JPS57205955A - Ion implanting device - Google Patents

Ion implanting device

Info

Publication number
JPS57205955A
JPS57205955A JP56092629A JP9262981A JPS57205955A JP S57205955 A JPS57205955 A JP S57205955A JP 56092629 A JP56092629 A JP 56092629A JP 9262981 A JP9262981 A JP 9262981A JP S57205955 A JPS57205955 A JP S57205955A
Authority
JP
Japan
Prior art keywords
wafer
plate
base
carrier belt
implantation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56092629A
Other languages
English (en)
Japanese (ja)
Other versions
JPS637653B2 (enrdf_load_stackoverflow
Inventor
Tei Kawai
Tsuneo Hiramatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NISSHIN HAIBORUTEEJI KK
Nissin High Voltage Co Ltd
Original Assignee
NISSHIN HAIBORUTEEJI KK
Nissin High Voltage Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NISSHIN HAIBORUTEEJI KK, Nissin High Voltage Co Ltd filed Critical NISSHIN HAIBORUTEEJI KK
Priority to JP56092629A priority Critical patent/JPS57205955A/ja
Publication of JPS57205955A publication Critical patent/JPS57205955A/ja
Publication of JPS637653B2 publication Critical patent/JPS637653B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP56092629A 1981-06-15 1981-06-15 Ion implanting device Granted JPS57205955A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56092629A JPS57205955A (en) 1981-06-15 1981-06-15 Ion implanting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56092629A JPS57205955A (en) 1981-06-15 1981-06-15 Ion implanting device

Publications (2)

Publication Number Publication Date
JPS57205955A true JPS57205955A (en) 1982-12-17
JPS637653B2 JPS637653B2 (enrdf_load_stackoverflow) 1988-02-17

Family

ID=14059731

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56092629A Granted JPS57205955A (en) 1981-06-15 1981-06-15 Ion implanting device

Country Status (1)

Country Link
JP (1) JPS57205955A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61173445A (ja) * 1985-01-28 1986-08-05 Tokyo Erekutoron Kk ウエハの真空処理装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4914102A (enrdf_load_stackoverflow) * 1972-05-16 1974-02-07
JPS52149981A (en) * 1976-06-09 1977-12-13 Hitachi Ltd Wafer scanning device
JPS5487471A (en) * 1977-12-24 1979-07-11 Fuji Electric Co Ltd Manufacture of semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4914102A (enrdf_load_stackoverflow) * 1972-05-16 1974-02-07
JPS52149981A (en) * 1976-06-09 1977-12-13 Hitachi Ltd Wafer scanning device
JPS5487471A (en) * 1977-12-24 1979-07-11 Fuji Electric Co Ltd Manufacture of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61173445A (ja) * 1985-01-28 1986-08-05 Tokyo Erekutoron Kk ウエハの真空処理装置

Also Published As

Publication number Publication date
JPS637653B2 (enrdf_load_stackoverflow) 1988-02-17

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