JPS5726472A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5726472A JPS5726472A JP10181680A JP10181680A JPS5726472A JP S5726472 A JPS5726472 A JP S5726472A JP 10181680 A JP10181680 A JP 10181680A JP 10181680 A JP10181680 A JP 10181680A JP S5726472 A JPS5726472 A JP S5726472A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electrode
- electron
- shielding
- electrons
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
Abstract
PURPOSE:To remarkably improve the controlling characteristics of a control electrode by forming a completely depleted electron shielding layer for shielding the mobility of the electrons between a channel layer and the control electrode. CONSTITUTION:In an FET having an insulating substrate 1, a buffer layer 2, an n type conductive electron supply layer 3, a channel layer 4, a control electrode 5, source and drain electrodes 9, 10, an electron shielding layer 8 for shielding the mobility of electrons is formed between the layer 4 and the electrode. This layer 8 has n type conductivity, and the thickness is determined by the conditions that the layer 8 is completely depleted by the surface level of the electrode 5 and the electron is not remained in the conductive band. Thus, the electrons supplied from the layer 3 to the layer 4 are not moved to the boundary with the electrode 5, but the electron density in the electron storage layer in the layer 4 can be secured. Thus, the thickness of the layer 4 can be extremely reduced, and since the electrostatic capacity between the electrode 5 and the electron storage layer can be increased, the controlling characteristics of the electrode 5 can be largely improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10181680A JPS5726472A (en) | 1980-07-24 | 1980-07-24 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10181680A JPS5726472A (en) | 1980-07-24 | 1980-07-24 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5726472A true JPS5726472A (en) | 1982-02-12 |
JPS6353705B2 JPS6353705B2 (en) | 1988-10-25 |
Family
ID=14310642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10181680A Granted JPS5726472A (en) | 1980-07-24 | 1980-07-24 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5726472A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6041262A (en) * | 1983-08-16 | 1985-03-04 | Oki Electric Ind Co Ltd | Semiconductor device |
JPS60223171A (en) * | 1984-04-19 | 1985-11-07 | Nec Corp | Field-effect transistor |
JPS60231366A (en) * | 1984-04-28 | 1985-11-16 | Agency Of Ind Science & Technol | Field effect transistor |
JPS6123364A (en) * | 1984-07-11 | 1986-01-31 | Agency Of Ind Science & Technol | Field effect transistor |
JPS6143480A (en) * | 1984-08-08 | 1986-03-03 | Agency Of Ind Science & Technol | Field effect transistor |
JPS6196769A (en) * | 1984-10-17 | 1986-05-15 | Agency Of Ind Science & Technol | Field effect transistor |
JPS61280674A (en) * | 1985-06-06 | 1986-12-11 | Nec Corp | Semiconductor device |
EP0514079A2 (en) * | 1991-05-09 | 1992-11-19 | Raytheon Company | High electron mobility transistor and method of manufacture |
-
1980
- 1980-07-24 JP JP10181680A patent/JPS5726472A/en active Granted
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6041262A (en) * | 1983-08-16 | 1985-03-04 | Oki Electric Ind Co Ltd | Semiconductor device |
JPS60223171A (en) * | 1984-04-19 | 1985-11-07 | Nec Corp | Field-effect transistor |
JPH0783107B2 (en) * | 1984-04-19 | 1995-09-06 | 日本電気株式会社 | Field effect transistor |
JPS60231366A (en) * | 1984-04-28 | 1985-11-16 | Agency Of Ind Science & Technol | Field effect transistor |
JPS6123364A (en) * | 1984-07-11 | 1986-01-31 | Agency Of Ind Science & Technol | Field effect transistor |
JPS6143480A (en) * | 1984-08-08 | 1986-03-03 | Agency Of Ind Science & Technol | Field effect transistor |
JPS6196769A (en) * | 1984-10-17 | 1986-05-15 | Agency Of Ind Science & Technol | Field effect transistor |
JPS61280674A (en) * | 1985-06-06 | 1986-12-11 | Nec Corp | Semiconductor device |
EP0514079A2 (en) * | 1991-05-09 | 1992-11-19 | Raytheon Company | High electron mobility transistor and method of manufacture |
Also Published As
Publication number | Publication date |
---|---|
JPS6353705B2 (en) | 1988-10-25 |
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