170651 A JP 55170651A JP 17065180 A JP17065180 A JP 17065180A JP S5792861 A JPS5792861 A JP S5792861A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- main surface
- transfer transistor
- constitution
- constituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/34—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the transistor being at least partially in a trench in the substrate
Abstract
PURPOSE:To increase integration degree, by providing a similarly conductive semiconductor layer on the main surface of a semiconductor substrate, and installing a memory capacitor thereupon and a transfer transistor on its side. CONSTITUTION:A P type Si-substrate 11 is separated at an SiO2 layer 12. A P layer 13 is accumulated on its main surface selectively. A bit line of N<+> diffusion layer 14 is made on its main surface. A memory capacitor is constituted by covering with an SiO2 film 15 and piling up a poly Si layer 17 on the P layer 13. A field effect transfer transistor is constituted as a channel of the layer 13 side 18. This constitution arranges the transfer transistor vertically. The area occupancy is reduced and the integration degree is increased.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55170651A JPS5834949B2 (en) | 1980-12-01 | 1980-12-01 | semiconductor memory device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55170651A JPS5834949B2 (en) | 1980-12-01 | 1980-12-01 | semiconductor memory device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5792861A true JPS5792861A (en) | 1982-06-09 |
JPS5834949B2 JPS5834949B2 (en) | 1983-07-29 |
Family
ID=15908824
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55170651A Expired JPS5834949B2 (en) | 1980-12-01 | 1980-12-01 | semiconductor memory device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5834949B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5965466A (en) * | 1982-10-05 | 1984-04-13 | Matsushita Electronics Corp | Semiconductor memory device |
JPS60257560A (en) * | 1984-06-04 | 1985-12-19 | Mitsubishi Electric Corp | Semiconductor memory device |
JPS61222255A (en) * | 1985-03-28 | 1986-10-02 | Fujitsu Ltd | Manufacture of semiconductor memory device |
-
1980
- 1980-12-01 JP JP55170651A patent/JPS5834949B2/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5965466A (en) * | 1982-10-05 | 1984-04-13 | Matsushita Electronics Corp | Semiconductor memory device |
JPH0437590B2 (en) * | 1982-10-05 | 1992-06-19 | Matsushita Electronics Corp | |
JPS60257560A (en) * | 1984-06-04 | 1985-12-19 | Mitsubishi Electric Corp | Semiconductor memory device |
JPS61222255A (en) * | 1985-03-28 | 1986-10-02 | Fujitsu Ltd | Manufacture of semiconductor memory device |
Also Published As
Publication number | Publication date |
---|---|
JPS5834949B2 (en) | 1983-07-29 |
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