JPS5652754A - Manufacture of mask for manufacturing semiconductor device - Google Patents

Manufacture of mask for manufacturing semiconductor device

Info

Publication number
JPS5652754A
JPS5652754A JP12971779A JP12971779A JPS5652754A JP S5652754 A JPS5652754 A JP S5652754A JP 12971779 A JP12971779 A JP 12971779A JP 12971779 A JP12971779 A JP 12971779A JP S5652754 A JPS5652754 A JP S5652754A
Authority
JP
Japan
Prior art keywords
pattern
mask
resist
manufacture
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12971779A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6214824B2 (enExample
Inventor
Akira Saito
Yasunobu Oshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP12971779A priority Critical patent/JPS5652754A/ja
Publication of JPS5652754A publication Critical patent/JPS5652754A/ja
Publication of JPS6214824B2 publication Critical patent/JPS6214824B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP12971779A 1979-10-08 1979-10-08 Manufacture of mask for manufacturing semiconductor device Granted JPS5652754A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12971779A JPS5652754A (en) 1979-10-08 1979-10-08 Manufacture of mask for manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12971779A JPS5652754A (en) 1979-10-08 1979-10-08 Manufacture of mask for manufacturing semiconductor device

Publications (2)

Publication Number Publication Date
JPS5652754A true JPS5652754A (en) 1981-05-12
JPS6214824B2 JPS6214824B2 (enExample) 1987-04-03

Family

ID=15016459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12971779A Granted JPS5652754A (en) 1979-10-08 1979-10-08 Manufacture of mask for manufacturing semiconductor device

Country Status (1)

Country Link
JP (1) JPS5652754A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5751000U (enExample) * 1980-09-04 1982-03-24

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5751000U (enExample) * 1980-09-04 1982-03-24

Also Published As

Publication number Publication date
JPS6214824B2 (enExample) 1987-04-03

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