JPS57211274A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS57211274A
JPS57211274A JP9719181A JP9719181A JPS57211274A JP S57211274 A JPS57211274 A JP S57211274A JP 9719181 A JP9719181 A JP 9719181A JP 9719181 A JP9719181 A JP 9719181A JP S57211274 A JPS57211274 A JP S57211274A
Authority
JP
Japan
Prior art keywords
aluminum
areas
electrode
elements
drain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9719181A
Other languages
Japanese (ja)
Other versions
JPH0230571B2 (en
Inventor
Toshiharu Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Yamagata Ltd
Original Assignee
NEC Yamagata Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Yamagata Ltd filed Critical NEC Yamagata Ltd
Priority to JP9719181A priority Critical patent/JPH0230571B2/en
Publication of JPS57211274A publication Critical patent/JPS57211274A/en
Publication of JPH0230571B2 publication Critical patent/JPH0230571B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To obtain the maximum yield of products by forming elements for a test such as a plurality of transistors or diodes with aluminum electrodes, the ratios of aluminum areas to contacting areas thereof are changed variously, to one part of a semiconductor substrate to which elements, such as transistors, the IC, etc. are provided. CONSTITUTION:MOS transistor elements 1a, 1b for the test are formed to one part of an N type semiconductor substrate 11 apart from an internal element. Here, the element 1a is formed by a P type source region 12, a drain region 13, a gate electrode 14, an aluminum source electrode 4 and a drain electrode 5. The element 1b is also formed by a P type source region 22, a drain region 23, a gate electrode 24, an aluminum source electrode 6 and a drain electrode 7, and the surface exposed is coated with an insulating oxide film 3. In this constitution, the areas of aluminum itself are the same, but the areas of openings shaped to the film 3 are changed, the electrodes 4, 5, 6, 7 are attached, and structure having the most excellent electric characteristics is obtained and used as a reference.
JP9719181A 1981-06-23 1981-06-23 HANDOTAISOCHI Expired - Lifetime JPH0230571B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9719181A JPH0230571B2 (en) 1981-06-23 1981-06-23 HANDOTAISOCHI

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9719181A JPH0230571B2 (en) 1981-06-23 1981-06-23 HANDOTAISOCHI

Publications (2)

Publication Number Publication Date
JPS57211274A true JPS57211274A (en) 1982-12-25
JPH0230571B2 JPH0230571B2 (en) 1990-07-06

Family

ID=14185683

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9719181A Expired - Lifetime JPH0230571B2 (en) 1981-06-23 1981-06-23 HANDOTAISOCHI

Country Status (1)

Country Link
JP (1) JPH0230571B2 (en)

Also Published As

Publication number Publication date
JPH0230571B2 (en) 1990-07-06

Similar Documents

Publication Publication Date Title
KR900000817B1 (en) Semiconductor ic device manufacturing method
JPS5293278A (en) Manufacture for mos type semiconductor intergrated circuit
JPS56162875A (en) Semiconductor device
KR900015311A (en) Semiconductor device and manufacturing method
JPS56110264A (en) High withstand voltage mos transistor
JPS55121682A (en) Field effect transistor
JPS57211274A (en) Semiconductor device
JPS5691470A (en) Semiconductor
JPS55130170A (en) Semiconductor device and method of fabricating the same
JPS5543864A (en) Mis semiconductor device
JPS6410672A (en) Vertical mosfet
JPS53109487A (en) Manufacture for semiconductor device
JPS6422054A (en) Manufacture of capacitor of semiconductor device
JPS57132352A (en) Complementary type metal oxide semiconductor integrated circuit device
JPS6489457A (en) Manufacture of semiconductor device
JPS5723271A (en) Field effect transistor
JPS5518072A (en) Mos semiconductor device
JPS5346287A (en) Production of semiconductor integrated circuit
JPS57121271A (en) Field effect transistor
JPS6457671A (en) Semiconductor device and manufacture thereof
JPS5552262A (en) Mos semiconductor device
JPS5283078A (en) Semiconductor integrated circuit
JPS56100473A (en) Semiconductor device
JPS56138950A (en) Semiconductor device
JPS57106153A (en) Semiconductor device