JPS57194522A - Thermal treatment of semiconductor wafer - Google Patents

Thermal treatment of semiconductor wafer

Info

Publication number
JPS57194522A
JPS57194522A JP56079392A JP7939281A JPS57194522A JP S57194522 A JPS57194522 A JP S57194522A JP 56079392 A JP56079392 A JP 56079392A JP 7939281 A JP7939281 A JP 7939281A JP S57194522 A JPS57194522 A JP S57194522A
Authority
JP
Japan
Prior art keywords
area
semiconductor wafers
diffusion
steam
inert gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56079392A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0373134B2 (show.php
Inventor
Takeshi Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP56079392A priority Critical patent/JPS57194522A/ja
Publication of JPS57194522A publication Critical patent/JPS57194522A/ja
Publication of JPH0373134B2 publication Critical patent/JPH0373134B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P72/0436—
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22—STEAM GENERATION
    • F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B1/00—Methods of steam generation characterised by form of heating method
    • F22B1/003—Methods of steam generation characterised by form of heating method using combustion of hydrogen with oxygen

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
JP56079392A 1981-05-27 1981-05-27 Thermal treatment of semiconductor wafer Granted JPS57194522A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56079392A JPS57194522A (en) 1981-05-27 1981-05-27 Thermal treatment of semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56079392A JPS57194522A (en) 1981-05-27 1981-05-27 Thermal treatment of semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS57194522A true JPS57194522A (en) 1982-11-30
JPH0373134B2 JPH0373134B2 (show.php) 1991-11-20

Family

ID=13688585

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56079392A Granted JPS57194522A (en) 1981-05-27 1981-05-27 Thermal treatment of semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS57194522A (show.php)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01295425A (ja) * 1988-02-29 1989-11-29 Tel Sagami Ltd 酸化装置
JPH01319940A (ja) * 1988-06-22 1989-12-26 Kimmon Mfg Co Ltd 外部燃焼酸化装置
WO2002086958A1 (de) * 2001-04-23 2002-10-31 Mattson Thermal Products Gmbh Verfahren und vorrichtung zum erzeugen von prozessgasen

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5479034U (show.php) * 1977-11-15 1979-06-05

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5479034U (show.php) * 1977-11-15 1979-06-05

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01295425A (ja) * 1988-02-29 1989-11-29 Tel Sagami Ltd 酸化装置
JPH01319940A (ja) * 1988-06-22 1989-12-26 Kimmon Mfg Co Ltd 外部燃焼酸化装置
WO2002086958A1 (de) * 2001-04-23 2002-10-31 Mattson Thermal Products Gmbh Verfahren und vorrichtung zum erzeugen von prozessgasen
US7144826B2 (en) 2001-04-23 2006-12-05 Mattson Thermal Products Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment

Also Published As

Publication number Publication date
JPH0373134B2 (show.php) 1991-11-20

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