JPS5654039A - Forming method for fine pattern - Google Patents

Forming method for fine pattern

Info

Publication number
JPS5654039A
JPS5654039A JP13064879A JP13064879A JPS5654039A JP S5654039 A JPS5654039 A JP S5654039A JP 13064879 A JP13064879 A JP 13064879A JP 13064879 A JP13064879 A JP 13064879A JP S5654039 A JPS5654039 A JP S5654039A
Authority
JP
Japan
Prior art keywords
resin film
width
sharp corner
pattern
corner parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13064879A
Other languages
Japanese (ja)
Inventor
Akira Katsura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP13064879A priority Critical patent/JPS5654039A/en
Publication of JPS5654039A publication Critical patent/JPS5654039A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a pattern with sharp corner parts accurately by a method wherein the desired pattern is formed at a point of intersection of two continuous patterns that cross each other. CONSTITUTION:The first photosensitive resin film 3 is made up on an insulating film 2 first, and a necessary portion is removed in width W by means of phototype process. The second photosensitive resin film 4 is coated, and the second resin film 4 is removed by means of phototype process, leaving a width L portion so as to cross at right angles with the removed portion of the first resin film 3 with width W in a gate region. According to this method, the mask obtained is formed in precise dimensions and has sharp corner parts. Thus, the pattern with sharp corner parts can accurately be made up when the insulating film is etched by using the mask.
JP13064879A 1979-10-08 1979-10-08 Forming method for fine pattern Pending JPS5654039A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13064879A JPS5654039A (en) 1979-10-08 1979-10-08 Forming method for fine pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13064879A JPS5654039A (en) 1979-10-08 1979-10-08 Forming method for fine pattern

Publications (1)

Publication Number Publication Date
JPS5654039A true JPS5654039A (en) 1981-05-13

Family

ID=15039270

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13064879A Pending JPS5654039A (en) 1979-10-08 1979-10-08 Forming method for fine pattern

Country Status (1)

Country Link
JP (1) JPS5654039A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01248150A (en) * 1988-03-30 1989-10-03 Hoya Corp Latent image forming method
US7913197B1 (en) * 2007-02-21 2011-03-22 Cadence Design Systems, Inc. Method for double patterning lithography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01248150A (en) * 1988-03-30 1989-10-03 Hoya Corp Latent image forming method
US7913197B1 (en) * 2007-02-21 2011-03-22 Cadence Design Systems, Inc. Method for double patterning lithography

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