JPS5240059A - Process for production of semiconductor device - Google Patents

Process for production of semiconductor device

Info

Publication number
JPS5240059A
JPS5240059A JP11588475A JP11588475A JPS5240059A JP S5240059 A JPS5240059 A JP S5240059A JP 11588475 A JP11588475 A JP 11588475A JP 11588475 A JP11588475 A JP 11588475A JP S5240059 A JPS5240059 A JP S5240059A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
deeply
impurities
accomplished
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11588475A
Other languages
Japanese (ja)
Inventor
Yoshiki Tanigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11588475A priority Critical patent/JPS5240059A/en
Publication of JPS5240059A publication Critical patent/JPS5240059A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: A process for production of semiconductor devices wherein local heating is accomplished by laser beam so that impurities can be deeply and narrowly diffused into the semiconductor wafer.
COPYRIGHT: (C)1977,JPO&Japio
JP11588475A 1975-09-25 1975-09-25 Process for production of semiconductor device Pending JPS5240059A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11588475A JPS5240059A (en) 1975-09-25 1975-09-25 Process for production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11588475A JPS5240059A (en) 1975-09-25 1975-09-25 Process for production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5240059A true JPS5240059A (en) 1977-03-28

Family

ID=14673555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11588475A Pending JPS5240059A (en) 1975-09-25 1975-09-25 Process for production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5240059A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228048A (en) * 1975-08-27 1977-03-02 Hitachi Ltd Heat transfer device
JPS55133722U (en) * 1979-03-16 1980-09-22
JPS5662319A (en) * 1979-10-26 1981-05-28 Hitachi Ltd Impurity dispersion method
JPS56129336A (en) * 1980-03-14 1981-10-09 Nec Corp Method of forming insulative portion in chemical compound semiconductor
JPS5750428A (en) * 1980-09-12 1982-03-24 Nec Corp Method and apparatus for manufacturing semiconductor device
JPS57201017A (en) * 1981-06-04 1982-12-09 Nec Corp Manufacture of semiconductor device
JPS60216538A (en) * 1984-04-12 1985-10-30 Fuji Electric Corp Res & Dev Ltd Diffusing method of impurity to semiconductor substrate
JPS61144383U (en) * 1985-02-28 1986-09-05

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228048A (en) * 1975-08-27 1977-03-02 Hitachi Ltd Heat transfer device
JPS5754720B2 (en) * 1975-08-27 1982-11-19
JPS55133722U (en) * 1979-03-16 1980-09-22
JPS5662319A (en) * 1979-10-26 1981-05-28 Hitachi Ltd Impurity dispersion method
JPS6339107B2 (en) * 1979-10-26 1988-08-03 Hitachi Ltd
JPS56129336A (en) * 1980-03-14 1981-10-09 Nec Corp Method of forming insulative portion in chemical compound semiconductor
JPS5750428A (en) * 1980-09-12 1982-03-24 Nec Corp Method and apparatus for manufacturing semiconductor device
JPS57201017A (en) * 1981-06-04 1982-12-09 Nec Corp Manufacture of semiconductor device
JPS60216538A (en) * 1984-04-12 1985-10-30 Fuji Electric Corp Res & Dev Ltd Diffusing method of impurity to semiconductor substrate
JPS61144383U (en) * 1985-02-28 1986-09-05

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