JPS54154268A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS54154268A JPS54154268A JP6317178A JP6317178A JPS54154268A JP S54154268 A JPS54154268 A JP S54154268A JP 6317178 A JP6317178 A JP 6317178A JP 6317178 A JP6317178 A JP 6317178A JP S54154268 A JPS54154268 A JP S54154268A
- Authority
- JP
- Japan
- Prior art keywords
- capsule
- impurity
- unified
- column
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To ensure the uniform diffusion of the impurity for the semiconductor wafer by forming the solid state source with the 2-split hollow column or multiple square pillar, putting the wafer into the source and then diffusing the impurity from the column or multiple square pillar.
CONSTITUTION: The solid state source is split into upper and lower capsules 1 and 2 in the form of the half-column, half-square pillar or half-hexagonal pillar with a sufficient thickness to withstand the heat deformation. Also, gas inlet/outlet 3 is provided at the end part of the capsules in order to introduce the gas inside when capsule 1 and 2 are unified together. Thus, quartz boat 6 containing wafers 5 is stored in capsule 2, and then capsule 1 is put on capsule 2 to be unified together. This unified capsule is then put onto supporter 4 and then put into furnace core tube 7. Then the unified capsule is heated up to diffuse the impurity to wafer 5. In this way, the impurity can be diffused uniformly, and furthermore, a number of sheets of wafers can be processed since nosolid state source plate is stored inside.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6317178A JPS54154268A (en) | 1978-05-25 | 1978-05-25 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6317178A JPS54154268A (en) | 1978-05-25 | 1978-05-25 | Manufacture of semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS54154268A true JPS54154268A (en) | 1979-12-05 |
Family
ID=13221533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6317178A Pending JPS54154268A (en) | 1978-05-25 | 1978-05-25 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54154268A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5223452A (en) * | 1989-12-21 | 1993-06-29 | Knepprath Vernon E | Method and apparatus for doping silicon spheres |
-
1978
- 1978-05-25 JP JP6317178A patent/JPS54154268A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5223452A (en) * | 1989-12-21 | 1993-06-29 | Knepprath Vernon E | Method and apparatus for doping silicon spheres |
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